公开(公告)号：US20170160653A1

公开(公告)日：2017-06-08

申请号：US15325987

申请日：2015-06-08

Applicant: ASML Netherlands B.V.

Inventor： Günes NAKIBOGLU ,  Frank Johannes Jacobus VAN BOXTEL ,  Thomas Petrus Hendricus WARMERDAM ,  Jan Steven Christiaan WESTERLAKEN ,  Johannes Pieter KROES

IPC: G03F7/20

CPC classification number: G03F7/70933 ,  G03F7/70716 ,  G03F7/70858 ,  G03F7/70866

Abstract: A lithographic apparatus including: a projection system with an optical axis; an enclosure with an ambient gas; and a physical component accommodated in the enclosure, wherein: the lithographic apparatus is configured to cause the physical component to undergo movement relative to the enclosure, in a predetermined direction and in a plane perpendicular to the optical axis; the lithographic apparatus is configured to let the physical component maintain a predetermined orientation with respect to the enclosure during the movement; the movement induces a flow of the ambient gas relative to the component; the physical component has a surface oriented perpendicularly to the optical axis; the component includes a flow direction system configured to direct the flow of ambient gas away from the surface.

公开(公告)号：US20230091648A1

公开(公告)日：2023-03-23

申请号：US18070155

申请日：2022-11-28

Applicant: ASML Netherlands B.V.

Inventor： Sander Catharina Reinier DERKS ,  Daniel Jozef Maria DIRECKS ,  Maurice Wilhelmus Leonardus Hendricus FEIJTS ,  Pieter Gerardus Mathijs HOEIJMAKERS ,  Katja Cornelia Joanna Clasina MOORS ,  Violeta NAVARRO PAREDES ,  William Peter VAN DRENT ,  Jan Steven Christiaan WESTERLAKEN

IPC: G03F7/20 ,  H05G2/00

Abstract: A contamination trap for use in a debris mitigation system of a radiation source, the contamination trap comprising a plurality of vanes configured to trap fuel debris emitted from a plasma formation region of the radiation source; wherein at least one vane or each vane of the plurality of vanes comprises a material comprising a thermal conductivity above 30 W m−1 K−1.

公开(公告)号：US20180164705A1

公开(公告)日：2018-06-14

申请号：US15894223

申请日：2018-02-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Jan Steven Christiaan WESTERLAKEN ,  Gerardus Arnoldus Hendricus Franciscus JANSSEN ,  Peter Paul STEIJAERT ,  Engelbertus Antonius Fransiscus VAN DER PASCH ,  Franciscus VAN DE MAST

IPC: G03F7/20

CPC classification number: G03F7/70916 ,  G03F7/70341 ,  G03F7/70608 ,  G03F7/70683 ,  G03F7/70775 ,  G03F7/7085 ,  G03F7/70908

Abstract: A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet,

公开(公告)号：US20190235398A1

公开(公告)日：2019-08-01

申请号：US16284089

申请日：2019-02-25

Applicant: ASML NETHERLANDS B.V.

Inventor： Jan Steven Christiaan WESTERLAKEN ,  Gerardus Arnoldus Hendricus Franciscus JANSSEN ,  Peter Paul STEIJAERT ,  Engelbertus Antonius Fransiscus VAN DER PASCH ,  Franciscus VAN DE MAST

IPC: G03F7/20

CPC classification number: G03F7/70916 ,  G03F7/70341 ,  G03F7/70608 ,  G03F7/70683 ,  G03F7/70775 ,  G03F7/7085 ,  G03F7/70908

Abstract: A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.

