公开(公告)号：EP0336282B1

公开(公告)日：1992-06-10

申请号：EP89105565.9

申请日：1989-03-29

Applicant: SIEMENS AKTIENGESELLSCHAFT

Inventor： Friede, Dirk, Dr. ,  Cirkel, Hans-Jürgen, Dr. ,  Baumgartl, Rudolf ,  Schmutzler, Matthias

IPC: H01J35/00 ,  H01J33/00 ,  H01S3/09

CPC classification number: H01S3/09716 ,  H01J3/025 ,  H01J17/40 ,  H01J33/00 ,  H01J35/06 ,  H01J35/08 ,  H01J2235/186

公开(公告)号：EP0421648A3

公开(公告)日：1991-09-18

申请号：EP90310416.4

申请日：1990-09-24

Applicant: BRITISH AEROSPACE PUBLIC LIMITED COMPANY

Inventor： Scott, Simon Joseph

IPC: H01J3/02

CPC classification number: H01J3/025 ,  H01S3/038 ,  H01S3/09716

Abstract: A surface discharge plasma cathode electron beam generating assembly (1) includes an anode (2) maintainable at a substantially constant first potential, a cathode device (3) having a first electrically conductive member (4), a dielectric member (5) at least partially surrounding the first member (4) and electrically conductive means (6) located on the outer surface of the dielectric member (5) and insulated therefrom. A capacitative divider circuit (7) is provided for maintaining the first electrically conductive member (4) at a second potential different from the first potential and for maintaining the electrically conductive means (6) at a high negative third potential relative to the first and second potentials.

公开(公告)号：EP0421648A2

公开(公告)日：1991-04-10

申请号：EP90310416.4

申请日：1990-09-24

Applicant: BRITISH AEROSPACE PUBLIC LIMITED COMPANY

Inventor： Scott, Simon Joseph

IPC: H01J3/02

CPC classification number: H01J3/025 ,  H01S3/038 ,  H01S3/09716

Abstract: A surface discharge plasma cathode electron beam generating assembly (1) includes an anode (2) maintainable at a substantially constant first potential, a cathode device (3) having a first electrically conductive member (4), a dielectric member (5) at least partially surrounding the first member (4) and electrically conductive means (6) located on the outer surface of the dielectric member (5) and insulated therefrom. A capacitative divider circuit (7) is provided for maintaining the first electrically conductive member (4) at a second potential different from the first potential and for maintaining the electrically conductive means (6) at a high negative third potential relative to the first and second potentials.

Abstract translation: 表面放电等离子体阴极电子束产生组件（1）包括可维持在基本上恒定的第一电位的阳极（2），具有第一导电构件（4），至少电介质构件（5）的阴极装置（3） 部分地围绕位于电介质构件（5）的外表面上并与之绝缘的第一构件（4）和导电装置（6）。 提供电容分压器电路（7），用于将第一导电构件（4）保持在不同于第一电位的第二电位，并且用于将导电装置（6）相对于第一和第二电极保持在高负的第三电位 潜力。

公开(公告)号：EP2936538A1

公开(公告)日：2015-10-28

申请号：EP13826886.7

申请日：2013-12-20

Applicant: Organic Spintronics S.R.L.

Inventor： YARMOLICH, Dmitry ,  TALIANI, Carlo

IPC: H01J37/077 ,  H01J37/305

CPC classification number: C23C16/515 ,  C23C16/487 ,  H01J3/025 ,  H01J37/077 ,  H01J37/30 ,  H01J37/3053 ,  H01J37/32532 ,  H01J2237/06375 ,  H01J2237/151 ,  H01J2237/3132

Abstract: A pulsed plasma deposition device, comprising an apparatus for generating a beam of electrons (3), a target (4) and a substrate (6), the apparatus (3) being suitable for generating a pulsed beam of electrons directed towards said target (4) to determine the ablation of the material of said target (4) in the form of a plasma plume (19) directed towards said substrate (6); the device comprises a transportation and focussing group (13) of the beam of electrons towards said target (4), arranged between said apparatus (3) and said target (4) and comprising a transportation cone (14), the transportation and focussing group (13) also comprising a focussing electrode (15) directly connected to the transportation cone (14) and shaped substantially like a loop; the axis of symmetry (16) of the focussing electrode (15) is perpendicular, or substantially perpendicular, to the surface of the target (4).

公开(公告)号：EP2633543A1

公开(公告)日：2013-09-04

申请号：EP11764469.0

申请日：2011-09-08

Applicant: Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V.

