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公开(公告)号：US10828666B2
公开(公告)日：2020-11-10
申请号：US15432890
申请日：2017-02-14
Applicant: Seagate Technology LLC
Inventor： Sang-Min Park , Nobuo Kurataka , Gennady Gauzner
IPC: B05D3/12 , G03F7/00 , B82Y10/00 , B82Y40/00 , B29C33/62 , B29C59/02 , B05D1/26 , B05D3/10 , B29L9/00 , B29L31/00
Abstract: A pattern imprint template incudes a patterned recesses and a layer formed over the patterned recesses. The pattern recesses form a pattern in a resist when brought in contact with a substrate with a resist thereon. The layer formed over the patterned recesses has a first surface energy. The first surface energy is lower in comparison to a second surface energy of the substrate with the resist thereon. The lower first surface energy in comparison to the second surface energy of the substrate avoids trapping gas in the resist by pushing gas toward the imprint template for venting through the patterned recesses.
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公开(公告)号：US09964855B2
公开(公告)日：2018-05-08
申请号：US15289505
申请日：2016-10-10
Applicant: SEAGATE TECHNOLOGY LLC
Inventor： HongYing Wang , Kim Y. Lee , Yautzong Hsu , Nobuo Kurataka , Gennady Gauzner , Shuaigang Xiao
CPC classification number: G03F7/70141 , G03F7/0002 , G03F9/7042 , G03F9/7076 , G11B5/855
Abstract: A method is disclosed that includes forming at least one substrate alignment mark and at least one lithography alignment mark in a substrate; forming a seed layer on the substrate; and forming a guide pattern and at least one guide pattern alignment mark in the seed layer, where the at least one guide pattern alignment mark is formed over the at least one substrate alignment mark. The method further includes determining an alignment error of the at least one guide pattern alignment mark relative to the at least one substrate alignment mark; and patterning features on at least one region of the substrate, where the features are positioned on the substrate based on the at least one lithography alignment mark and the alignment error.
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3.发明申请BIT PATTERNED MEDIA TEMPLATE INCLUDING ALIGNMENT MARK AND METHOD OF USING SAME 审中-公开位图形媒体模板，包括对齐标记及其使用方法公开(公告)号：US20170023866A1
公开(公告)日：2017-01-26
申请号：US15289505
申请日：2016-10-10
Applicant: SEAGATE TECHNOLOGY LLC
Inventor： HongYing Wang , Kim Y. Lee , Yautzong Hsu , Nobuo Kurataka , Gennady Gauzner , Shuaigang Xiao
IPC: G03F7/20
CPC classification number: G03F7/70141 , G03F7/0002 , G03F9/7042 , G03F9/7076 , G11B5/855
Abstract: A method is disclosed that includes forming at least one substrate alignment mark and at least one lithography alignment mark in a substrate; forming a seed layer on the substrate; and forming a guide pattern and at least one guide pattern alignment mark in the seed layer, where the at least one guide pattern alignment mark is formed over the at least one substrate alignment mark. The method further includes determining an alignment error of the at least one guide pattern alignment mark relative to the at least one substrate alignment mark; and patterning features on at least one region of the substrate, where the features are positioned on the substrate based on the at least one lithography alignment mark and the alignment error.
Abstract translation: 公开了一种方法，其包括在衬底中形成至少一个衬底对准标记和至少一个光刻对准标记; 在所述基板上形成种子层; 以及在所述种子层中形成引导图案和至少一个引导图案对准标记，其中所述至少一个引导图案对准标记形成在所述至少一个基板对准标记上。 所述方法还包括确定所述至少一个引导图案对准标记相对于所述至少一个基板对准标记的对准误差; 以及在所述基板的至少一个区域上构图特征，其中所述特征基于所述至少一个光刻对准标记和所述对准误差位于所述基板上。
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公开(公告)号：US09610712B2
公开(公告)日：2017-04-04
申请号：US15044962
申请日：2016-02-16
Applicant: Seagate Technology LLC
Inventor： Sang-Min Park , Nobuo Kurataka , Gennady Gauzner
IPC: B05D3/10 , B05D3/12 , B82Y40/00 , B29C33/62 , G03F7/00 , B82Y10/00 , B29C59/02 , B29L9/00 , B29L31/00
CPC classification number: B05D3/12 , B05D1/26 , B05D3/10 , B29C33/62 , B29C59/022 , B29C59/026 , B29C2059/023 , B29K2883/00 , B29K2909/14 , B29L2009/005 , B29L2031/756 , B82Y10/00 , B82Y40/00 , G03F7/0002 , Y10T428/24802
Abstract: The embodiments disclose a method of surface tension control to reduce trapped gas bubbles in an imprint including modifying chemistry aspects of interfacial surfaces of an imprint template and a substrate to modify surface tensions, differentiating the interfacial surface tensions to control interfacial flow rates of a pre-cured liquid resist and controlling pre-cured liquid resist interfacial flow rates to reduce trapping gas and prevent trapped gas bubble defects in cured imprinted resist.
