公开(公告)号：JP2011141288A

公开(公告)日：2011-07-21

申请号：JP2011055357

申请日：2011-03-14

Applicant: Kla-Tencor Corp ,  ケーエルエー−テンカー コーポレイション

Inventor： LEE SHING ,  WANG HAIMING ,  NORTON ADAM ,  NIKOONAHAD MEHRDAD

IPC: G01B11/06 ,  G01N21/21 ,  G01J3/447 ,  G01J4/02 ,  G01J4/04 ,  G01N21/27 ,  G01N21/41

CPC classification number: G01J4/02 ,  G01J3/447 ,  G01N21/21

Abstract: PROBLEM TO BE SOLVED: To provide a system which relates to a non-destructive technology for measuring a surface parameter of a sample for measuring the birefringence of a surface, a film thickness, etc. using a polarimetric spectrum. SOLUTION: A polarized sample beam 46 of broadband radiation is focused to the surface of a sample 3 and the radiation polarized by the sample is collected by a mirror system in different planes of incidence. The modulated radiation is analyzed with respect to a polarization plane to provide a polarimetric spectrum. Thickness and refractive information may then be derived from the spectrum. The polarization of the sample beam is altered by the focusing and the sample, and the collection of the modulated radiation is repeated employing two different apertures 28 to detect the presence or absence of a birefringence axis in the sample. In the other preferred embodiment, the technology may be combined with ellipsometry for determining the thicknesses and refractive indices of thin films. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种涉及用于测量样品的表面参数的非破坏性技术的系统，用于使用偏振光谱测量表面的双折射，膜厚等。 解决方案：将宽带辐射的极化样品束46聚焦到样品3的表面，并且由样品偏振的辐射由不同入射平面中的反射镜系统收集。 相对于偏振平面分析调制的辐射以提供偏振光谱。 然后可以从光谱导出厚度和折射信息。 通过聚焦和样品改变样品光束的偏振，并且重复使用两个不同的孔28来检测调制的辐射的收集，以检测样品中双折射轴的存在或不存在。 在另一个优选实施例中，该技术可以与用于确定薄膜的厚度和折射率的椭偏仪相结合。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011191311A

公开(公告)日：2011-09-29

申请号：JP2011104901

申请日：2011-05-10

Applicant: Kla-Tencor Corp ,  ケーエルエー−テンカー コーポレイション

Inventor： WANG HAIMING ,  MAXTON PATRICK M ,  JOHNSON KENNETH C ,  NIKOONAHAD MEHRDAD

IPC: G01B11/00 ,  G01N21/21 ,  G01B11/06 ,  G01B11/26 ,  G01J3/02 ,  G01J3/447 ,  G01J4/04 ,  G01N21/27 ,  G01N21/41

CPC classification number: G01N21/211 ,  G01B11/0641

Abstract: PROBLEM TO BE SOLVED: To provide an ellipsometer with a self-calibrating capability regarding a system for measuring surface characteristics of a sample such as a semiconductor device. SOLUTION: Two phase modulators or polarizing elements are employed to modulate the polarization of a beam before and after the sample 20 is irradiated with the reference radiation beam 11. The modulated radiation from the sample is detected and harmonics to an analyzer 26 are derived from a detected signal. The harmonics to the analyzer 26 may be used for deriving an ellipsometry parameter and a system parameter for fixed polarizing elements, circular attenuation compensation, depolarization of the polarizing elements, retardances of phase modulators, and the like. The self-calibrating ellipsometer and the combined system may be used for measuring sample characteristics such as film thickness and depolarization of radiation caused by the sample. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种椭圆计量仪，其具有关于用于测量诸如半导体器件的样品的表面特性的系统的自校准能力。 解决方案：使用两相调制器或偏振元件来调制样品20被参考辐射束11照射之前和之后的光束的偏振。来自样品的调制辐射被检测，并且分析器26的谐波为 从检测到的信号导出。 分析器26的谐波可以用于导出椭圆偏振参数和用于固定偏振元件的系统参数，圆形衰减补偿，偏振元件的去极化，相位调制器的延迟等。 自校准椭偏仪和组合系统可用于测量样品特性，如样品的膜厚度和辐射的去极化。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：WO2012158279A3

