MULTILAYER WIRING SUBSTRATE AND METHOD OF MANUFACTURING THE MULTILAYER WIRING SUBSTRATE

    公开(公告)号:US20240349427A1

    公开(公告)日:2024-10-17

    申请号:US18755615

    申请日:2024-06-26

    Inventor: Takehisa TAKADA

    Abstract: A multilayer wiring substrate including a glass substrate provided with a through electrode, in which a bottom surface part of the through electrode provided to the glass substrate contains an unevenness in which an absolute value of a height difference from a first surface of the glass substrate is ±0.5 μm or more and 5 μm or less. For manufacturing this, a glass substrate is irradiated with a laser, a modified part reaching a first surface is formed in the glass substrate, and an unevenness is formed on the first surface of the glass substrate. Then, a hydrofluoric acid resistant metal layer and/or a first seed layer on each of which a shape of the unevenness is transferred is formed. Thereafter, a through glass via is formed by hydrofluoric acid, and then a second seed layer on which the uneven shape is transferred is formed in the through glass via.

Patent Agency Ranking