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    LOW CONCENTRATION TRIVALENT CHROMIUM ELECTROPLATING SOLUTION
    1.
    发明授权
    LOW CONCENTRATION TRIVALENT CHROMIUM ELECTROPLATING SOLUTION 失效

    公开(公告)号：KR850000620B1

    公开(公告)日：1985-05-01

    申请号：KR790004288

    申请日：1979-12-05

    Applicant: IBM

    Inventor： BARCLAY DONALD J ,  VIGAR JAMES M L

    IPC: C25D3/06 ,  C25D3/04

    Abstract: In a Cr electroplating soln., the source of Cr comprises an equilibrated aq. soln. of Cr(III) thiocyanate complexes. The Cr concn. is up to 0.02 molar. The soln. includes an amino acid as pH buffer, providing at least 1 of the ligands for the complex. Pref. the amino acid is aspartic acid. The ratio of the molar concns. of Cr to thiocyanate is 1:2-1:4. Aspartic acid concn. is ca. 1.25 times that of Cr. The bath gives a deposit of light colour and is also used to plate the initial layer of a thick (above 5 microns) deposit for engineering applications.

    ELECTROPLATING METALS
    2.
    发明专利
    ELECTROPLATING METALS 未知

    公开(公告)号：CA1120427A

    公开(公告)日：1982-03-23

    申请号：CA324906

    申请日：1979-04-04

    Applicant: IBM

    Inventor： BARCLAY DONALD J ,  VIGAR JAMES M

    IPC: C25D3/06 ,  C25D17/00 ,  C25D17/10

    Abstract: This specification relates to the electroplating of metals and in particular to an electroplating bath having an acolyte separated from the catholyte by a cation exchange membrane. This specification provides an electroplating bath having an anolyte separated from a catholyte by a perfluorinated cation exchange membrane. One use of the present invention is in trivalent chromium plating solutions wherein oxidation of Cr(III) ions to Cr(VI) occurs at the anode and accumulation of Cr(VI) ions in the plating solution ultimately results in the cessation of plating. The use of perfluorinated cation exchange membranes prevents this anode reaction, with negligible increase in the plating voltage. The anolyte preferably has a depolarising species therein capable of reducing the electrode potential of the anode when the bath is in use. In addition the pH of the catholyte can be stabilised by arranging the pH of the anolyte to allow hydrogen transport through the membrane to compensate for hydrogen evolution at the cathode.

    METHOD OF OPERATING AN ELECTROCHROMIC DISPLAY DEVICE
    5.
    发明专利
    METHOD OF OPERATING AN ELECTROCHROMIC DISPLAY DEVICE 未知

    公开(公告)号：CA1050672A

    公开(公告)日：1979-03-13

    申请号：CA268797

    申请日：1976-12-29

    Applicant: IBM

    Inventor： BARCLAY DONALD J ,  HALLETT MICHAEL H

    IPC: G02F1/17 ,  G02F1/163 ,  G09F9/30 ,  G09G3/38 ,  G06K15/18 ,  G09F9/00

    Abstract: METHOD OF OPERATING AN ELECTROCHROMIC DISPLAY DEVICE A method and apparatus for generating an electrochromic display with reduced write time by generating equal current pulses of such magnitude that the transition time is less than that required to deposit sufficient material to write the display in a single cycle, and distributing the current pulses sequentially and cyclically to each of the selected display electrodes until the display is written. The time taken to write the display by this technique is less than that required to write the same display by applying a single write pulse.

    ELECTRODEPOSITION OF CHROMIUM AND ITS ALLOYS
    6.
    发明专利
    ELECTRODEPOSITION OF CHROMIUM AND ITS ALLOYS 未知

    公开(公告)号：CA1209088A

    公开(公告)日：1986-08-05

    申请号：CA415396

    申请日：1982-11-12

    Applicant: IBM

    Inventor： BARCLAY DONALD J ,  VIGAR JAMES M ,  MORGAN WILLIAM M

    IPC: C25D3/06 ,  C25D3/10 ,  C25D3/56

    Abstract: ELECTRODEPOSITION OF CHROMIUM AND ITS ALLOYS A chromium electroplating electrolyte containing trivalent chromium ions a complexant, a buffer agent and organic compound having a -C=S group or a -C-S group within the molecule for promoting chromium deposition. The complexant is preferably selected so that the stability constant K1 of the chromium complex is in the range 108

    ELECTRODEPOSITION OF CHROMIUM AND ITS ALLOYS
    7.
    发明专利
    ELECTRODEPOSITION OF CHROMIUM AND ITS ALLOYS 未知

    公开(公告)号：CA1209086A

    公开(公告)日：1986-08-05

    申请号：CA421048

    申请日：1983-02-07

    Applicant: IBM

    Inventor： BARCLAY DONALD J

    IPC: C25D3/06 ,  C25D5/34

    Abstract: ELECTRODEPOSITION OF CHROMIUM AND ITS ALLOYS A trivalent chromium electroplating process where the part to be plated is first pretreated with a sulphur compound, in order to accelerate the reduction of chromium ions to chromium metal during a subsequent plating step.

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