GRIPPING MULTI-LEVEL MATRIX METHOD AND APPARATUS
    1.
    发明申请
    GRIPPING MULTI-LEVEL MATRIX METHOD AND APPARATUS 审中-公开
    提取多级矩阵法和装置

    公开(公告)号:WO0193298A2

    公开(公告)日:2001-12-06

    申请号:PCT/US0114897

    申请日:2001-05-09

    CPC classification number: H01J29/028 H01J29/864 H01J2329/00 H01J2329/863

    Abstract: A multi-level matrix structure (100) for retaining a support structure within a flat panel display device. In one embodiment, the multi-level matrix structure (100) is comprised of first parallel ridges (102). The multi-level matrix structure (100) further includes second parallel ridges (104). The second parallel ridges (104) are oriented substantially orthogonally with respect to the first parallel ridges (102). In this embodiment, the second parallel ridges (104) have a height which is greater than the height of the first parallel ridges (102). Furthermore, in this embodiment, the second plurality of parallel spaced apart ridges (104) include contact portions (106) for retaining a support structure at a desired location within a flat panel display device. Hence, when a support structure is inserted between at least two of the contact portions (106) of the multi-level support structure (100), the support structure is retained in place, at a desired location within the flat panel display device, by the contact portions (106).

    Abstract translation: 一种用于将支撑结构保持在平板显示装置内的多级矩阵结构(100)。 在一个实施例中,多级矩阵结构(100)由第一平行脊(102)组成。 多级矩阵结构(100)还包括第二平行脊(104)。 第二平行脊(104)相对于第一平行脊(102)基本正交地定向。 在该实施例中,第二平行脊(104)的高度大于第一平行脊(102)的高度。 此外,在该实施例中,第二多个平行间隔开的​​脊(104)包括用于将支撑结构保持在平板显示装置内的期望位置处的接触部分(106)。 因此,当在多层支撑结构(100)的至少两个接触部分(106)之间插入支撑结构时,支撑结构被保持在平板显示装置内的所需位置的适当位置,由 接触部分(106)。

    CLEANING OF ELECTRON-EMISSIVE ELEMENTS
    2.
    发明申请
    CLEANING OF ELECTRON-EMISSIVE ELEMENTS 审中-公开
    电子元件清洁

    公开(公告)号:WO9917323A3

    公开(公告)日:1999-09-02

    申请号:PCT/US9818509

    申请日:1998-09-22

    CPC classification number: H01J9/025

    Abstract: Multiple procedures are presented for removing contaminant material (12) from electron-emissive elements (10) of an electron-emitting device (30). One procedure involves converting the contaminant material into gaseous products (14), typically by operating the electron-emissive elements, that move away from the electron-emissive elements. Another procedure entails converting the contaminant material into further material (16) and removing the further material. An additional procedure involves forming surface coatings (18 or 20) over the electron-emissive elements. The contaminant material is then removed directly from the surface coatings or by removing at least part of each surface coating.

    Abstract translation: 提出了用于从电子发射器件(30)的电子发射元件(10)去除污染物质(12)的多个步骤。 一种方法包括通常通过操作远离电子发射元件的电子发射元件将污染物质转化为气体产物(14)。 另一个过程需要将污染物质转化成另外的材料(16)并除去其它材料。 另外的过程涉及在电子发射元件上形成表面涂层(18或20)。 然后直接从表面涂层去除污染物质,或者通过去除每个表面涂层的至少一部分。

    POLYCARBONATE-CONTAINING LIQUID CHEMICAL FORMULATION AND METHOD FOR MAKING POLYCARBONATE FILM
    3.
    发明申请
    POLYCARBONATE-CONTAINING LIQUID CHEMICAL FORMULATION AND METHOD FOR MAKING POLYCARBONATE FILM 审中-公开
    含聚碳酸酯的液体化学配方及制备聚碳酸酯薄膜的方法

    公开(公告)号:WO9838239A8

    公开(公告)日:2000-08-03

    申请号:PCT/US9803370

    申请日:1998-02-27

    Abstract: A liquid chemical formulation suitable for making a thin solid polycarbonate film contains polycarbonate material and a liquid typically capable of dissolving the polycarbonate to a concentration of at least 1 %. The liquid also typically has a boiling point of at least 80 DEG C. Examples of the liquid include pyridine, a ring-substituted pyridine derivative, pyrrole, a ring-substituted pyrrole derivative, pyrrolidine, a pyrrolidine derivative, chlorobenzene, and cyclohexanone. A liquid film (36A) of the liquid chemical formulation is formed over a substructure (30) and processed to remove the liquid. In subsequent steps, the resultant solid polycarbonate film can serve as a track layer through which charged particles (70) are passed to form charged-particle tracks (72). Apertures (74) are created through the track layer by a process that entails etching along the tracks. The aperture-containing polycarbonate track layer is typically employed in fabricating a gated electron-emitting device.

