公开(公告)号：US20150234294A1

公开(公告)日：2015-08-20

申请号：US14704384

申请日：2015-05-05

Applicant: ASML NETHERLANDS B.V.

Inventor： Clemens Johannes Gerardus VAN DEN DUNGEN ,  Nicolaas Franciscus KOPPELAARS ,  Martinus Hendrikus Antonius LEENDERS ,  Paulus Martinus Maria LIEBREGTS ,  Johannes Catharinus Hubertus MULKENS ,  Erik Henricus Egidius Catharina EUMMELEN ,  Marcel BECKERS ,  Richard MOERMAN ,  Cédric Désiré GROUWSTRA ,  Danny Maria Hubertus PHILIPS ,  Remko Jan Peter VERHEES ,  Pieter MULDER ,  Evert VAN VLIET

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341

Abstract: An immersion lithographic apparatus is disclosed that includes a fluid supply system configured to supply a fluid, the fluid supply system having a chamber with a plurality of inlet holes in a first side wall and a plurality of outlet holes in a second side wall, the first side wall facing the second side wall, wherein the inlet holes direct fluid entering the chamber in a direction towards areas of the second side wall between the plurality of outlet holes.

公开(公告)号：US20170212422A1

公开(公告)日：2017-07-27

申请号：US15482587

申请日：2017-04-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Bob STREEFKERK ,  Sjoerd Nicolaas Lambertus DONDERS ,  Roelof Frederik DE GRAAF ,  Christiaan Alexander HOOGENDAM ,  Hans JANSEN ,  Martinus Hendrikus Antonius LEENDERS ,  Paulus Martinus Maria LIEBREGTS ,  Jeroen Johannes Sophia Maria MERTENS ,  Jan-Gerard Cornelis VAN DER TOORN ,  Michel RIEPEN

IPC: G03F7/20 ,  H01L21/67 ,  G03F7/30 ,  H01L21/027

CPC classification number: G03F7/2041 ,  G03F7/3085 ,  G03F7/70058 ,  G03F7/70341 ,  G03F7/70825 ,  G03F7/70875 ,  G03F7/70916 ,  G03F2007/2067 ,  H01L21/0274 ,  H01L21/67098

Abstract: An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In an embodiment, the shape of a final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.

公开(公告)号：US20180101102A1

公开(公告)日：2018-04-12

申请号：US15838634

申请日：2017-12-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Rogier Hendrikus Magdalena CORTIE ,  Paulus Martinus Maria LIEBREGTS ,  Michel RIEPEN ,  Fabrizio EVANGELISTA

IPC: G03F7/20

CPC classification number: G03F7/70341

Abstract: A fluid handling structure for a lithographic apparatus is disclosed, the fluid handling structure successively has, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: an elongate opening or a plurality of openings arranged in a first line that, in use, are directed towards a substrate and/or a substrate table configured to support the substrate; a gas knife device having an elongate aperture in a second line; and an elongate opening or a plurality of openings adjacent the gas knife device.

公开(公告)号：US20170242348A1

公开(公告)日：2017-08-24

申请号：US15589705

申请日：2017-05-08

Applicant: ASML NETHERLANDS B.V.

Inventor： Michel RIEPEN ,  Christiaan Alexander HOOGENDAM ,  Paulus Martinus Maria LIEBREGTS ,  Ronald VAN DER HAM ,  Wilhelmus Franciscus Johannes SIMONS ,  Daniël Jozef Maria DIRECKS ,  Paul Petrus Joannes BERKVENS ,  Eva MONDT ,  Gert-Jan Gerardus Johannes Thomas BRANDS ,  Koen STEFFENS ,  Han Henricus Aldegonda LEMPENS ,  Mathieus Anna Karel VAN LIEROP ,  Christophe DE METSENAERE ,  Marcio Alexandre Cano MIRANDA ,  Patrick Johannes Wilhelmus SPRUYTENBURG ,  Joris Johan Anne-Marie VERSTRAETE ,  Franciscus Johannes Joseph JANSSEN

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341

Abstract: A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.

