Abstract:
PURPOSE: A bulk acoustic resonator including phase differences is provided to increase electric acoustic coupling factor by reducing loss generated by an acoustic wave of a vertical direction. CONSTITUTION: A bulk acoustic resonator comprises an air joint (270), a bulk acoustic resonation unit (260), and a reflection layer (220). The air joint is located on a circuit board (210). The bulk acoustic resonation unit comprises a first electrode (230), a second electrode (250), and a piezoelectric layer (240) located between the first electrode and the second electrode. The reflection layer reflects the wave of a resonance frequency generated in the piezoelectric layer based on a signal applied to the first electrode and the second electrode located at the bottom of the bulk acoustic resonation unit.
Abstract:
PURPOSE: A resonator including three terminals and a manufacturing method thereof are provided to operate An RF device with low power by including a nano wire. CONSTITUTION: A resonator including three terminals includes a substrate, a drain electrode(110), a source electrode(120), and a nano wire(130). The drain electrode is formed on the upper side of the substrate. The source electrode is formed on the upper side of the substrate. The nano wire is separated from the upper side of the substrate. The nano wire is connected to the drain electrode and the source electrode.
Abstract:
PURPOSE: A volume acoustic resonator structure and a manufacturing method are provided to reduce power lost through electrodes by the formation of an air cavity on the lower part of the electrodes connecting to a resonator. CONSTITUTION: A first substrate(110) comprises a via hole(113) formed in a fixed region of a lower surface. An insulating layer(115) is formed of insulating materials to expose the fixed region of an electrode pad(117). A first laminate resonant part(120) comprises a first air cavity(121) formed on the top of the first substrate and a first bottom electrode-piezoelectric layer-top electrode laminated on the top of the first air cavity. The second laminate resonant part(130) comprises a second air cavity(131) formed on the top of the first substrate and the second bottom electrode-piezoelectric layer-top electrode laminated on the top of the second air cavity. The first electrode part(140) is formed in order to connect the first laminate resonant part and the second laminate resonant part through the bottom electrode(123) or the top electrode(127).
Abstract:
PURPOSE: A device protection cap which uses a photo-sensitive glass substrate and a manufacturing method thereof are provided to arrange a penetration hole by wet-etching the photo-sensitive glass substrate, thereby preventing the generation of scallop or footing phenomenon in an etched part. CONSTITUTION: A photo-sensitive glass substrate(101) protects a device while being installed in the upper part of a device substrate. A penetration hole(110) is arranged within the photo-sensitive glass substrate. A first metal wiring layer(120) is arranged in the inside of the penetration hole. A second metal wiring layer(130) is arranged in a partial area of the upper or lower surface of the photo-sensitive glass substrate. The second metal wiring layer is connected to the first metal wiring layer.
Abstract:
PURPOSE: A multiplexer and multiband including a meta material phase shifter are provided to manufacture the multiband of the small size as one or more inductor and to short the box of a second multiplexer. CONSTITUTION: A receiving band filter(210) includes one or more first inductor for attenuation. The first inductor has a lumped element, the form of a distributed line, and the form of a meander line. The receiving band filter includes one or more resonator. A transmission band filter(230) includes one or more second inductor. The transmission band filter includes one or more resonator. A meta material phase shifter(220) is located between the receiving band filter and the transmitting band filter.
Abstract:
PURPOSE: A dual-input dual-output filtering device using bulk acoustic wave resonator and resonance device used as the bulk acoustic wave resonator are provided to reduce the number of devices by arranging the dual-input dual-output filtering device on the following stage of an analog RF area. CONSTITUTION: A filtering device comprises a bridge(110) and a first ladder(120). The bridge comprises a first BAWR, a second BAWR, a third BAWR, and a fourth BAWR which are connected in series. The third BAWR is connected to an input stage of the first BAWR and an output stage of the second BAWR. The fourth BAWR is connected to the output stage of the first BAWR and an input stage of the second BAWR.
Abstract:
PURPOSE: An RF front and module and a multiband communications module using the same are provided to constitute a front end by a diplexer and a bandpass filter thereby improving band attenuation characteristic. CONSTITUTION: A plurality of BPFs(Band Pass Filters)(211~215) passes the preset band signal. The plurality of BPFs is connected to a front end of at least one of diplexers(221~223). The at least one of diplexers includes a dual input port and a single output port. A rear end of two BPFs among a plurality of BPFs is connected to the dual input port. The degradation of the insertion loss characteristic is prevented.
Abstract:
A resonance complex utilizing the wire of a resonant tunneling transistor and a resonance complex manufacturing method are provided to be easily usable in the various low power communications systems. A resonance complex comprises a first terminal(110), a second terminal(120), a wiring unit(130), a third terminal(150), and a potential barrier unit(140). The second terminal is faced with the first terminal. The wiring unit connects the first terminal and the second terminal interval. The wiring unit is resonated to the third terminal. The potential barrier unit is formed on the wiring unit. The potential barrier unit provides the negative resistance component.
Abstract:
A monolithic duplexer and a method of manufacturing the same are provided to secure the high isolation by suppressing an interference effect between devices integrated on the monolithic duplexer. Plural devices are spaced apart from each other on a predetermined region of a device wafer. A first sealing portion is formed on both sides of the device wafer, and a first ground surface is formed between the devices. A predetermined region on a cap wafer(40) is etched to form protrusions on both sides of the cap wafer and a ground post(42) between the protrusions. A second sealing portion(48) is formed under the protrusion, and second ground surfaces(46) are formed to enclose the ground post. A via(50) is formed vertically penetrate the cap wafer. The device wafer is connected to the cap wafer.