公开(公告)号：WO2013029893A2

公开(公告)日：2013-03-07

申请号：PCT/EP2012064755

申请日：2012-07-27

Applicant: ASML NETHERLANDS BV ,  DE JAGER PIETER ,  BLEEKER ARNO ,  DEN BOEF ARIE ,  LOOPSTRA ERIK ,  PANDEY NITESH

Inventor： DE JAGER PIETER ,  BLEEKER ARNO ,  DEN BOEF ARIE ,  LOOPSTRA ERIK ,  PANDEY NITESH

IPC: G03F7/20

CPC classification number: G03F7/70291 ,  G03F7/70391 ,  G03F7/704 ,  G03F7/70525 ,  G03F7/70675

Abstract: A lithographic system has a lithographic apparatus, an inspection system and a controller. The lithographic apparatus includes a projection system configured to project a radiation beam onto a layer of material on or above a substrate. The inspection system is configured to inspect a pattern formed on the substrate. The pattern is formed on the substrate by application of the radiation beam. The controller is configured to control the lithographic apparatus to form a pattern based on data from an inspection by the inspection system of a previously exposed pattern.

Abstract translation: 光刻系统具有光刻设备，检查系统和控制器。 光刻设备包括投影系统，该投影系统配置成将辐射束投影到基底上或上方的材料层上。 检查系统被配置为检查形成在基板上的图案。 通过施加辐射束在衬底上形成图案。 控制器被配置为基于来自检查系统对先前曝光的图案的检查的数据来控制光刻设备以形成图案。

公开(公告)号：WO2014202585A3

公开(公告)日：2015-08-20

申请号：PCT/EP2014062691

申请日：2014-06-17

Applicant: ASML NETHERLANDS BV

Inventor： NIKIPELOV ANDREY ,  FRIJNS OLAV ,  DE VRIES GOSSE ,  LOOPSTRA ERIK ,  BANINE VADIM ,  DE JAGER PIETER ,  DONKER RILPHO ,  NIENHUYS HAN-KWANG ,  KRUIZINGA BORGERT ,  ENGELEN WOUTER ,  LUITEN OTGER ,  AKKERMANS JOHANNES ,  GRIMMINCK LEONARDUS ,  LITVINENKO VLADIMIR

IPC: H01S3/09 ,  G01J1/04 ,  G02B1/06 ,  G02B5/20 ,  G02B26/02 ,  G03F7/20 ,  G21K1/10 ,  H01S3/00 ,  H05H7/04

CPC classification number: G03F7/70033 ,  G01J1/0407 ,  G01J1/0418 ,  G01J1/26 ,  G01J1/429 ,  G02B1/06 ,  G02B5/205 ,  G02B26/023 ,  G03F7/70008 ,  G03F7/7055 ,  G03F7/70558 ,  G03F7/7085 ,  G21K1/10 ,  H01S3/005 ,  H01S3/0085 ,  H01S3/0903 ,  H05H7/04

Abstract: A method of patterning lithographic substrates, the method comprising using a free electron laser (FEL) to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus (LA) which projects the EUV radiation onto lithographic substrates, wherein the method further comprises reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop (CT) to monitor the free electron laser and adjust operation of the free electron laser accordingly.

Abstract translation: 一种图案化平版印刷基板的方法，所述方法包括使用自由电子激光器（FEL）产生EUV辐射并将EUV辐射传送到将EUV辐射投影到平版印刷基板上的光刻设备（LA），其中所述方法还包括减小波动 通过使用基于反馈的控制回路（CT）来监测自由电子激光器并相应地调节自由电子激光器的操作，将EUV辐射的功率传递到光刻基板。

公开(公告)号：WO2012084457A2

公开(公告)日：2012-06-28

申请号：PCT/EP2011071610

申请日：2011-12-02

Applicant: ASML NETHERLANDS BV ,  MULCKHUYSE WOUTER ,  DE JAGER PIETER ,  VAN ZWET ERWIN

Inventor： MULCKHUYSE WOUTER ,  DE JAGER PIETER ,  VAN ZWET ERWIN

IPC: G03F7/20

CPC classification number: G03F7/70508 ,  G03F7/70291 ,  G03F7/70433 ,  G03F7/7055 ,  G03F7/70558

Abstract: A system for controlling a patterning device in a lithographic apparatus using a patterning device having individually controllable elements that may only be set to two states. The method includes converting a representation of a pattern to be formed on the substrate into a plurality of area intensity signals, each corresponding to a radiation intensity level required to be set in a respective area of the patterning device in order to provide the desired pattern on the substrate and a separate step of converting each of the area intensity signals into control signals for a plurality of individually controllable elements that each correspond to the area of the patterning device.

