Abstract:
Scavengers for removing acidic or corrosive gaseous components from semiconductor process effluents comprising a metallic macromer comprising a covalently bonded complex of (i) metal coordination atoms linked to (ii) oxomeric moieties selected from the group consisting of carbonate, sulfite, carboxylate, and silicate, and methods for synthesizing these scavengers. A method for cleaning an exhaust gas containing at least one corrosive or acidic gaseous component selected from the group consisting of hydrogen halide, chlorine, boron trihalide, thionyl chloride, and tungsten hexafluoride, which comprises contacting the exhaust gas with the metallic macromer scavenger compositions.
Abstract:
A pressure stabilization system for damping pressure variations in a process (10) discharging an effluent gas stream, in which the process is pressure-sensitive and downstream pressure variations can adversely affect the upstream process, comprising a motive fluid driver (38) to receive the effluent gas stream, and means (3) for sensing a pressure characteristic of the effluent gas stream and adjusting the flow of the effluent gas stream to damp pressure fluctuations. The pressure stabilization system may further comprise: (i) a variable frequency drive (170) for operating the motive fluid driver at a variable rotational speed; (ii) a pressure transducer monitor (186) for monitoring the pressure characteristic of the effluent gas stream and generating a pressure transduced signal; and (iii) a proportional integral derivative controller (188) coupled with the pressure transducer monitor (186), and responsive to the pressure transduced signal to adjust the variable frequency drive to damp pressure fluctuations.
Abstract:
An effluent gas stream treatment system (903) for treatment of gaseous effluents such as waste gases from semiconductor manufacturing operations (901). The effluent gas stream treatment system comprises a pre-oxidation treatment unit (905), which may for example comprise a scrubber, an oxidation unit (913) such an electrothermal oxidizer, and a post-oxidation treatment unit (917), such as a wet or dry scrubber. The effluent gas stream treatment system of the invention may utilize an integrated oxidizer (852), quench (862) and wet scrubber assembly (870), for abatement of hazardous or otherwise undesired components from the effluent gas stream. Gas or liquid shrouding of gas streams in the treatment system may be provided by high efficiency inlet structures (1060, 1110).
Abstract:
An inlet structure (60) for passage of a gas stream from an upstream source (90) of gas to a downstream locus, wherein the inlet structure (60) is constructed, arranged and operated to suppress particulate and film deposition and formation, as well as to suppress adverse hydrodynamic effects.
Abstract:
A point-of-use catalytic oxidation system (100), for treatment of a VOC-containing gas stream, including: a heat exchanger (22) for heat exchange of a VOC-containing gas stream and a VOC-reduced gas stream at higher temperature than the VOC-containing gas stream, for heat recovery from the VOC-reduced gas stream for cooling thereof, to preheat the VOC-containing gas stream; a supplemental heater (30) for supplemental heating of preheated VOC-containing gas, if and as required, to an elevated temperature for catalytic oxidation of VOC therein; and a bed of catalytic oxidizer material (34) for catalytic oxidation of VOC in the VOC-containing gas stream, to yield the VOC-reduced gas stream. The heat exchanger, supplemental heater, and bed of catalytic oxidizer material are sized, constructed, arranged, and operated to effect autothermal catalytic oxidation of VOC in the bed of catalytic oxidizer material. The system may further employ a smoother (14) to attenuate influent VOC spikes in the feed gas, and/or a concentrator (14) to concentrate the feed gas VOC species for high efficiency VOC removal in the catalytic oxidation.
Abstract:
An adsorption-desorption apparatus (102), and process for storage and dispensing of a gas, e.g., hydride and halide gases, and organometallic Group V compounds, which is selectively dispensed by pressure differential desorption of the sorbate gas from the sorbent material. The sorbent material is preferably a material which is devoid of concentration of trace components such as water, metals and oxidic transition metal species which would significantly decompose the sorbate gas in apparatus (102).