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公开(公告)号：US20160158972A1
公开(公告)日：2016-06-09
申请号：US15044962
申请日：2016-02-16
Applicant: Seagate Technology LLC
Inventor： Sang-Min Park , Nobuo Kurataka , Gennady Gauzner
CPC classification number: B05D3/12 , B05D1/26 , B05D3/10 , B29C33/62 , B29C59/022 , B29C59/026 , B29C2059/023 , B29K2883/00 , B29K2909/14 , B29L2009/005 , B29L2031/756 , B82Y10/00 , B82Y40/00 , G03F7/0002 , Y10T428/24802
Abstract: The embodiments disclose a method of surface tension control to reduce trapped gas bubbles in an imprint including modifying chemistry aspects of interfacial surfaces of an imprint template and a substrate to modify surface tensions, differentiating the interfacial surface tensions to control interfacial flow rates of a pre-cured liquid resist and controlling pre-cured liquid resist interfacial flow rates to reduce trapping gas and prevent trapped gas bubble defects in cured imprinted resist.
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Patent Agency Ranking
公开(公告)号：US09348219B2
公开(公告)日：2016-05-24
申请号：US14612145
申请日：2015-02-02
Applicant: Seagate Technology LLC
Inventor： Zhaoning Yu , Nobuo Kurataka , Gennady Gauzner
CPC classification number: G03F7/0002 , C09K13/00 , G03F7/40 , G11B5/746 , G11B5/855
Abstract: Provided herein are methods for depositing a spin-on-glass composition over an imprinted resist; curing the spin-on-glass composition to form a cured spin-on-glass composition; and forming a patterned mask by etching the cured spin-on-glass composition, the resist, and an underlying mask composition, wherein the patterned mask comprises features of the cured spin-on-glass composition atop the mask composition, and wherein curing the spin-on-glass composition is configured to prevent shifting or toppling of the spin-on glass composition from atop the mask composition while forming the patterned mask.
Abstract translation: 本文提供了在旋涂玻璃组合物上沉积抗蚀剂的方法; 固化旋涂玻璃组合物以形成固化的旋涂玻璃组合物; 并通过蚀刻固化的旋涂玻璃组合物，抗蚀剂和下面的掩模组合物来形成图案化掩模，其中图案化掩模包括固化的旋涂玻璃组合物在掩模组合物上的特征，并且其中固化旋转 玻璃组合物构造成在形成图案化掩模的同时防止旋涂玻璃组合物从掩模组合物顶部移位或倒下。
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7.发明申请BIT PATTERNED MEDIA TEMPLATE INCLUDING ALIGNMENT MARK AND METHOD OF USING SAME 有权位图形媒体模板，包括对齐标记及其使用方法公开(公告)号：US20150116690A1
公开(公告)日：2015-04-30
申请号：US14068050
申请日：2013-10-31
Applicant: SEAGATE TECHNOLOGY LLC
Inventor： HongYing Wang , Kim Y Lee , Yautzong Hsu , Nobuo Kurataka , Gennady Gauzner , Shuaigang Xiao
CPC classification number: G03F7/70141 , G03F7/0002 , G03F9/7042 , G03F9/7076 , G11B5/855
Abstract: A method is disclosed that includes forming at least one substrate alignment mark and at least one lithography alignment mark in a substrate; forming a seed layer on the substrate; and forming a guide pattern and at least one guide pattern alignment mark in the seed layer, where the at least one guide pattern alignment mark is formed over the at least one substrate alignment mark. The method further includes determining an alignment error of the at least one guide pattern alignment mark relative to the at least one substrate alignment mark; and patterning features on at least one region of the substrate, where the features are positioned on the substrate based on the at least one lithography alignment mark and the alignment error.
