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公开(公告)号:US12230563B2
公开(公告)日:2025-02-18
申请号:US17956769
申请日:2022-09-29
Applicant: Intel Corporation
Inventor: Hongxia Feng , Dingying David Xu , Sheng C. Li , Matthew L. Tingey , Meizi Jiao , Chung Kwang Christopher Tan
IPC: H01L23/498 , H01L21/48 , H01L23/13 , H01L23/538
Abstract: A package substrate and package assembly including a package substrate including a substrate body including electrical routing features therein and a surface layer and a plurality of first and second contact points on the surface layer including a first pitch and a second pitch, respectively, wherein the plurality of first contact points and the plurality of second contact points are continuous posts to the respective ones of the electrical routing features. A method including forming first conductive vias in a package assembly, wherein the first conductive vias include substrate conductive vias to electrical routing features in a package substrate and bridge conductive vias to bridge surface routing features of a bridge substrate; forming a first surface layer and a second surface layer on the package substrate; and forming second conductive vias through each of the first surface layer and the second surface layer to the bridge conductive vias.
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公开(公告)号:US20240222243A1
公开(公告)日:2024-07-04
申请号:US18091555
申请日:2022-12-30
Applicant: Intel Corporation
Inventor: Bohan Shan , Haobo Chen , Bai Nie , Srinivas Venkata Ramanuja Pietambaram , Gang Duan , Kyle Jordan Arrington , Ziyin Lin , Hongxia Feng , Yiqun Bai , Xiaoying Guo , Dingying Xu , Kristof Darmawikarta
IPC: H01L23/498 , H01L21/48 , H01L23/15
CPC classification number: H01L23/49822 , H01L21/4857 , H01L23/15 , H01L23/49816 , H01L23/49827 , H01L23/49894 , H01L24/16 , H01L2224/16227
Abstract: An integrated circuit device substrate includes a first glass layer with a redistribution layer mounting region and an integrated circuit device mounting region, wherein a first major surface of the first glass layer is overlain by a first dielectric layer, and wherein the first glass layer includes a first plurality of conductive pillars. A second glass layer is on the redistribution layer mounting region on the first glass layer, wherein the second glass layer includes a second dielectric layer on a second major surface thereof, and wherein the second dielectric layer is bonded to the first dielectric layer on the first major surface of the first glass layer, the second glass layer including a second plurality of conductive pillars electrically interconnected with the first plurality of conductive pillars in the first glass layer.
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公开(公告)号:US20240213169A1
公开(公告)日:2024-06-27
申请号:US18086265
申请日:2022-12-21
Applicant: Intel Corporation
Inventor: Bohan Shan , Haobo Chen , Yiqun Bai , Dingying Xu , Srinivas Venkata Ramanuja Pietambaram , Hongxia Feng , Gang Duan , Xiaoying Guo , Ziyin Lin , Bai Nie , Kyle Jordan Arrington , Jeremy D. Ecton , Brandon C. Marin
IPC: H01L23/538 , H01L21/48 , H01L21/56 , H01L23/15 , H01L23/31 , H01L23/498 , H01L23/64 , H10B80/00
CPC classification number: H01L23/5389 , H01L21/4857 , H01L21/486 , H01L21/565 , H01L23/15 , H01L23/3128 , H01L23/49822 , H01L23/49838 , H01L23/5382 , H01L23/5386 , H01L23/645 , H10B80/00 , H01L24/32
Abstract: An electronic system includes a substrate and a top surface active component die. The substrate includes a glass core layer including a cavity formed through the glass core layer; a glass core layer active component die disposed in the cavity; a first buildup layer contacting a first surface of the glass core layer; a second buildup layer contacting a second surface of the glass core layer; and a mold layer contacting a surface of the first buildup layer. The mold layer includes a mold layer active component die disposed in the mold layer, and the first buildup layer includes electrically conductive interconnect providing electrical continuity between the glass core layer active component die and the mold layer active component die. The top surface active component die is attached to the top surface of the substrate and electrically connected to the mold layer active component die.
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公开(公告)号:US11955448B2
公开(公告)日:2024-04-09
申请号:US16880483
申请日:2020-05-21
Applicant: Intel Corporation
Inventor: Jung Kyu Han , Hongxia Feng , Xiaoying Guo , Rahul N. Manepalli
IPC: H01L23/00 , H01L23/538
CPC classification number: H01L24/14 , H01L23/5381 , H01L24/16 , H01L2224/1403 , H01L2224/16227 , H01L2924/381
Abstract: Embodiments disclosed herein include electronic packages. In an embodiment, an electronic package comprises a package substrate and a bridge substrate embedded in the package substrate. In an embodiment, first pads are over the package substrate, where the first pads have a first pitch, and second pads are over the bridge substrate, where the second pads have a second pitch that is smaller than the first pitch. In an embodiment, a barrier layer is over individual ones of the second pads. In an embodiment, reflown solder is over individual ones of the first pads and over individual ones of the second pads. In an embodiment, a first standoff height of the reflown solder over the first pads is equal to a second standoff height of the reflown solder over the second pads.