    Abstract translation: 适用于制备薄固体聚碳酸酯膜的液体化学制剂含有聚碳酸酯材料和通常能够溶解至少1%浓度的聚碳酸酯的液体。 液体的沸点通常至少为80℃。液体的实例包括吡啶,环取代的吡啶衍生物,吡咯,环取代的吡咯衍生物,吡咯烷,吡咯烷衍生物,氯苯和环己酮。 液体化学制剂的液体膜(36A)形成在子结构(30)上并被处理以除去液体。 在随后的步骤中,所得的固体聚碳酸酯膜可以用作通过带电粒子(70)形成带电粒子轨道(72)的轨道层。 通过沿轨道蚀刻的过程通过轨道层产生孔径(74)。 含孔聚碳酸酯轨道层通常用于制造门控电子发射器件。

    Field emitter fabrication using open circuit electrochemical lift off.

    公开(公告)号:HK1024513A1

    公开(公告)日:2000-10-13

    申请号:HK00103749

    申请日:2000-06-21

    Abstract: A method for forming a field emitter structure. In one embodiment, the present invention creates a structure having a cavity formed into an insulating layer overlying a first electrically conductive layer. The present invention also creates a second electrically conductive layer with an opening formed above the cavity in the insulating layer. The present embodiment deposits a layer of electron emissive material directly onto the second electrically conductive layer without first depositing an underlying lift-off layer such that the electron emissive material covers the opening in the second electrically conductive layer and forms an electron emissive element within the cavity. The present invention applies a first potential to the first electrically conductive layer, such that the first potential is imparted to the electron emissive element formed within the cavity. The present invention also applies a second potential to the second electrically conductive layer, such that the second potential is imparted to the closure layer of electron emissive material. In the present embodiment, the second potential comprises an open circuit potential. The present invention then exposes the field emitter structure to an electrochemical etchant wherein the electrochemical etchant etches electron emissive material which is biased at the open circuit potential. In so doing, the layer of electron emissive material is removed from above the second electrically conductive layer without etching the electron emissive element formed within the cavity.

    Gripping multi-level matrix method and apparatus

    公开(公告)号:AU6128901A

    公开(公告)日:2001-12-11

    申请号:AU6128901

    申请日:2001-05-08

    Abstract: A multi-level matrix structure for retaining a support structure within a flat panel display device. In one embodiment, the multi-level matrix structure is comprised of a first parallel ridges. The multi-level matrix structure further includes a second parallel ridges. The second parallel ridges are oriented substantially orthogonally with respect to the first parallel ridges. In this embodiment, the second parallel ridges have a height which is greater than the height of the first parallel ridges. Furthermore, in this embodiment, the second plurality of parallel spaced apart ridges include contact portions for retaining a support structure at a desired location within a flat panel display device. Hence, when a support structure is inserted between at least two of the contact portions of the multi-level support structure, the support structure is retained in place, at a desired location within the flat panel display device, by the contact portions.

    USE OF SACRIFICIAL MASKING LAYER AND BACKSIDE EXPOSURE IN FORMING OPENINGS THAT TYPICALLY RECEIVE LIGHT-EMISSIVE MATERIAL, AND ASSOCIATED LIGHT-EMITTING STRUCTURE
    10.
    发明公开
    USE OF SACRIFICIAL MASKING LAYER AND BACKSIDE EXPOSURE IN FORMING OPENINGS THAT TYPICALLY RECEIVE LIGHT-EMISSIVE MATERIAL, AND ASSOCIATED LIGHT-EMITTING STRUCTURE 失效
    VERWENDUNG EINER OPFERMASKIERUNGSSCHICHT UNDRÜCKSEITIGERBELICHTUNG贝德埃尔斯通公司VONLÖCHERNZUR AUFNAHME VON LICHTEMITTIERENDEM材料,ZUGEHÖRIGELICHTEMITTIERENDE STRUKTUR

    公开(公告)号:EP0979525A4

    公开(公告)日:2000-09-27

    申请号:EP98918281

    申请日:1998-04-27

    CPC classification number: H01J29/085 H01J31/127

    Abstract: Openings are created in a structure by a process in which a plate is furnished with a sacrificial patterned masking layer divided into multiple laterally separated mask portions. A primary layer of actinic material is provided over the masking layer and in space between the mask portions. Material of the primary layer not shadowed by a mask formed with the mask portions is backside exposed to actinic radiation. Material of the primary layer not exposed to the radiation is removed. Segments of the masking layer not covered by exposed material of the primary layer are then removed. Consequently, openings extend through the primary layer where the segments of the masking layer have been removed. The process is typically employed in forming an optical device such as a flat-panel cathode-ray tube display in which the openings in the primary layer receive light-emissive material.

    Abstract translation: 通过其中板配备有被分成多个横向分离的掩模部分的牺牲图案化掩模层的工艺在结构中形成开口。 在掩模层上和掩模部分之间的空间中提供光化材料的主要层。 未被由掩模部分形成的掩模遮盖的主要层的材料背面暴露于光化辐射。 未暴露于辐射的主层材料被去除。 然后去除未被主层的暴露材料覆盖的掩蔽层的区段。 因此,开口延伸穿过掩模层的部分已被去除的主层。 该工艺通常用于形成诸如平板阴极射线管显示器的光学装置,其中主层中的开口接收发光材料。

Patent Agency Ranking