公开(公告)日：2013-01-17

申请号：PCT/US2012032792

申请日：2012-04-09

Applicant: KLA TENCOR CORP ,  KRISHNAN SHANKAR ,  WANG HAIMING

Inventor： KRISHNAN SHANKAR ,  WANG HAIMING

IPC: G01N21/21 ,  G01J4/00

CPC classification number: G01B11/0641 ,  G01B2210/56 ,  G01N21/211 ,  G01N21/956

Abstract: A Mueller ellipsometer of the type having a first rotating element on an incident beam side of a sample and a second rotating element on a reflected beam side of the sample and a detector having an integration time, having a controller for selectively and separately adjusting (1) a first angular frequency of the first rotating element and (2) a second angular frequency of the second rotating element.

Abstract translation: 具有在样品的入射光束侧的第一旋转元件和样品的反射光束侧上的第二旋转元件和具有积分时间的检测器的Mueller椭偏仪具有用于选择性和分别地调节（1 ）第一旋转元件的第一角频率和（2）第二旋转元件的第二角频率。

公开(公告)号：WO0047961A9

公开(公告)日：2001-10-25

申请号：PCT/US0003290

申请日：2000-02-09

Applicant: KLA TENCOR CORP

Inventor： LEE SHING ,  WANG HAIMING ,  NORTON ADAM ,  NIKOONAHAD MEHRDAD

IPC: G01B11/06 ,  G01J3/447 ,  G01J4/02 ,  G01J4/04 ,  G01N21/21 ,  G01N21/41 ,  G01J4/00

CPC classification number: G01J4/02 ,  G01J3/447 ,  G01N21/21

Abstract: A polarized sample beam (12) of broadband radiation is focused onto the surface of a sample (3) and the radiation modified by the sample is collected by means of a mirror system (16) in different planes of incidence. The sample beam focused to the sample has a multitude of polarization states. The modified radiation is analyzed with respect to a polarization plane to provide a polarimetric spectrum. Preferably the polarization of the sample beam is altered only by the focusing and the sample, and the analyzing is done with respect to a fixed polarization plane. In the preferred embodiment, the focusing of the sample beam and the collection of the modified radiation are repeated employing two different apertures (30) to detect the presence or absence of a birefringence axis in the sample. In another preferred embodiment, the above-described technique may be combined with ellipsometry for determining the thickness and refractive indices of thin films.

Abstract translation: 将宽带辐射的偏振样品束（12）聚焦到样品（3）的表面上，并且通过不同入射平面的反射镜系统（16）收集由样品改性的辐射。 聚焦到样品的样品束具有许多极化状态。 相对于偏振平面分析修改的辐射以提供偏振光谱。 优选地，样品光束的偏振仅由聚焦和样品改变，并且相对于固定的偏振平面进行分析。 在优选实施例中，采用两个不同的孔（30）来重复样品束的聚焦和修改的辐射的收集，以检测样品中双折射轴的存在或不存在。 在另一个优选实施例中，上述技术可以与用于确定薄膜的厚度和折射率的椭偏仪组合。

