公开(公告)号：EP2050100B1

公开(公告)日：2011-06-01

申请号：EP07823313.7

申请日：2007-07-20

Applicant: Xenocs

Inventor： BOULEE, Pascal ,  CENDA, Dan Mihai ,  HOGHOJ, Peter

IPC: G21K1/04 ,  G01N23/223 ,  H05G1/02

CPC classification number: H05G1/02 ,  G21K1/04

Abstract: The invention relates to a system (1) for delivering an X-ray beam, comprising a source block (100) that emits a source X-ray beam and conditioning means (500) for conditioning the source beam sent towards a specimen. The system (1) includes stabilization means (800) designed to thermally stabilize a region of the system (1) lying downstream of the source block (100), in order to limit heat transfer towards the conditioning means for the purpose of preventing thermal perturbations in the conditioning means (500).

公开(公告)号：EP1854120A1

公开(公告)日：2007-11-14

申请号：EP06709515.8

申请日：2006-02-14

Applicant: COMMISSARIAT A L'ENERGIE ATOMIQUE ( CEA) ,  Xenocs

Inventor： MOY, Jean-Pierre

IPC: H01J35/10 ,  H05G2/00

CPC classification number: H01J35/105 ,  H01J35/106 ,  H01J35/20 ,  H01J2235/081 ,  H01J2235/084 ,  H01J2235/088 ,  H01J2235/1229 ,  H01J2235/1237 ,  H01J2235/1258 ,  H01J2235/1262

Abstract: The invention relates to a monochromatic X-ray source having a target (1) which is made, for example, from a material containing emitting atoms comprising one element, said atoms being excited with the electron bombardment essentially of the electrons situated on the K layers of the atoms. The material forming the target is generally in the solid state and is held together by means of structuring atoms which represent one or more elements and which are bound to the emitting atoms, said structuring atoms having a coefficient representing absorption of the X-rays emitted by the emitting atoms of less than or equal to 2.3 µm-1.

公开(公告)号：EP1732087A2

公开(公告)日：2006-12-13

申请号：EP06120020.0

申请日：2003-06-19

Applicant: Xenocs

Inventor： Hoghoj, Peter ,  Dariel, Aurélien ,  Rodrigues, Sergio

IPC: G21K1/06

CPC classification number: B82Y10/00 ,  G21K1/06 ,  G21K2201/061 ,  G21K2201/062 ,  G21K2201/064

Abstract: La présente invention concerne un ensemble optique réflectif multicouche (10) à gradient latéral dont la surface réfléchissante est destinée à réfléchir des rayons X incidents sous faible angle d'incidence en produisant un effet optique bidimensionnel, caractérisé par le fait que ladite surface réfléchissante est constituée d'une surface unique, ladite surface réfléchissante étant conformée selon deux courbures correspondant à deux directions différentes.
La présente invention concerne également un procédé de fabrication d'un tel ensemble optique, caractérisé en ce que le procédé comprend le revêtement d'un substrat présentant déjà une courbure, et la courbure de ce substrat selon une deuxième direction différente.
L'invention concerne enfin un dispositif de génération et de conditionnement de rayons X pour des applications de réflectométrie RX dispersive en angle comprenant un ensemble optique tel que mentionné ci-dessus couplé à une source rayons X de telle sorte que les rayons X émis par la source sont conditionnés en deux dimensions afin d'adapter le faisceau émis par la source à destination d'un échantillon, les rayons X ayant des angles d'incidences différents sur l'échantillon considéré.

Abstract translation: 多层反射光学单元具有横向梯度，其反射表面用于反射以锐角入射的X射线并产生二维光学效应。 所述反射表面具有沿着两个不同方向上的两个曲线成形的单个表面。 本发明还涉及用于制造这样的光学单元的相应方法，其中沿着不同方向涂覆已经弯曲的基底，以及用于处理X射线的装置，用于RX角色散反射测量，其用于调节光束入射 在样品上，使其包含具有不同入射角的光线。

公开(公告)号：EP1514279A1

公开(公告)日：2005-03-16

申请号：EP03760747.0

申请日：2003-06-19

Applicant: Xenocs

Inventor： HOGHOJ, Peter ,  DARIEL, Aurélien ,  RODRIGUES, Sergio

IPC: G21K1/06

CPC classification number: B82Y10/00 ,  G21K1/06 ,  G21K2201/061 ,  G21K2201/062 ,  G21K2201/064

Abstract: The invention relates to an optical device which is intended to process an incident X-ray beam. The inventive device comprises: a monochromator; and an optical incident beam-conditioning element with a reflecting surface which can produce a bi-dimensional optical effect in order to adapt a beam directed towards the monochromator, the aforementioned optical element comprising a multi-layered, X-ray-reflecting surface. The invention is characterised in that the reflecting surface comprises a single surface, said reflecting surface being curved in two different directions.

公开(公告)号：EP1395857A2

公开(公告)日：2004-03-10

申请号：EP02743341.6

申请日：2002-05-31

Applicant: Xenocs

Inventor： HOGHOJ, Peter

IPC: G02B5/26 ,  G02B5/28 ,  G03F1/00 ,  C23C14/22 ,  G03F1/14 ,  G02B5/08

CPC classification number: G02B5/0883 ,  B82Y10/00 ,  B82Y40/00 ,  G02B5/1838 ,  G02B5/26 ,  G02B5/283 ,  G03F1/24 ,  G03F1/26 ,  G03F7/70058 ,  G03F7/70958 ,  G21K1/06

Abstract: One of the aspects of the invention relates to a method for altering the reflective qualities of desired regions of a multi-layered structure (30) which is exposed to radiation of a given wavelength value and for modifying said radiation in a desired manner by means of reflection, said alteration method involving the exposure of desired regions of the multi-layered structure to a beam (20) of energy, characterized in that the inventive method includes control of the exposure of the desired regions of the multi-layered structure to the beam of particles, whereby the reflectivity peak of each region of the structure can be shifted in a desired manner within the wavelength spectrum. A second aspect of the invention relates to a reflective lithographic mask and a mirror for X-rays carried out according to said method, in addition to the use of said method for rectifying the optical properties of a multi-layered structure.

