Abstract:
A flat panel display and a method for forming a flat panel display. In one embodiment, the flat panel display includes a cathodic structure which is formed within an active area on a backplate (100). The cathodic structure includes a emitter electrode metal (102) composed of strips of aluminum overlain by a layer of cladding material.
Abstract:
A flat panel display and a method for forming a flat panel display. In one embodiment, the flat panel display includes a cathodic structure which is formed within an active area on a backplate (100). The cathodic structure includes a emitter electrode metal (102) composed of strips of aluminum overlain by a layer of cladding material.
Abstract:
Openings are created in a structure by a process in which a plate (20) is furnished with a sacrificial patterned masking layer divided into multiple laterally separated mask portions (22A). A primary layer of actinic material (28) is provided over the masking layer and in the space between the mask portions. Material of the primary layer that is not shadowed by a mask formed with the mask portions is backside exposed to actinic radiation (30). Material of the primary layer not exposed to the radiation is removed. Segments of the masking layer not covered by exposed material of the primary layer are then removed. Consequently, openings extend through the primary layer where the segments of the masking layer have been removed. The process is typically employed in forming an optical device such as a flat-panel cathode-ray tube display in which the openings in the primary layer receive light-emissive material.
Abstract:
A protected faceplate structure (900) includes a faceplate (100) and a barrier layer (902) of silica. The faceplate (100) may be made of soda glass, and the barrier layer (902) may be made of silica.
Abstract:
An electron-emitting device contains a vertical emitter resistor patterned into multiple laterally separated sections (34, 34V, 46, or 46V) situated between the electron-emissive elements (40), on one hand, and emitter electrodes (32), on the other hand. Sections of the resistor are spaced apart along each emitter electrode. The resistor can be formed in a manner self aligned to control electrodes (38 or 52A/58B) of the device or with a separate resistor mask.
Title translation:VERWENDUNG EINER OPFERMASKIERUNGSSCHICHT UNDRÜCKSEITIGERBELICHTUNG贝德埃尔斯通公司VONLÖCHERNZUR AUFNAHME VON LICHTEMITTIERENDEM材料,ZUGEHÖRIGELICHTEMITTIERENDE STRUKTUR
Abstract:
Openings are created in a structure by a process in which a plate is furnished with a sacrificial patterned masking layer divided into multiple laterally separated mask portions. A primary layer of actinic material is provided over the masking layer and in space between the mask portions. Material of the primary layer not shadowed by a mask formed with the mask portions is backside exposed to actinic radiation. Material of the primary layer not exposed to the radiation is removed. Segments of the masking layer not covered by exposed material of the primary layer are then removed. Consequently, openings extend through the primary layer where the segments of the masking layer have been removed. The process is typically employed in forming an optical device such as a flat-panel cathode-ray tube display in which the openings in the primary layer receive light-emissive material.
Abstract:
A field emission display includes a substrate (100), field emitter structures (106) disposed within a dielectric layer (102), a gate electrode layer (104), an insulating material layer (110), and a conductive material layer (116) forming a conductive focusing waffle structure of the present invention.
Abstract:
A protected faceplate structure (900) includes a faceplate (100) and a barrier layer (902) of silica. The faceplate (100) may be made of soda glass, and the barrier layer (902) may be made of silica.