公开(公告)号：WO0065331A2

公开(公告)日：2000-11-02

申请号：PCT/US0010875

申请日：2000-04-21

Applicant: KLA TENCOR CORP

Inventor： WANG HAIMING ,  MAXTON PATRICK M ,  JOHNSON KENNETH C ,  NIKOONAHAD MEHRDAD

IPC: G01B11/00 ,  G01B11/06 ,  G01B11/26 ,  G01J3/02 ,  G01J3/447 ,  G01J4/04 ,  G01N21/21 ,  G01N21/27 ,  G01N21/41

CPC classification number: G01N21/211 ,  G01B11/0641

Abstract: Two phase modulators or polarizing elements are employed to modulate the polarization of an interrogating radiation beam before and after the beam has been modified by a sample to be measured. Radiation so modulated and modified by the sample is detected and up to 25 harmonics may be derived from the detected signal. The up to 25 harmonics may be used to derive ellipsometric and system parameters, such as parameters related to the angles of fixed polarizing elements, circular deattenuation, depolarization of the polarizing elements and retardances of phase modulators. A portion of the radiation may be diverted for detecting sample tilt or a change in sample height. A cylindrical objective may be used for focusing the beam onto the sample to illuminate a circular spot on the sample. The above-described self-calibrating ellipsometer may be combined with another optical measurement instrument such as a polarimeter, a spectroreflectometer or another ellipsometer to improve the accuracy of measurement and/or to provide calibration standards for the optical measurement instrument. The self-calibrating ellipsometer as well as the combined system may be used for measuring sample characteristics such as film thickness and depolarization of radiation caused by the sample.

Abstract translation: 采用两相调制器或偏振元件来调制光束已被待测样品修改之前和之后的询问辐射束的极化。 检测由样本调制和修改的辐射，并且可以从检测到的信号导出多达25个谐波。 可以使用多达25个谐波来导出椭偏和系统参数，例如与固定偏振元件的角度相关的参数，圆形去衰减，偏振元件的去极化和相位调制器的延迟。 可以转移一部分辐射以检测样品倾斜或样品高度的变化。 可以使用圆柱形物镜将光束聚焦到样品上以照亮样品上的圆形斑点。 上述自校准椭偏仪可以与另一种光学测量仪器如偏振计，分光光度计或其他椭偏仪组合，以提高测量精度和/或为光学测量仪器提供校准标准。 自校准椭偏仪以及组合系统可用于测量由样品产生的辐射的膜厚度和去极化的样品特性。

公开(公告)号：WO2013006248A2

公开(公告)日：2013-01-10

申请号：PCT/US2012042071

申请日：2012-06-12

Applicant: KLA TENCOR CORP ,  KRISHNAN SHANKAR ,  WANG HAIMING

Inventor： KRISHNAN SHANKAR ,  WANG HAIMING

CPC classification number: G01N21/55 ,  G01B11/065 ,  G01B2210/56 ,  G01J3/021 ,  G01J3/0229 ,  G01J3/42 ,  G01N21/00 ,  G01N21/211 ,  G01N2021/213 ,  G01N2021/214 ,  G01N2201/0675

Abstract: A spectroscopic instrument for conducting multi-wavelength, multi-azimuth, multi-angle-of-incidence readings on a substrate, the instrument having a broadband light source for producing an illumination beam, an objective for directing the illumination onto the substrate at multiple azimuth angles and multiple angles-of-incidence simultaneously, thereby producing a reflection beam, an aperture plate having an illumination aperture and a plurality of collection apertures formed therein for selectively passing portions of the reflection beam having desired discrete combinations of azimuth angle and angle-of-incident, a detector for receiving the discrete combinations of azimuth angle and angle-of-incident and producing readings, and a processor for interpreting the readings.

Abstract translation: 一种用于在衬底上进行多波长，多方位角，多角度入射读数的光谱仪器，所述仪器具有用于产生照明光束的宽带光源，用于将照明引导到多个方位角的衬底上的物镜 从而产生反射光束，具有照射孔径和形成在其中的多个收集孔径的孔径板，用于选择性地通过具有方位角和角度的所需离散组合的反射光束的部分 - 事件，用于接收方位角和入射角的离散组合并产生读数的检测器，以及用于解释读数的处理器。