公开(公告)号：EP4339602B8

公开(公告)日：2025-01-08

申请号：EP22306351.2

申请日：2022-09-14

Inventor： Høghøj, Peter ,  Coué, Christophe ,  Cavallari, Chiara ,  Monge, Nicolas

IPC: G01N23/201

公开(公告)号：EP4339602B1

公开(公告)日：2024-10-16

申请号：EP22306351.2

申请日：2022-09-14

Inventor： Høghøj, Peter ,  Coué, Christophe ,  Cavallari, Chiara ,  Monge, Nicolas

IPC: G01N23/201

公开(公告)号：EP3845892B1

公开(公告)日：2022-01-05

申请号：EP20197189.2

申请日：2020-09-21

Inventor： LANTZ, Blandine (c/o Xenocs SAS) ,  HØGHØJ, Peter (c/o Xenocs SAS)

IPC: G01N23/207 ,  G01N23/201 ,  G01N23/20 ,  G21K1/06

公开(公告)号：EP3246695A1

公开(公告)日：2017-11-22

申请号：EP16290087.2

申请日：2016-05-20

Applicant: Xenocs

Inventor： Høghøj, Peter

IPC: G01N23/20 ,  G01N23/201

CPC classification number: G01N23/20008 ,  G01N23/20 ,  G01N23/201 ,  G01N2223/50

Abstract: The invention relates to an X-ray scattering apparatus, comprising:
- a sample holder for aligning and orienting a sample (12) to be analyzed by X-ray scattering;
- an X-ray beam delivery system arranged upstream of the sample holder for generating and directing a direct X-ray beam along a propagation direction (X) towards the sample holder;
- a proximal X-ray detector (10) arranged downstream of the sample holder such as to let the direct X-ray beam pass and detect X rays scattered from the sample (12); and
- a distal X-ray detector (14)arranged downstream of the sample holder and movable along the propagation direction (X) of the direct X-ray beam; wherein the proximal X-ray detector (10) is also movable essentially along the propagation direction (X) of the direct X-ray beam.

Abstract translation: X射线散射装置技术领域本发明涉及一种X射线散射装置，包括：样品架，用于通过X射线散射来对准和定向要分析的样品（12）; - 布置在样本保持器上游的X射线束传送系统，用于沿传播方向（X）产生并引导朝向样本保持器的直接X射线束; - 近侧X射线探测器（10），其布置在所述样本架的下游，以使所述直接X射线束通过并检测从所述样本（12）散射的X射线; 以及 - 远端X射线探测器（14），其布置在所述样本保持器的下游并且可沿着所述直接X射线束的传播方向（X）移动; 其中近侧X射线探测器（10）也基本上沿直接X射线束的传播方向（X）移动。

公开(公告)号：EP2526412A1

公开(公告)日：2012-11-28

申请号：EP11700350.9

申请日：2011-01-18

Applicant: Xenocs

Inventor： PANINE, Pierre ,  HOGHOJ, Peter

IPC: G01N23/201

CPC classification number: G01N23/201

Abstract: The invention relates to a device for delivering a beam of X-rays for analyzing a sample (50), including: a source unit (100) including X-ray emission means; an optical unit (200) set downstream of the source block (100), said optical block (200) including an optical monochromator component (210) having a reflective surface (212) designed to condition the X-rays emitted by the source unit (100) using a unidimensional or bidimensional optical effect; and X-ray definition means (300) comprising: a collimating member (310) for spatially delimiting the X-rays conditioned by the optical monochromator component (210), set downstream of the optical monochromator component (210) and comprising one or more plates (311) having portions (313) arranged to form a delimiting orifice (312), said portions (313) being coated with a monocrystalline material limiting the diffusion of X-rays; a cutoff member (320) for the X-rays emitted by the source unit (100), including X-ray absorption means arranged in the delivery device to cut off the direct X-ray beams liable to reach the spatial delimitation collimating member (310) without conditioning by the optical monochromator component (210).

Abstract translation: 本发明涉及一种用于传送X射线束用于分析样品（50）的装置，包括：包括X射线发射装置的源块（100）; 位于所述源块（100）的下游的光学块（200），所述光学块（200）包括光学单色仪部件（210），所述光学单色仪部件具有设置用于调节源极块（100）发射的X射线的反射表面（212） ）根据一维或二维光学效应; 和X射线的定义装置（300），包括：防扩散构件（310），用于在光学单色仪部件（210）的下游空间上限定由光学单色器部件（210）调节的X射线，并且包括一个或 更多的板（311）具有布置成形成界定孔（312）的部分（313），所述部分（313）涂覆有限制X射线散射的单晶材料; 由所述源块（100）发射的X射线的切断构件（320），包括布置在所述输送装置中的X射线吸收装置，以切断可能达到空间定界抗扩散的直接X射线束 （310），而不用光学单色器部件（210）进行调理。