Abstract translation: 一种用于使用具有单独可控元件的图案形成装置来控制光刻设备中的图案形成装置的系统，该单独可控元件仅可设置为两种状态。 该方法包括将要形成在衬底上的图案的表示转换成多个区域强度信号，每个区域强度信号对应于需要设置在图案形成装置的相应区域中的辐射强度水平，以便提供期望的图案 基板和单独的步骤，将每个区域强度信号转换成多个独立可控元件的控制信号，每个对应于图案形成装置的区域。

公开(公告)号：WO2015044182A3

公开(公告)日：2015-09-24

申请号：PCT/EP2014070335

申请日：2014-09-24

Applicant: ASML NETHERLANDS BV

Inventor： BANINE VADIM ,  BARTRAIJ PETRUS ,  VAN GORKOM RAMON ,  AMENT LUCAS ,  DE JAGER PIETER ,  DE VRIES GOSSE ,  DONKER RILPHO ,  ENGELEN WOUTER ,  FRIJNS OLAV ,  GRIMMINCK LEONARDUS ,  KATALENIC ANDELKO ,  LOOPSTRA ERIK ,  NIENHUYS HAN-KWANG ,  NIKIPELOV ANDREY ,  RENKENS MICHAEL ,  JANSSEN FRANCISCUS ,  KRUIZINGA BORGERT

IPC: G03F7/20 ,  G01N21/956 ,  G02B5/18 ,  G02B27/00 ,  G02B27/09 ,  G02B27/10 ,  G02B27/12 ,  G02B27/14 ,  G02B27/42 ,  G03F1/84 ,  G21K1/06 ,  H01S3/09 ,  H05H7/04

CPC classification number: G21K1/067 ,  G01N2021/95676 ,  G02B5/1814 ,  G02B5/1823 ,  G02B27/0025 ,  G02B27/0938 ,  G02B27/10 ,  G02B27/1086 ,  G02B27/12 ,  G02B27/14 ,  G02B27/142 ,  G02B27/146 ,  G02B27/4272 ,  G03F1/84 ,  G03F7/70025 ,  G03F7/70208 ,  G03F7/70566 ,  G03F7/70891 ,  G03F7/70991 ,  G21K2201/065 ,  H01S3/0903 ,  H05H7/04

Abstract: A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.

Abstract translation: 用于光刻系统的传送系统。 光束传送系统包括被配置为从辐射源接收辐射束并且沿着一个或多个方向反射辐射部分的光学元件，以形成用于提供给一个或多个工具的一个或多个分支辐射束。

公开(公告)号：WO2012136434A3

公开(公告)日：2012-12-13

申请号：PCT/EP2012053918

申请日：2012-03-07

Applicant: ASML NETHERLANDS BV ,  DE JAGER PIETER ,  BANINE VADIM ,  ONVLEE JOHANNES ,  STEVENS LUCAS ,  WUISTER SANDER ,  IOSAD NIKOLAY

Inventor： DE JAGER PIETER ,  BANINE VADIM ,  ONVLEE JOHANNES ,  STEVENS LUCAS ,  WUISTER SANDER ,  IOSAD NIKOLAY

IPC: G02F1/29 ,  G03F7/20

CPC classification number: G03F7/70191 ,  G02F1/1303 ,  G02F1/29 ,  G03F7/704

Abstract: In an embodiment, a lithographic apparatus is disclosed that includes a modulator configured to expose an exposure area of the substrate to a plurality of beams modulated according to a desired pattern and a projection system configured to project the modulated beams onto the substrate. The modulator includes a deflector to displace the plurality of beams with respect to an exposure area.

Abstract translation: 在一个实施例中，公开了一种光刻设备，其包括调制器，其被配置为将基板的曝光区域暴露于根据期望图案调制的多个光束;以及投影系统，该投影系统配置成将经调制的光束投影到基板上。 调制器包括偏转器，用于相对于曝光区域移位多个光束。

公开(公告)号：WO2011098325A3

公开(公告)日：2011-10-13

申请号：PCT/EP2011050600

申请日：2011-02-02

Applicant: ASML NETHERLANDS BV ,  VAN ZWET ERWIN ,  DE JAGER PIETER ,  ONVLEE JOHANNES ,  FRITZ ERIK

Inventor： VAN ZWET ERWIN ,  DE JAGER PIETER ,  ONVLEE JOHANNES ,  FRITZ ERIK

IPC: G03F7/20

CPC classification number: G03F7/70366 ,  G03F7/70275 ,  G03F7/70391 ,  G03F7/704 ,  G03F7/70491 ,  G03F7/70883

Abstract: A lithographic apparatus comprising an optical column capable of creating a pattern on a target portion of a substrate is disclosed. The optical column has a self emissive contrast device (906) configured to emit a beam, and a projection system configured to project the beam onto the target portion. The apparatus has an actuator to move the optical column or a part thereof with respect to the substrate. The apparatus is constructed to reduce the optical effect of density variation in a medium around the moving part of the optical column on the beam by using a compartment (936) which provides a substantially closed environment around the moving part.

