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公开(公告)号：WO2016079051A2
公开(公告)日：2016-05-26
申请号：PCT/EP2015/076687
申请日：2015-11-16
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： KRUIZINGA, Matthias , JANSEN, Maarten, Mathijs, Marinus , AZEREDO LIMA, Jorge, Manuel , BOGAART, Erik, Willem , BROUNS, Derk, Servatius, Gertruda , BRUIJN, Marc , BRULS, Richard, Joseph , DEKKERS, Jeroen , JANSSEN, Paul , KAMALI, Mohammad, Reza , KRAMER, Ronald, Harm, Gunther , LANSBERGEN, Robert, Gabriël, Maria , LEENDERS, Martinus, Hendrikus, Antonius , LIPSON, Matthew , LOOPSTRA, Erik, Roelof , LYONS, Joseph, H. , ROUX, Stephen , VAN DEN BOSCH, Gerrit , VAN DEN HEIJKANT, Sander , VAN DER GRAAF, Sandra , VAN DER MEULEN, Frits , VAN LOO, Jérôme, François, Sylvain, Virgile , VERBRUGGE, Beatrijs, Louise, Marie-Joseph, Katrien
IPC: G03F1/62
CPC classification number: G03F7/70983 , G03F1/64 , G03F7/70825
Abstract: A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
Abstract translation: 一种适用于光刻工艺的掩模组件，所述掩模组件包括图案形成装置; 以及防护薄膜组件框架，其被配置为支撑防护薄膜组件并且用安装件安装在所述图案形成装置上; 其中所述安装件被配置为相对于所述图案形成装置悬挂所述防护薄膜框架，使得所述防护薄膜框架和所述图案形成装置之间存在间隙; 并且其中所述安装件在所述图案形成装置和所述防护膜框架之间提供可释放地接合的附接。
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公开(公告)号：WO2016079052A2
公开(公告)日：2016-05-26
申请号：PCT/EP2015/076688
申请日：2015-11-16
Applicant: ASML NETHERLANDS B.V.
Inventor： VAN DER MEULEN, Frits , JANSEN, Maarten, Mathijs, Marinus , AZEREDO LIMA, Jorge, Manuel , BROUNS, Derk, Servatius, Gertruda , BRUIJN, Marc , DEKKERS, Jeroen , JANSSEN, Paul , KRAMER, Ronald, Harm, Gunther , KRUIZINGA, Matthias , LANSBERGEN, Robert, Gabriël, Maria , LEENDERS, Martinus, Hendrikus, Antonius , LOOPSTRA, Erik, Roelof , VAN DEN BOSCH, Gerrit , VAN LOO, Jérôme, François, Sylvain, Virgile , VERBRUGGE, Beatrijs, Louise, Marie-Joseph, Katrien , DE KLERK, Angelo, Cesar, Peter , DINGS, Jacobus, Maria , JANSSEN, Maurice, Leonardus, Johannes , KERSTENS, Roland, Jacobus, Johannes , KESTERS, Martinus, Jozef, Maria , LOOS, Michel , MIDDEL, Geert , REIJNDERS, Silvester, Matheus , THEUERZEIT, Frank, Johannes, Christiaan , VAN LIEVENOOGEN, Anne, Johannes, Wilhelmus
CPC classification number: G03F7/70983 , G03F1/64 , G03F7/70825
Abstract: Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
Abstract translation: 用于适用于光刻工艺的掩模组件的工具，所述掩模组件包括图案形成装置; 以及被配置为支撑薄膜并用安装件安装在所述图案形成装置上的薄膜框架; 其中所述安装件提供图案形成装置和薄膜框架之间的可释放地可接合的附接。
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公开(公告)号：WO2018228933A3
公开(公告)日：2018-12-20
申请号：PCT/EP2018/065127
申请日：2018-06-08
Applicant: ASML NETHERLANDS B.V.
Inventor： VLES, David, Ferdinand , ANDE, Chaitanya Krishna , DE GROOT, Antonius, Franciscus, Johannes , GIESBERS, Adrianus, Johannes, Maria , JANSSEN, Johannes, Joseph , JANSSEN, Paul , KLOOTWIJK, Johan, Hendrik , KNAPEN, Peter, Simon, Antonius , KURGANOVA, Evgenia , MEIJER, Marcel, Peter , MEIJERINK, Wouter, Rogier , NASALEVICH, Maxim, Aleksandrovich , NOTENBOOM, Arnoud, Willem , OLSMAN, Raymond , PATEL, Hrishikesh , PÉTER, Mária , VAN DEN BOSCH, Gerrit , VAN DEN EINDEN, Wilhelmus, Theodorus, Anthonius, Johannes , VAN DER ZANDE, Willem, Joan , VAN ZWOL, Pieter-Jan , VERMEULEN, Johannes, Petrus, Martinus, Bernardus , VOORTHUIJZEN, Willem-Pieter , WONDERGEM, Hendrikus, Jan , ZDRAVKOV, Alexandar, Nikolov
Abstract: The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle assembly for a patterning device comprising one or more actuators for moving the pellicle assembly towards and way from the patterning device.