公开(公告)号：US20160154321A1

公开(公告)日：2016-06-02

申请号：US15016041

申请日：2016-02-04

Applicant: ASML NETHERLANDS B.V.

Inventor： Rogier Hendrikus Magdalena CORTIE ,  Paulus Martinus Maria LIEBREGTS ,  Michel RIEPEN ,  Fabrizio EVANGELISTA

IPC: G03F7/20

CPC classification number: G03F7/70341

Abstract: A fluid handling structure for a lithographic apparatus is disclosed, the fluid handling structure successively has, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: an elongate opening or a plurality of openings arranged in a first line that, in use, are directed towards a substrate and/or a substrate table configured to support the substrate; a gas knife device having an elongate aperture in a second line; and an elongate opening or a plurality of openings adjacent the gas knife device.

Abstract translation: 公开了一种用于光刻设备的流体处理结构，流体处理结构在从被配置为将浸没流体包含在流体处理结构外部区域的空间的边界处依次具有：细长开口或多个开口 在使用中的第一线指向被配置为支撑衬底的衬底和/或衬底台; 气刀设备，其具有在第二线中的细长孔; 以及与气刀装置相邻的细长开口或多个开口。

公开(公告)号：US20160026085A1

公开(公告)日：2016-01-28

申请号：US14871795

申请日：2015-09-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Bob STREEFKERK ,  Sjoerd Nicolaas Lambertus DONDERS ,  Roelof Frederik DE GRAAF ,  Christiaan Alexander HOOGENDAM ,  Hans JANSEN ,  Martinus Hendikus Antonius LEENDERS ,  Paulus Martinus Maria LIEBREGTS ,  Jeroen Johannes Sophia Maria MERTENS ,  Jan-Gerard Cornelis VAN DER TOORN ,  Michel RIEPEN

IPC: G03F7/20

CPC classification number: G03F7/2041 ,  G03F7/3085 ,  G03F7/70058 ,  G03F7/70341 ,  G03F7/70825 ,  G03F7/70875 ,  G03F7/70916 ,  G03F2007/2067 ,  H01L21/0274 ,  H01L21/67098

Abstract: An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In an embodiment, the shape of a final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.

公开(公告)号：US20140375973A1

公开(公告)日：2014-12-25

申请号：US14484076

申请日：2014-09-11

Applicant: ASML NETHERLANDS B.V.

Inventor： Bob STREEFKERK ,  Sjoerd Nicolaas Lambertus DONDERS ,  Roelof Frederik DE GRAAF ,  Christiaan Alexander HOOGENDAM ,  Hans JANSEN ,  Martinus Hendrikus Antonius LEENDERS ,  Paulus Martinus Maria LIEBREGTS ,  Jeroen Johannes Sophia Maria MERTENS ,  Jan-Gerard Cornelis VAN DER TOORN ,  Michel RIEPEN

IPC: G03F7/20

CPC classification number: G03F7/2041 ,  G03F7/3085 ,  G03F7/70058 ,  G03F7/70341 ,  G03F7/70825 ,  G03F7/70875 ,  G03F7/70916 ,  G03F2007/2067 ,  H01L21/0274 ,  H01L21/67098

Abstract: An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In an embodiment, the shape of a final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.

Abstract translation: 浸没式光刻设备设置有液体限制结构，其限定至少部分地被配置为在投影系统和衬底之间容纳液体的空间。 为了减少正在成像的衬底的边缘（其可能导致在浸没液体中包含气泡）的交叉，使得平行于衬底的平面中的空间的横截面积小至 可能。 最小的理论尺寸是由投影系统成像的目标部分的尺寸。 在一个实施例中，投影系统的最终元件的形状也被改变为在平行于基底的截面与目标部分的横截面上具有相似的尺寸和/或形状。