Abstract translation: 公开了一种方法，其包括在衬底中形成至少一个衬底对准标记和至少一个光刻对准标记; 在所述基板上形成种子层; 以及在所述种子层中形成引导图案和至少一个引导图案对准标记，其中所述至少一个引导图案对准标记形成在所述至少一个基板对准标记上。 所述方法还包括确定所述至少一个引导图案对准标记相对于所述至少一个基板对准标记的对准误差; 以及在所述基板的至少一个区域上构图特征，其中所述特征基于所述至少一个光刻对准标记和所述对准误差位于所述基板上。
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公开(公告)号：US09797924B2
公开(公告)日：2017-10-24
申请号：US14783403
申请日：2013-04-17
Applicant: SEAGATE TECHNOLOGY LLC
Inventor： Gennady Gauzner , Zhaoning Yu , Nobuo Kurataka , David S. Kuo , Kim Y Lee , Yautzong Hsu , Hong Ying Wang
CPC classification number: G01Q40/02 , G01N21/01 , G01N2201/13 , G01Q40/00 , G03F7/0002 , H01J37/261 , H01J37/263 , H01J2237/2602 , H01J2237/2826
Abstract: Provided herein in an apparatus, including a substrate; a functional layer, wherein the functional layer has a composition characteristic of a workpiece of an analytical apparatus; and pre-determined features configured to calibrate the analytical apparatus. Also provided herein is an apparatus, including a functional layer overlying a substrate; and pre-determined features for calibration of an analytical apparatus configured to measure the surface of a workpiece, wherein the functional layer has a composition similar to the workpiece. Also provided herein is a method, including providing a lithographic calibration standard having a functional layer to an analytical apparatus, wherein the functional layer has a composition characteristic of a workpiece of the analytical apparatus; providing calibration standard specifications to a computer interfaced with the analytical apparatus; and calibrating the analytical apparatus in accordance with calibration standard readings and the calibration standard specifications.
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公开(公告)号：US20170157643A1
公开(公告)日：2017-06-08
申请号：US15432890
申请日：2017-02-14
Applicant: Seagate Technology LLC
Inventor： Sang-Min Park , Nobuo Kurataka , Gennady Gauzner
Abstract: A pattern imprint template incudes a patterned recesses and a layer formed over the patterned recesses. The pattern recesses form a pattern in a resist when brought in contact with a substrate with a resist thereon. The layer formed over the patterned recesses has a first surface energy. The first surface energy is lower in comparison to a second surface energy of the substrate with the resist thereon. The lower first surface energy in comparison to the second surface energy of the substrate avoids trapping gas in the resist by pushing gas toward the imprint template for venting through the patterned recesses.
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10.发明授权Bit patterned media template including alignment mark and method of using same 有权包括对准标记的位图案化媒体模板及其使用方法公开(公告)号：US09466324B2
公开(公告)日：2016-10-11
申请号：US14068050
申请日：2013-10-31
Applicant: SEAGATE TECHNOLOGY LLC
Inventor： HongYing Wang , Kim Y Lee , Yautzong Hsu , Nobuo Kurataka , Gennady Gauzner , Shuaigang Xiao
CPC classification number: G03F7/70141 , G03F7/0002 , G03F9/7042 , G03F9/7076 , G11B5/855
Abstract: A method is disclosed that includes forming at least one substrate alignment mark and at least one lithography alignment mark in a substrate; forming a seed layer on the substrate; and forming a guide pattern and at least one guide pattern alignment mark in the seed layer, where the at least one guide pattern alignment mark is formed over the at least one substrate alignment mark. The method further includes determining an alignment error of the at least one guide pattern alignment mark relative to the at least one substrate alignment mark; and patterning features on at least one region of the substrate, where the features are positioned on the substrate based on the at least one lithography alignment mark and the alignment error.
Abstract translation: 公开了一种方法，其包括在衬底中形成至少一个衬底对准标记和至少一个光刻对准标记; 在所述基板上形成种子层; 以及在所述种子层中形成引导图案和至少一个引导图案对准标记，其中所述至少一个引导图案对准标记形成在所述至少一个基板对准标记上。 所述方法还包括确定所述至少一个引导图案对准标记相对于所述至少一个基板对准标记的对准误差; 以及在所述基板的至少一个区域上构图特征，其中所述特征基于所述至少一个光刻对准标记和所述对准误差位于所述基板上。
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