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公开(公告)号：WO2018228933A2
公开(公告)日：2018-12-20
申请号：PCT/EP2018/065127
申请日：2018-06-08
Applicant: ASML NETHERLANDS B.V.
Inventor： VLES, David, Ferdinand , ANDE, Chaitanya Krishna , DE GROOT, Antonius, Franciscus, Johannes , GIESBERS, Adrianus, Johannes, Maria , JANSSEN, Johannes, Joseph , JANSSEN, Paul , KLOOTWIJK, Johan, Hendrik , KNAPEN, Peter, Simon, Antonius , KURGANOVA, Evgenia , MEIJER, Marcel, Peter , MEIJERINK, Wouter, Rogier , NASALEVICH, Maxim, Aleksandrovich , NOTENBOOM, Arnoud, Willem , OLSMAN, Raymond , PATEL, Hrishikesh , PÉTER, Mária , VAN DEN BOSCH, Gerrit , VAN DEN EINDEN, Wilhelmus, Theodorus, Anthonius, Johannes , VAN DER ZANDE, Willem, Joan , VAN ZWOL, Pieter-Jan , VERMEULEN, Johannes, Petrus, Martinus, Bernardus , VOORTHUIJZEN, Willem-Pieter , WONDERGEM, Hendrikus, Jan , ZDRAVKOV, Alexandar, Nikolov
Abstract: The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle assembly for a patterning device comprising one or more actuators for moving the pellicle assembly towards and way from the patterning device.
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公开(公告)号：EP3221748A2
公开(公告)日：2017-09-27
申请号：EP15794923.1
申请日：2015-11-16
Applicant: ASML Netherlands B.V.
Inventor： VAN DER MEULEN, Frits , JANSEN, Maarten Mathijs Marinus , AZEREDO LIMA, Jorge Manuel , BROUNS, Derk Servatius Gertruda , BRUIJN, Marc , DEKKERS, Jeroen , JANSSEN, Paul , KRAMER, Ronald Harm Gunther , KRUIZINGA, Matthias , LANSBERGEN, Robert Gabriël Maria , LEENDERS, Martinus Hendrikus Antonius , LOOPSTRA, Erik Roelof , VAN DEN BOSCH, Gerrit , VAN LOO, Jérôme François Sylvain Virgile , VERBRUGGE, Beatrijs Louise Marie-Joseph Katrien , DE KLERK, Angelo Cesar Peter , DINGS, Jacobus Maria , JANSSEN, Maurice Leonardus Johannes , KERSTENS, Roland Jacobus Johannes , KESTERS, Martinus Jozef Maria , LOOS, Michel , MIDDEL, Geert , REIJNDERS, Silvester Matheus , THEUERZEIT, Frank Johannes Christiaan , VAN LIEVENOOGEN, Anne Johannes Wilhelmus
CPC classification number: G03F7/70983 , G03F1/64 , G03F7/70825
Abstract: Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
Abstract translation: 用于适用于光刻工艺的掩模组件的工具，所述掩模组件包括图案形成装置; 以及被配置为支撑薄膜并用安装件安装在所述图案形成装置上的薄膜框架; 其中所述安装件在所述图案形成装置和所述薄膜框架之间提供可释放地接合的附接。
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Patent Agency Ranking
公开(公告)号：EP4286941A3
公开(公告)日：2024-03-06
申请号：EP23203497.5
申请日：2015-11-16
Applicant: ASML Netherlands B.V.
Inventor： AZEREDO LIMA, Jorge, Manuel , BROUNS, Derk, Servatius, Gertruda , BRUIJN, Marc , DE KLERK, Angelo, Cesar, Peter , DEKKERS, Jeroen , DINGS, Jacobus, Maria , JANSEN, Maarten, Mathijs, Marinus , JANSSEN, Maurice, Leonardus, Johannes , JANSSEN, Paul , KERSTENS, Roland, Jacobus, Johannes , KESTER, Martinus, Jozef, Maria , KRAMER, Ronald, Harm, Gunther , KRUIZINGA, Matthias , LANSBERGEN, Robert, Gabriël, Maria , LEENDERS, Martinus, Hendrikus, Antonius , LOOPSTRA, Erik, Roelof , LOOS, Michel , MIDDEL, Geert , REIJNDERS, Silvester, Matheus , THEUERZEIT, Frank, Johannes, Christiaan , VAN DEN BOSCH, Gerrit , VAN DER MEULEN, Frits , VAN LIEVENOOGEN, Anne, Johannes, Wilhelmus , VAN LOO, Jérôme, François, Sylvain, Virgile , VERBRUGGE, Beatrijs, Louise, Marie-Joseph, Katrien
Abstract: Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
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公开(公告)号：EP4296778A2
公开(公告)日：2023-12-27
申请号：EP23206063.2
申请日：2015-11-16
Applicant: ASML Netherlands B.V.