公开(公告)号：US20170068175A1

公开(公告)日：2017-03-09

申请号：US15354821

申请日：2016-11-17

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Jan Steven Christiaan WESTERLAKEN ,  Ruud Hendrikus Martinus Johannes BLOKS ,  Peter A. DELMASTRO ,  Thibault Simon Mathieu LAURENT ,  Martinus Hendrikus Antonius LEENDERS ,  Mark Josef SCHUSTER ,  Christopher Charles WARD ,  Frank Johannes Jacobus VAN BOXTEL ,  Justin Matthew VERDIRAME ,  Samir A. NAYFEH

IPC: G03F7/20

Abstract: A lithographic apparatus has a support structure configured to support a patterning device, the patterning device serving to pattern a radiation beam according to a desired pattern and having a planar main surface through which the radiation beam passes; an outlet opening configured to direct a flow of a gas onto the patterning device; and an inlet opening configured to extract the gas which has exited the outlet opening, wherein the outlet opening and inlet opening are in a facing surface facing the planar main surface of the patterning device.

Abstract translation: 光刻设备具有构造成支撑图案形成装置的支撑结构，所述图案形成装置用于根据期望的图案对辐射束进行图案化，并具有辐射束通过的平面主表面; 出口开口，其构造成将气体流引导到图案形成装置上; 以及入口开口，被配置为提取已经离开出口的气体，其中出口开口和入口开口面向面向图案形成装置的平面主表面的面对表面。

公开(公告)号：US20150355557A1

公开(公告)日：2015-12-10

申请号：US14762450

申请日：2014-02-20

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Koen CUYPERS ,  Marcelo Henrique DE ANDRADE OLIVEIRA ,  Marinus Jan REMIE ,  Chattarbir SINGH ,  Laurentius Johannes Adrianus VAN BOKHOVEN ,  Henricus Anita Jozef Wilhemus VAN DE VEN ,  José Nilton FONSECA JUNIOR ,  Frank Johannes Jacobus VAN BOXTEL ,  Daniel Nathan BURBANK ,  Erik Roelof LOOPSTRA ,  Johannes ONVLEE ,  Mark Josef SCHUSTER ,  Robertus Nicodemus Jacobus VAN BALLEGOIJ ,  Christopher Charles WARD ,  Jan Steven Christiaan WESTERLAKEN

IPC: G03F7/20

CPC classification number: G03F7/70933 ,  G03F7/70358 ,  G03F7/70633 ,  G03F7/70725 ,  G03F7/70866

Abstract: A system is disclosed for reducing overlay errors by controlling gas flow around a patterning device of a lithographic apparatus. The lithographic apparatus includes an illumination system configured to condition a radiation beam. The lithographic apparatus further includes a movable stage comprising a support structure that may be configured to support a patterning device. The patterning device may be configured to impart the radiation beam with a pattern in its cross-section to form a patterned radiation beam. In addition, the lithographic apparatus comprises a plate (410) positioned between the movable stage (401) and the projection system (208). The plate includes an opening (411) that comprises a first sidewall (411a) and a second sidewall (411b). The plate may be configured to provide a gas flow pattern (424) in a region between the movable stage and the projection system that is substantially perpendicular to an optical axis of the illumination system.

Abstract translation: 公开了一种通过控制光刻设备的图案形成装置周围的气流来减少重叠误差的系统。 光刻设备包括被配置为调节辐射束的照明系统。 光刻设备还包括可移动台，其包括可构造成支撑图案形成装置的支撑结构。 图案形成装置可以被配置为在其横截面中赋予辐射束图案以形成图案化的辐射束。 此外，光刻设备包括位于可移动台（401）和投影系统（208）之间的板（410）。 板包括包括第一侧壁（411a）和第二侧壁（411b）的开口（411）。 板可以被配置为在基本上垂直于照明系统的光轴的可移动台和投影系统之间的区域中提供气流图案（424）。

公开(公告)号：US20180059555A1

公开(公告)日：2018-03-01

申请号：US15558552

申请日：2016-02-22

Applicant: ASML Netherlands B.V.

