公开(公告)号：US20160300699A1

公开(公告)日：2016-10-13

申请号：US15089520

申请日：2016-04-02

Applicant: Samsung Electronics Co., Ltd.

Inventor： In-Joong KIM ,  Ilgu YUN

IPC: H01J37/32 ,  G01J3/443

CPC classification number: H01J37/32972 ,  G01J3/0202 ,  G01J3/0221 ,  G01J3/0248 ,  G01J3/0289 ,  G01J3/443 ,  H01J37/32917

Abstract: Disclosed is an apparatus for optical emission spectroscopy which includes a light measuring unit measuring light in a process chamber performing a plasma process on a substrate, a light analyzing unit receiving light collected from the light measuring unit to analyze a plasma state, a control unit receiving an output signal of the light analyzing unit to process the output signal, and a light collecting controller disposed between the process chamber and the light measuring unit so as to be combined with the light measuring unit. The light collecting controller controls the light collected to the light measuring unit.

Abstract translation: 本发明公开了一种用于光发射光谱的装置，其包括：测量在基板上执行等离子体处理的处理室中的光的光测量单元;光分析单元，接收从光测量单元收集的光以分析等离子体状态;控制单元， 所述光分析单元的输出信号处理所述输出信号;以及集光控制器，设置在所述处理室和所述光测量单元之间，以便与所述光测量单元组合。 集光控制器将收集的光控制到光测量单元。

公开(公告)号：US20190252164A1

公开(公告)日：2019-08-15

申请号：US16117779

申请日：2018-08-30

Applicant: Samsung Electronics Co., Ltd. ,  Industry-Academic Cooperation Foundation, Yonsei University

Inventor： In-Joong KIM ,  IL GU YUN

IPC: H01J37/32 ,  H01L21/67 ,  H01L21/66 ,  G01N21/73

Abstract: A plasma processing apparatus is provided. The plasma processing apparatus includes a chamber configured to perform a plasma process on a wafer, a viewport configured to transmit plasma light generated in the chamber, a rotation module coupled to the viewport to be rotatable around a rotation axis, and an OES (Optical Emission Spectroscopy) device which is coupled to the rotation module and configured to receive the plasma light, wherein the rotation module includes a first surface facing the viewport and a second surface facing the OES device, wherein the first surface is configured to block a part of the plasma light, and includes a first opening through which an inside of the rotation module is configured to be exposed to a part of the plasma light, and wherein the second surface includes a second opening configured to be in light communication with the first opening.