Inventor： AZEREDO LIMA, Jorge, Manuel , BOGAART, Erik, Willem , BROUNS, Derk, Servatius, Gertruda , BRUIJN, Marc , BRULS, Richard, Joseph , DEKKERS, Jeroen , JANSEN, Maarten , JANSSEN, Paul , KAMALI, Mohammad, Reza , KRAMER, Ronald, Harm, Gunther , KRUIZINGA, Matthias , LANSBERGEN, Robert, Gabriël, Maria , LEENDERS, Martinus, Hendrikus, Antonius , LIPSON, Matthew , LOOPSTRA, Erik, Roelof , LYONS, Joseph, Harry , ROUX, Stephen , VAN DEN BOSCH, Gerrit , VAN DEN HEIJKANT, Sander , VAN DER GRAAF, Sandra , VAN DER MEULEN, Frits , VAN LOO, Jérôme, François, Sylvain, Virgile , VERBRUGGE, Beatrijs, Louise, Marie-Joseph, Katrien
IPC: G03F1/64
Abstract: A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
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公开(公告)号：EP4286941A2
公开(公告)日：2023-12-06
申请号：EP23203497.5
申请日：2015-11-16
Applicant: ASML Netherlands B.V.
Inventor： AZEREDO LIMA, Jorge, Manuel , BROUNS, Derk, Servatius, Gertruda , BRUIJN, Marc , DE KLERK, Angelo, Cesar, Peter , DEKKERS, Jeroen , DINGS, Jacobus, Maria , JANSEN, Maarten, Mathijs, Marinus , JANSSEN, Maurice, Leonardus, Johannes , JANSSEN, Paul , KERSTENS, Roland, Jacobus, Johannes , KESTER, Martinus, Jozef, Maria , KRAMER, Ronald, Harm, Gunther , KRUIZINGA, Matthias , LANSBERGEN, Robert, Gabriël, Maria , LEENDERS, Martinus, Hendrikus, Antonius , LOOPSTRA, Erik, Roelof , LOOS, Michel , MIDDEL, Geert , REIJNDERS, Silvester, Matheus , THEUERZEIT, Frank, Johannes, Christiaan , VAN DEN BOSCH, Gerrit , VAN DER MEULEN, Frits , VAN LIEVENOOGEN, Anne, Johannes, Wilhelmus , VAN LOO, Jérôme, François, Sylvain, Virgile , VERBRUGGE, Beatrijs, Louise, Marie-Joseph, Katrien
IPC: G03F1/64
Abstract: Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
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公开(公告)号：EP4296778A3
公开(公告)日：2024-03-27
申请号：EP23206063.2
申请日：2015-11-16
Applicant: ASML Netherlands B.V.
Inventor： AZEREDO LIMA, Jorge, Manuel , BOGAART, Erik, Willem , BROUNS, Derk, Servatius, Gertruda , BRUIJN, Marc , BRULS, Richard, Joseph , DEKKERS, Jeroen , JANSEN, Maarten , JANSSEN, Paul , KAMALI, Mohammad, Reza , KRAMER, Ronald, Harm, Gunther , KRUIZINGA, Matthias , LANSBERGEN, Robert, Gabriël, Maria , LEENDERS, Martinus, Hendrikus, Antonius , LIPSON, Matthew , LOOPSTRA, Erik, Roelof , LYONS, Joseph, Harry , ROUX, Stephen , VAN DEN BOSCH, Gerrit , VAN DEN HEIJKANT, Sander , VAN DER GRAAF, Sandra , VAN DER MEULEN, Frits , VAN LOO, Jérôme, François, Sylvain, Virgile , VERBRUGGE, Beatrijs, Louise, Marie-Joseph, Katrien
Abstract: A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
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公开(公告)号：EP3639091A2
公开(公告)日：2020-04-22
申请号：EP18728409.6
申请日：2018-06-08
Applicant: ASML Netherlands B.V.
Inventor： VLES, David, Ferdinand , ANDE, Chaitanya Krishna , DE GROOT, Antonius, Franciscus, Johannes , GIESBERS, Adrianus, Johannes, Maria , JANSSEN, Johannes, Joseph , JANSSEN, Paul , KLOOTWIJK, Johan, Hendrik , KNAPEN, Peter, Simon, Antonius , KURGANOVA, Evgenia , MEIJER, Marcel, Peter , MEIJERINK, Wouter, Rogier , NASALEVICH, Maxim, Aleksandrovich , NOTENBOOM, Arnoud, Willem , OLSMAN, Raymond , PATEL, Hrishikesh , PETER, Maria , VAN DEN BOSCH, Gerrit , VAN DEN EINDEN, Wilhelmus, Theodorus, Anthonius, Johannes , VAN DER ZANDE, Willem, Joan , VAN ZWOL, Pieter-Jan , VERMEULEN, Johannes, Petrus, Martinus, Bernardus , VOORTHUIJZEN, Willem-Pieter , WONDERGEM, Hendrikus, Jan , ZDRAVKOV, Alexandar, Nikolov
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