公开(公告)号：US20150371911A1

公开(公告)日：2015-12-24

申请号：US14311747

申请日：2014-06-23

Applicant: Ultratech, Inc.

Inventor： James T. McWhirter ,  Andrew Hawryluk ,  Serguei Anikitichev ,  Masoud Safa

IPC: H01L21/66 ,  B23K26/03 ,  B23K26/00 ,  H01L21/324 ,  H01L21/268

CPC classification number: H01L22/26 ,  B23K26/034 ,  H01L21/268 ,  H01L21/324 ,  H01L21/67115 ,  H01L21/67248 ,  H01L22/10

Abstract: Systems and methods for reducing beam instability in laser annealing are disclosed. The method includes: directing a conditioned laser beam through an opening in an aperture using a beam-redirecting element; forming a line image on the surface of the semiconductor wafer by imaging the aperture onto the surface, thereby locally heating the surface to form an annealing temperature distribution; detecting a thermal emission from the locally heated wafer surface; determining the annealing temperature distribution from the detected thermal emission; determining from the annealing temperature distribution a line-image intensity profile that includes a time-varying amount of slope; and adjusting the beam-redirecting element to redirect the laser beam to reduce or eliminate the time-varying amount of slope in the line-image intensity profile.

Abstract translation: 公开了用于减少激光退火中的束不稳定性的系统和方法。 该方法包括：使用光束重定向元件将经调节的激光束引导通过孔中的开口; 通过将孔成像到表面上，在半导体晶片的表面上形成线图像，从而局部加热表面以形成退火温度分布; 检测来自局部加热的晶片表面的热发射; 从所检测的热发射确定退火温度分布; 从退火温度分布确定包括时变量斜率的线图像强度分布; 并且调整光束重定向元件以重定向激光束以减少或消除线图像强度分布中的时间变化量的斜率。

公开(公告)号：US09559023B2

公开(公告)日：2017-01-31

申请号：US14311747

申请日：2014-06-23

Applicant: Ultratech, Inc.

Inventor： James T. McWhirter ,  Andrew Hawryluk ,  Serguei Anikitichev ,  Masoud Safa

IPC: H01L21/26 ,  H01L21/66 ,  H01L21/324 ,  B23K26/00 ,  B23K26/03 ,  H01L21/268 ,  H01L21/67

CPC classification number: H01L22/26 ,  B23K26/034 ,  H01L21/268 ,  H01L21/324 ,  H01L21/67115 ,  H01L21/67248 ,  H01L22/10

Abstract: Systems and methods for reducing beam instability in laser annealing are disclosed. The method includes: directing a conditioned laser beam through an opening in an aperture using a beam-redirecting element; forming a line image on the surface of the semiconductor wafer by imaging the aperture onto the surface, thereby locally heating the surface to form an annealing temperature distribution; detecting a thermal emission from the locally heated wafer surface; determining the annealing temperature distribution from the detected thermal emission; determining from the annealing temperature distribution a line-image intensity profile that includes a time-varying amount of slope; and adjusting the beam-redirecting element to redirect the laser beam to reduce or eliminate the time-varying amount of slope in the line-image intensity profile.

Abstract translation: 公开了用于减少激光退火中的束不稳定性的系统和方法。 该方法包括：使用光束重定向元件将经调节的激光束引导通过孔中的开口; 通过将孔成像到表面上，在半导体晶片的表面上形成线图像，从而局部加热表面以形成退火温度分布; 检测来自局部加热的晶片表面的热发射; 从所检测的热发射确定退火温度分布; 从退火温度分布确定包括时变量斜率的线图像强度分布; 并且调整光束重定向元件以重定向激光束以减少或消除线图像强度分布中的时间变化量的斜率。