公开(公告)号：WO0065331A9

公开(公告)日：2002-06-13

申请号：PCT/US0010875

申请日：2000-04-21

Applicant: KLA TENCOR CORP

Inventor： WANG HAIMING ,  MAXTON PATRICK M ,  JOHNSON KENNETH C ,  NIKOONAHAD MEHRDAD

IPC: G01B11/00 ,  G01B11/06 ,  G01B11/26 ,  G01J3/02 ,  G01J3/447 ,  G01J4/04 ,  G01N21/21 ,  G01N21/27 ,  G01N21/41

CPC classification number: G01N21/211 ,  G01B11/0641

Abstract: Two phase modulators or polarizing elements are employed to modulate the polarization of an interrogating radiation beam before and after the beam has been modified by a sample to be measured. The detected signal may be used to derive ellipsometric and system parameters, such as parameters related to the angle of fixed polarizing elements and retardances of phase modulators. A portion of the radiation may be diverted for detecting sample tilt or a change in sample height. A cylindrical objective may be used for focusing the beam onto the sample to illuminate a circular spot on the sample. The above-described self-calibrating ellipsometer may be combined with another optical measurement instrument such as a polarimeter, a spectroreflectometer or another ellipsometer to improve the accuracy of measurement and/or to provide calibration standards for the optical measurement instrument. The self-calibrating ellipsometer as well as the combined system may be used for measuring sample characteristics such as film thickness and depolarization of radiation caused by the sample.

Abstract translation: 采用两相调制器或偏振元件来调制光束已被待测样品修改之前和之后的询问辐射束的极化。 检测到的信号可用于导出椭偏和系统参数，例如与固定的偏振元件的角度相关的参数和相位调制器的延迟。 可以转移一部分辐射以检测样品倾斜或样品高度的变化。 可以使用圆柱形物镜将光束聚焦到样品上以照亮样品上的圆形斑点。 上述自校准椭偏仪可以与另一种光学测量仪器如偏振计，分光光度计或其它椭偏仪组合，以提高测量的精度和/或为光学测量仪器提供校准标准。 自校准椭偏仪以及组合系统可用于测量由样品产生的辐射的膜厚度和去极化的样品特性。

公开(公告)号：DE69922491D1

公开(公告)日：2005-01-13

申请号：DE69922491

申请日：1999-02-08

Applicant: KLA TENCOR CORP

Inventor： NIKOONAHAD MEHRDAD ,  LEE SHING ,  WANG HAIMING

IPC: G01B21/08 ,  G01B17/02 ,  G01N29/00 ,  G01N29/24 ,  G01N29/34

Abstract: Thickness of a film in a sample may be detected by directing pump laser pulses to the surface of a sample to generate an acoustic pulse in a sample. The acoustic pulse propagates downwards until it reaches an interface between the bottom of the film and a substrate and is reflected back to the top surface of the film as a first echo. A reflection of the first echo propagates downwards and is again reflected back towards the surface as a second echo. Interferometry is used to measure the lapse of time between the first and second echos from which the thickness of the film may be determined.

公开(公告)号：AU2591799A

公开(公告)日：1999-09-15

申请号：AU2591799

申请日：1999-02-08

Applicant: KLA TENCOR CORP

Inventor： NIKOONAHAD MEHRDAD ,  LEE SHING ,  WANG HAIMING

IPC: G01B21/08 ,  G01B17/02 ,  G01N29/00 ,  G01N29/24 ,  G01N29/34

Abstract: Thickness of a film in a sample may be detected by directing pump laser pulses to the surface of a sample to generate an acoustic pulse in a sample. The acoustic pulse propagates downwards until it reaches an interface between the bottom of the film and a substrate and is reflected back to the top surface of the film as a first echo. A reflection of the first echo propagates downwards and is again reflected back towards the surface as a second echo. Interferometry is used to measure the lapse of time between the first and second echos from which the thickness of the film may be determined.

公开(公告)号：EP2707696A4

公开(公告)日：2014-10-22

申请号：EP12786720

申请日：2012-04-09

Applicant: KLA TENCOR CORP

Inventor： KRISHNAN SHANKAR ,  WANG HAIMING

IPC: G01N21/21 ,  G01B11/06 ,  G01J4/00 ,  G01N21/956

CPC classification number: G01B11/0641 ,  G01B2210/56 ,  G01N21/211 ,  G01N21/956

Abstract: A Mueller ellipsometer of the type having a first rotating element on an incident beam side of a sample and a second rotating element on a reflected beam side of the sample and a detector having an integration time, having a controller for selectively and separately adjusting (1) a first angular frequency of the first rotating element and (2) a second angular frequency of the second rotating element.