Abstract translation: 公开了一种包括能够在基板的目标部分上形成图案的光学柱的光刻设备。 光学柱具有被配置为发射光束的自发射对比度装置（906）和被配置为将光束投射到目标部分上的投影系统。 该装置具有使光学柱或其一部分相对于基板移动的致动器。 该装置被构造成通过使用在运动部件周围提供基本上封闭的环境的隔室（936）来减小光束在光束的移动部分周围的介质中的光密度变化的光学效应。

公开(公告)号：SG11201601454WA

公开(公告)日：2016-03-30

申请号：SG11201601454W

申请日：2014-09-24

Applicant: ASML NETHERLANDS BV

Inventor： BANINE VADIM ,  BARTRAIJ PETRUS ,  VAN GORKOM RAMON ,  AMENT LUCAS ,  DE JAGER PIETER ,  DE VRIES GOSSE ,  DONKER RILPHO ,  ENGELEN WOUTER ,  FRIJNS OLAV ,  GRIMMINCK LEONARDUS ,  KATALENIC ANDELKO ,  LOOPSTRA ERIK ,  NIENHUYS HAN-KWANG ,  NIKIPELOV ANDREY ,  RENKENS MICHAEL ,  JANSSEN FRANCISCUS ,  KRUIZINGA BORGERT

IPC: G03F7/20 ,  G01N21/956 ,  G02B5/18 ,  G02B27/00 ,  G02B27/09 ,  G02B27/10 ,  G02B27/12 ,  G02B27/14 ,  G02B27/42 ,  G03F1/84 ,  G21K1/06 ,  H01S3/09 ,  H05H7/04

Abstract: A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.

公开(公告)号：SG183147A1

公开(公告)日：2012-09-27

申请号：SG2012057469

申请日：2011-02-02

Applicant: ASML NETHERLANDS BV

Inventor： VAN ZWET ERWIN ,  DE JAGER PIETER ,  ONVLEE JOHANNES ,  FRITZ ERIK

Abstract: A lithographic apparatus comprising an optical column capable of creating a pattern on a target portion of a substrate is disclosed. The optical column may have a self emissive contrast device configured to emit a beam, and a projection system configured to project the beam onto the target portion. The apparatus may also have an actuator to move the optical column or a part thereof with respect to the substrate. The apparatus may be constructed to reduce the optical effect of density variation in a medium around the moving part of the optical column on the beam.

公开(公告)号：SG183395A1

公开(公告)日：2012-09-27

申请号：SG2012061370

申请日：2011-02-18

Applicant: ASML NETHERLANDS BV

Inventor： VAN ZWET ERWIN ,  DE JAGER PIETER ,  ONVLEE JOHANNES ,  FRITZ ERIK

Abstract: The invention relates to a lithographic apparatus comprising a substrate table (902) constructed to hold a substrate (928) and an optical column capable of creating a pattern on a target portion of the substrate. The optical column may comprise a programmable patterning device configured to provide a plurality of radiation beams and a projection system configured to project the plurality of beams onto the substrate. The apparatus may be provided with an actuator to move the optical column or part thereof (924, 930) with respect to the substrate. The optical column may be arranged to project at least two of the plurality of beams onto the target portion of the substrate via a same lens of a plurality of lenses of the projection system.

公开(公告)号：SG183393A1

公开(公告)日：2012-09-27

申请号：SG2012061354

申请日：2011-02-18

Applicant: ASML NETHERLANDS BV

Inventor： ONVLEE JOHANNES ,  DE JAGER PIETER ,  VAN ZWET ERWIN

Abstract: The invention relates to a lithographic apparatus comprising an optical column capable of creating a pattern on a target portion of the substrate. The optical column may be provided with a self-emissive contrast device configured to emit a beam and a projection system configured to project the beam onto the target portion. The apparatus may be provided with an actuator to move the optical column or a part thereof with respect to the substrate. An optical sensor device is provided which is movable in respect of the optical columns and has a range of movement which enables the optical sensor device (936) to move through a projection area (940) of each of the optical columns to measure a beam of each of the optical columns.