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    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    1.
    发明申请
    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：WO2011098325A3

    公开(公告)日：2011-10-13

    申请号：PCT/EP2011050600

    申请日：2011-02-02

    Applicant: ASML NETHERLANDS BV ,  VAN ZWET ERWIN ,  DE JAGER PIETER ,  ONVLEE JOHANNES ,  FRITZ ERIK

    Inventor： VAN ZWET ERWIN ,  DE JAGER PIETER ,  ONVLEE JOHANNES ,  FRITZ ERIK

    IPC: G03F7/20

    CPC classification number: G03F7/70366 ,  G03F7/70275 ,  G03F7/70391 ,  G03F7/704 ,  G03F7/70491 ,  G03F7/70883

    Abstract: A lithographic apparatus comprising an optical column capable of creating a pattern on a target portion of a substrate is disclosed. The optical column has a self emissive contrast device (906) configured to emit a beam, and a projection system configured to project the beam onto the target portion. The apparatus has an actuator to move the optical column or a part thereof with respect to the substrate. The apparatus is constructed to reduce the optical effect of density variation in a medium around the moving part of the optical column on the beam by using a compartment (936) which provides a substantially closed environment around the moving part.

    Abstract translation: 公开了一种包括能够在基板的目标部分上形成图案的光学柱的光刻设备。 光学柱具有被配置为发射光束的自发射对比度装置（906）和被配置为将光束投射到目标部分上的投影系统。 该装置具有使光学柱或其一部分相对于基板移动的致动器。 该装置被构造成通过使用在运动部件周围提供基本上封闭的环境的隔室（936）来减小光束在光束的移动部分周围的介质中的光密度变化的光学效应。

    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    2.
    发明专利
    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 未知

    公开(公告)号：SG183147A1

    公开(公告)日：2012-09-27

    申请号：SG2012057469

    申请日：2011-02-02

    Applicant: ASML NETHERLANDS BV

    Inventor： VAN ZWET ERWIN ,  DE JAGER PIETER ,  ONVLEE JOHANNES ,  FRITZ ERIK

    Abstract: A lithographic apparatus comprising an optical column capable of creating a pattern on a target portion of a substrate is disclosed. The optical column may have a self emissive contrast device configured to emit a beam, and a projection system configured to project the beam onto the target portion. The apparatus may also have an actuator to move the optical column or a part thereof with respect to the substrate. The apparatus may be constructed to reduce the optical effect of density variation in a medium around the moving part of the optical column on the beam.

    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    5.
    发明专利
    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 未知

    公开(公告)号：SG183395A1

    公开(公告)日：2012-09-27

    申请号：SG2012061370

    申请日：2011-02-18

    Applicant: ASML NETHERLANDS BV

    Inventor： VAN ZWET ERWIN ,  DE JAGER PIETER ,  ONVLEE JOHANNES ,  FRITZ ERIK

    Abstract: The invention relates to a lithographic apparatus comprising a substrate table (902) constructed to hold a substrate (928) and an optical column capable of creating a pattern on a target portion of the substrate. The optical column may comprise a programmable patterning device configured to provide a plurality of radiation beams and a projection system configured to project the plurality of beams onto the substrate. The apparatus may be provided with an actuator to move the optical column or part thereof (924, 930) with respect to the substrate. The optical column may be arranged to project at least two of the plurality of beams onto the target portion of the substrate via a same lens of a plurality of lenses of the projection system.

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