公开(公告)号：US10365212B2

公开(公告)日：2019-07-30

申请号：US15802286

申请日：2017-11-02

Applicant: Verity Instruments, Inc.

Inventor： Andrew Weeks Kueny ,  Mike Whelan ,  Mark Anthony Meloni ,  John D. Corless ,  Rick Daignault ,  Sean Lynes

IPC: H01J1/00 ,  G01N21/27 ,  G01J3/28 ,  G01J3/443 ,  G01N21/66 ,  H01J37/32 ,  H01L21/68 ,  H01L21/66 ,  H05H1/00 ,  G01N21/73 ,  G01N21/84

Abstract: The disclosure provides an optical calibration device for in-chamber calibration of optical signals associated with a processing chamber, a characterization system for plasma processing chambers, methods of characterizing plasma processing chambers, and a chamber characterizer. In one example, the optical calibration device includes: (1) an enclosure, (2) an optical source located within the enclosure and configured to provide a source light having a continuous spectrum, and (3) optical shaping elements located within the enclosure and configured to form the source light into a calibrating light that approximates a plasma emission during an operation within the processing chamber.

公开(公告)号：US20180136118A1

公开(公告)日：2018-05-17

申请号：US15802286

申请日：2017-11-02

Applicant: Verity Instruments, Inc.

Inventor： Andrew Weeks Kueny ,  Mike Whelan ,  Mark Anthony Meloni ,  John D. Corless ,  Rick Daignault ,  Sean Lynes

IPC: G01N21/27 ,  H01J37/32 ,  G01J3/443 ,  G01J3/28 ,  H01L21/68 ,  G01N21/66 ,  H05H1/00 ,  H01L21/66

CPC classification number: G01N21/274 ,  G01J3/0289 ,  G01J3/0297 ,  G01J3/10 ,  G01J3/2823 ,  G01J3/443 ,  G01N21/66 ,  G01N21/73 ,  G01N2021/8416 ,  H01J37/32963 ,  H01J37/32972 ,  H01J2237/2482 ,  H01L21/681 ,  H01L22/26 ,  H05H1/0006

Abstract: The disclosure provides an optical calibration device for in-chamber calibration of optical signals associated with a processing chamber, a characterization system for plasma processing chambers, methods of characterizing plasma processing chambers, and a chamber characterizer. In one example, the optical calibration device includes: (1) an enclosure, (2) an optical source located within the enclosure and configured to provide a source light having a continuous spectrum, and (3) optical shaping elements located within the enclosure and configured to form the source light into a calibrating light that approximates a plasma emission during an operation within the processing chamber.