Invention Grant
- Patent Title: Ion beam apparatus
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Application No.: US15935409Application Date: 2018-03-26
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Publication No.: US10651006B2Publication Date: 2020-05-12
- Inventor: Shinichi Matsubara , Yoshimi Kawanami , Hiroyasu Shichi
- Applicant: Hitachi High-Tech Science Corporation
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Tech Science Corporation
- Current Assignee: Hitachi High-Tech Science Corporation
- Current Assignee Address: JP Tokyo
- Agency: Crowell & Moring LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@75156c9b
- Main IPC: H01J37/08
- IPC: H01J37/08 ; H01J37/28 ; H01J37/153 ; H01J37/10 ; H01J37/22 ; H01J37/147
Abstract:
According to an embodiment of the present invention, an ion beam apparatus switches between an operation mode of performing irradiation with an ion beam most including H3+ ions and an operation mode of performing irradiation with an ion beam most including ions heavier than the H3+.
Public/Granted literature
- US20180308658A1 Ion Beam Apparatus Public/Granted day:2018-10-25
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