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公开(公告)号:US20240112971A1
公开(公告)日:2024-04-04
申请号:US17957359
申请日:2022-09-30
Applicant: Intel Corporation
Inventor: Yiqun Bai , Dingying Xu , Srinivas Pietambaram , Hongxia Feng , Gang Duan , Xiaoying Guo , Ziyin Lin , Bai Nie , Haobo Chen , Kyle Arrington , Bohan Shan
IPC: H01L23/15 , H01L21/02 , H01L23/495
CPC classification number: H01L23/15 , H01L21/02354 , H01L23/49506
Abstract: An integrated circuit (IC) device comprises a substrate comprising a glass core. The glass core comprises a first surface and a second surface opposite the first surface, and a first sidewall between the first surface and the second surface. The glass core may include a conductor within a through-glass via extending from the first surface to the second surface and a build-up layer. The glass cord comprises a plurality of first areas of the glass core and a plurality of laser-treated areas on the first sidewall. A first one of the plurality of laser-treated areas may be spaced away from a second one of the plurality of laser-treated areas. A first area may comprise a first nanoporosity and a laser-treated area may comprise a second nanoporosity, wherein the second nanoporosity is greater than the first nanoporosity.
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公开(公告)号:US11948898B2
公开(公告)日:2024-04-02
申请号:US16413943
申请日:2019-05-16
Applicant: Intel Corporation
Inventor: Kristof Darmawikarta , Srinivas V. Pietambaram , Hongxia Feng , Xiaoying Guo , Benjamin T. Duong
IPC: H01L23/66 , H01L21/768 , H01L23/528 , H01L23/532
CPC classification number: H01L23/66 , H01L21/76825 , H01L21/76832 , H01L21/76834 , H01L21/76879 , H01L23/5283 , H01L23/53233 , H01L23/53238 , H01L2223/6605
Abstract: Conductive structures in a microelectronic package and having a surface roughness of 50 nm or less are described. This surface roughness is from 2 to 4 times less than can be found in packages with conductive structures (e.g., traces) formed using alternative techniques. This reduced surface roughness has a number of benefits, which in some cases includes a reduction of insertion loss and improves a signal to noise ratio for high frequency computing applications. The reduced surface roughness can be accomplished by protecting the conductive structure r during etch processes and applying an adhesion promoting layer to the conductive structure.
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公开(公告)号:US20210375746A1
公开(公告)日:2021-12-02
申请号:US16884452
申请日:2020-05-27
Applicant: INTEL CORPORATION
Inventor: Hongxia Feng , Jeremy Ecton , Aleksandar Aleksov , Haobo Chen , Xiaoying Guo , Brandon C. Marin , Zhiguo Qian , Daryl Purcell , Leonel Arana , Matthew Tingey
IPC: H01L23/522 , H01L23/66
Abstract: Processes and structures resulting therefrom for the improvement of high speed signaling integrity in electronic substrates of integrated circuit packages, which is achieved with the formation of airgap structures within dielectric material(s) between adjacent conductive routes that transmit/receive electrical signals, wherein the airgap structures decrease the capacitance and/or decrease the insertion losses in the dielectric material used to form the electronic substrates.
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公开(公告)号:US12255130B2
公开(公告)日:2025-03-18
申请号:US16884452
申请日:2020-05-27
Applicant: INTEL CORPORATION
Inventor: Hongxia Feng , Jeremy Ecton , Aleksandar Aleksov , Haobo Chen , Xiaoying Guo , Brandon C. Marin , Zhiguo Qian , Daryl Purcell , Leonel Arana , Matthew Tingey
IPC: H01L23/522 , H01L23/66
Abstract: Processes and structures resulting therefrom for the improvement of high speed signaling integrity in electronic substrates of integrated circuit packages, which is achieved with the formation of airgap structures within dielectric material(s) between adjacent conductive routes that transmit/receive electrical signals, wherein the airgap structures decrease the capacitance and/or decrease the insertion losses in the dielectric material used to form the electronic substrates.
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公开(公告)号:US20240312865A1
公开(公告)日:2024-09-19
申请号:US18182879
申请日:2023-03-13
Applicant: Intel Corporation
Inventor: Kyle Arrington , Bohan Shan , Haobo Chen , Bai Nie , Srinivas Pietambaram , Gang Duan , Ziyin Lin , Hongxia Feng , Yiqun Bai , Xiaoying Guo , Dingying Xu
IPC: H01L23/373 , H01L21/48 , H01L23/498
CPC classification number: H01L23/3733 , H01L21/486 , H01L23/49827 , H01L23/49866 , H01L23/49877 , H01L23/15
Abstract: Methods, systems, apparatus, and articles of manufacture to improve reliability of vias in a glass substrate of an integrated circuit package are disclosed. An example integrated circuit (IC) package substrate includes a glass substrate, a via extending between first and second surfaces of the glass substrate, and a conductive material provided in the via, the conductive material including gallium and silver.
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公开(公告)号:US20240222257A1
公开(公告)日:2024-07-04
申请号:US18089801
申请日:2022-12-28
Applicant: Intel Corporation
Inventor: Bohan Shan , Haobo Chen , Srinivas Venkata Ramanuja Pietambaram , Hongxia Feng , Gang Duan , Xiaoying Guo , Yiqun Bai , Dingying Xu , Bai Nie , Kyle Jordan Arrington , Ziyin Lin , Rahul N. Manepalli , Brandon C. Marin , Jeremy D. Ecton
IPC: H01L23/498 , H01L21/48 , H01L23/538
CPC classification number: H01L23/49894 , H01L21/481 , H01L21/486 , H01L23/49827 , H01L23/5384 , H01L23/15
Abstract: A substrate for an electronic system includes a glass core layer. The glass core layer includes a first surface and a second surface opposite the first surface; and at least one through-glass via (TGV) extending through the glass core layer from the first surface to the second surface. The TGV includes an opening filled with an electrically conductive material; and a via liner including a sidewall material disposed on a sidewall of the opening between the glass of the glass core layer and the electrically conductive material, wherein the sidewall material includes carbon.
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