Inventor： Jan Steven Christiaan WESTERLAKEN ,  Marcel Koenraad Marie BAGGEN ,  Fransiscus Mathijs JACOBS ,  Jeroen Arnoldus Leonardus Johannes RAAYMAKERS ,  Frank Pieter Albert VAN DEN BERKMORTEL ,  Marc Wilhelmus Maria VAN DER WIJST

IPC: G03F7/20 ,  G03F9/00

CPC classification number: G03F7/70775 ,  G03F7/70633 ,  G03F7/70641 ,  G03F7/7085 ,  G03F7/70858 ,  G03F7/709 ,  G03F9/70 ,  G03F9/7046

Abstract: A measurement system for a lithographic apparatus includes a sub-frame compliantly mounted on a reference frame. A measurement device, e.g. an alignment sensor, is mounted on the sub-frame. Soft mounting of the sub-frame isolates the alignment sensor from high-frequency disturbances, e.g. acoustic noise, by acting as a low-pass filter with a cut-off frequency, e.g. in the range of from 100 to 200 Hz.

公开(公告)号：US20170261864A1

公开(公告)日：2017-09-14

申请号：US15520193

申请日：2015-10-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Gunes NAKIBOGLU ,  Jan Steven Christiaan WESTERLAKEN ,  Frank Johannes Jacobus VAN BOXTEL ,  Maria del Carmen MERCADO CARMONA ,  Thibault Simon Mathieu LAURENT

IPC: G03F7/20

CPC classification number: G03F7/70725 ,  G03F7/70808 ,  G03F7/7085 ,  G03F7/70858 ,  G03F7/709 ,  G03F7/70933 ,  G03F9/7096

Abstract: A lithographic apparatus including: a projection system to project radiation onto a substrate supported on a substrate stage, during an exposure phase; a sensing system to sense a property of the substrate on the stage during a sensing phase; and a positioning system to determine a position of the stage relative to a reference system via a radiation path between the stage and the reference system, wherein the apparatus is configured to control stage movement relative to the reference system in the sensing phase and to control other movement relative to the reference system during the exposure phase; the stage or reference system having an outlet to provide a gas curtain to reduce ingress of ambient gas into the path; and the apparatus is operative such that a characteristic of the gas curtain is different in at least part of the sensing phase compared to in the exposure phase.

公开(公告)号：US20170199470A1

公开(公告)日：2017-07-13

申请号：US15327343

申请日：2015-06-23

Applicant: ASML NETHERLANDS B.V.

Inventor： Jan Steven Christiaan WESTERLAKEN ,  Alexandrios MATHEW ,  Rob Johan Theodoor RUTTEN

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341 ,  G03F7/70858 ,  G05D23/1934

Abstract: A conditioning system for a lithographic apparatus having a plurality of modules. The conditioning system includes a plurality of conditioning branches conveying a common conditioning medium for the plurality of modules, one conditioning branch for each module (or a subset of modules); a plurality of thermal actuators, each thermal actuator operable to locally alter the temperature of the common conditioning medium at one of the conditioning branches; and a plurality of sensors, each sensor operable to sense the temperature of the common conditioning medium at one of the conditioning branches.

公开(公告)号：US20150185624A1

公开(公告)日：2015-07-02

申请号：US14657772

申请日：2015-03-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Jan Steven Christiaan WESTERLAKEN ,  Gerardus Arnoldus Hendricus Franciscus JANSSEN ,  Peter Paul STEIJAERT ,  Engelbertus Antonius Fransiscus VAN DER PASCH ,  Franciscus VAN DE MAST

IPC: G03F7/20

CPC classification number: G03F7/70916 ,  G03F7/70341 ,  G03F7/70608 ,  G03F7/70683 ,  G03F7/70775 ,  G03F7/7085 ,  G03F7/70908

Abstract: A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.

Abstract translation: 一种光刻设备，其具有第一出口以向至少部分传感器光束路径提供具有第一流动特性的热调节流体，以及与第一出口相关联的第二出口并提供具有第二流动特性的热调节流体， 与第一流动特性不同，邻近来自第一出口的热调节流体。