公开(公告)号：WO9924379A2

公开(公告)日：1999-05-20

申请号：PCT/US9823668

申请日：1998-11-06

Applicant: UNITED TECHNOLOGIES CORP

Inventor： MCCLUSKEY PHILIP H ,  EATON HARRY E JR ,  GODIN DANIEL R ,  FOSTER GEORGE E ,  HARTER H DAVID ,  CHIN STEPHEN ,  COTNOIR GLENN A ,  ELLIS CHARLES A

IPC: C04B41/87 ,  C23C4/10 ,  C23C4/12 ,  C04B41/00

CPC classification number: C04B41/5037 ,  C04B41/009 ,  C04B41/87 ,  C23C4/11 ,  C23C4/134 ,  F01D5/288 ,  F05D2230/312 ,  F05D2240/55 ,  F05D2300/2261 ,  Y10T428/252 ,  C04B41/0072 ,  C04B41/4527 ,  C04B35/565 ,  C04B35/584 ,  C04B35/806

Abstract: Coatings containing at least 85 % by volume crystalline mullite with less than 15 % by volume of amorphous material and mullite dissociation phases are plasma sprayed onto the surface of a silicon based ceramic substrate by closely controlling the plasma spray parameters including the mullite feed stock and its particle size, the nozzle outlet stand-off distance, movement of the substrate past the plasma flow, back side heating of the substrate and the powder feed rate through the plasma spray gun.

Abstract translation: 含有至少85体积％的具有小于15体积％的非晶材料和莫来石解离相的结晶莫来石的涂层通过密切控制包括莫来石原料及其莫来石原料的等离子体喷涂参数而被等离子体喷涂到硅基陶瓷基板的表面上 颗粒尺寸，喷嘴出口间隔距离，基板通过等离子体流动的运动，基板的背面加热和通过等离子体喷枪的粉末进给速率。

公开(公告)号：EP3097219A4

公开(公告)日：2017-02-15

申请号：EP15737817

申请日：2015-01-08

Applicant: UNITED TECHNOLOGIES CORP

Inventor： TRUBELJA MLADEN F ,  LITTON DAVID A ,  DEPALMA JOSEPH A ,  NEAL JAMES W ,  MALONEY MICHAEL ,  BEERS RUSSELL A ,  HAZEL BRIAN T ,  COTNOIR GLENN A

IPC: C23C14/06 ,  C23C14/08 ,  C23C14/22 ,  C23C14/24 ,  C23C14/30 ,  C23C14/50 ,  C23C14/54 ,  F01D9/04 ,  F01D15/10

CPC classification number: C23C14/542 ,  C23C14/083 ,  C23C14/243 ,  C23C14/30 ,  C23C14/505 ,  C23C14/54 ,  F01D9/041 ,  F01D15/10 ,  F05D2220/32 ,  F05D2230/313 ,  F05D2230/90 ,  F05D2300/2118

Abstract: A method for use in a physical vapor deposition coating process includes depositing a ceramic coating material from a plume onto at least one substrate to form a ceramic coating thereon, and during the deposition, rotating the at least one substrate at rotational speed selected with respect to deposition rate of the ceramic coating material onto the at least one substrate.

Abstract translation: 用于物理气相沉积涂覆方法的方法包括将陶瓷涂层材料从羽状物沉积到至少一个基底上以在其上形成陶瓷涂层，并且在沉积期间，以相对于 陶瓷涂层材料沉积到至少一个基底上。