Inventor： MATTAUSCH, Gösta ,  FEINÄUGLE, Peter ,  KIRCHHOFF, Volker ,  WEISKE, Dieter ,  FLASKE, Henrik ,  ZEIBE, Rainer

IPC: H01J3/02 ,  H01J37/077 ,  H01J37/075

CPC classification number: H01J37/075 ,  H01J3/025 ,  H01J37/077 ,  H01J2237/3104 ,  H01J2237/3128 ,  H01J2237/3132

Abstract: The invention relates to a device for producing an electron beam, comprising a housing (12), which bounds a space (13) that can be evacuated and has an electron beam outlet opening; an inlet (16) for feeding a process gas into the space (13) that can be evacuated; a planar cathode (14) and an anode (15), which are arranged in the space (13) that can be evacuated and between which a glow-discharge plasma can be produced by means of an applied voltage, wherein ions can be accelerated from the glow-discharge plasma onto the surface of the cathode (14). The cathode has a first part (14a) made of a first material, which forms a centrally arranged first surface region of the cathode (14), and a second part (14b) made of a second material, which forms a second surface region of the cathode (14) that encloses the first surface region. The first material can be heated by the impingement with accelerated ions to a temperature at which electrons escape the first material predominantly due to thermionic emission.

公开(公告)号：EP2411996B1

公开(公告)日：2013-03-13

申请号：EP10732416.2

申请日：2010-03-23

Applicant: Organic Spintronics S.R.L.

Inventor： LOTTI, Riccardo ,  NOZAR, Petr ,  TALIANI, Carlo

IPC: H01J3/02 ,  H01J37/077

CPC classification number: H01J3/025

公开(公告)号：EP2411996A2

公开(公告)日：2012-02-01

申请号：EP10732416.2

申请日：2010-03-23

Applicant: Organic Spintronics S.R.L.

Inventor： LOTTI, Riccardo ,  NOZAR, Petr ,  TALIANI, Carlo

IPC: H01J3/02 ,  H01J37/077

CPC classification number: H01J3/025

Abstract: Device (1) for generating plasma and for directing an flow of electrons towards a specific target (3); the device (1) comprises a hollow cathode (5); a main electrode (7) at least partially placed inside the cathode (5); a resistor (12), electrically earthing the main electrode (7); a substantially dielectric tubular element (21) extending through a wall (22) of the cathode; a ring-shaped anode (25) placed around the tubular element (21) and earthed; and an activation group (11) which is electrically connected to the cathode (5) and is able to reduce the electric potential of the cathode (5) of at least 8 kV in about 10 ns.

公开(公告)号：EP1867221B1

公开(公告)日：2011-07-27

申请号：EP06724055.6

申请日：2006-04-05

Applicant: Matacotta, Francesco Cino ,  Taliani, Carlo

Inventor： Matacotta, Francesco Cino ,  Taliani, Carlo

IPC: H05H1/54

CPC classification number: H05H1/54 ,  H01J1/025 ,  H01J3/025

Abstract: An apparatus and a process for generating, accelerating and propagating beams of electrons and plasma at high density, the apparatus comprising: a first dielectric tube, which contains gas; a hollow cathode, which is connected to said first dielectric tube; a second dielectric tube, which is connected to said hollow cathode and protrudes inside, and is connected to, a deposition chamber; an anode, which is arranged around said second dielectric tube, in an intermediate position; means for applying voltage to said cathode and said anode; means for evacuating the gas from the chamber; and means for spontaneous conversion of gas in the first dielectric tube into plasma.

公开(公告)号：EP1353352B1

公开(公告)日：2010-08-25

申请号：EP03007602.0

申请日：2003-04-02

Applicant: Astrium GmbH

Inventor： Schartner, Karl-Heinz, Prof. Dr. ,  Loeb, Horst, Prof. Dr. ,  Leiter, Hans Jürgen ,  Harmann, Hans-Peter

IPC: H01J3/02

CPC classification number: H01J3/025

公开(公告)号：EP1867221A2

公开(公告)日：2007-12-19

申请号：EP06724055.6

申请日：2006-04-05

Applicant: Matacotta, Francesco Cino ,  Taliani, Carlo

Inventor： Matacotta, Francesco Cino ,  Taliani, Carlo

IPC: H05H1/54

CPC classification number: H05H1/54 ,  H01J1/025 ,  H01J3/025

Abstract: An apparatus and a process for generating, accelerating and propagating beams of electrons and plasma at high density, the apparatus comprising: a first dielectric tube, which contains gas; a hollow cathode, which is connected to said first dielectric tube; a second dielectric tube, which is connected to said hollow cathode and protrudes inside, and is connected to, a deposition chamber; an anode, which is arranged around said second dielectric tube, in an intermediate position; means for applying voltage to said cathode and said anode; means for evacuating the gas from the chamber; and means for spontaneous conversion of gas in the first dielectric tube into plasma.