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    Optical glass
    101.
    发明授权
    Optical glass 失效
    光学玻璃

    公开(公告)号：US07727918B2

    公开(公告)日：2010-06-01

    申请号：US11932024

    申请日：2007-10-31

    Applicant: Tomohiro Watanabe ,  Taihei Mukaide ,  Hidenosuke Itoh

    Inventor： Tomohiro Watanabe ,  Taihei Mukaide ,  Hidenosuke Itoh

    IPC: C03C3/085

    CPC classification number: C03C4/0085 ,  C03B19/1438 ,  C03B2201/07 ,  C03B2201/23 ,  C03C3/085 ,  Y10T428/261

    Abstract: An optical glass that contains Si, Al, Mg, and O is provided. The optical glass contains Si in an amount of 40% or more and 60% or less, in cation percent, Al in an amount of 10% or more and 35% or less, in cation percent, and Mg in an amount of 20% or more and 35% or less, in cation percent. In the optical glass, the total amount of Si, Al, and Mg is 99.5% or more, in cation percent. Furthermore, the optical glass contains Fe and Na each in an amount of 0.01 wtppm or less and has a transmittance to a light having a wavelength of 248 nm of 40% or more at a thickness of 5 mm.

    Abstract translation: 提供含有Si，Al，Mg和O的光学玻璃。 光学玻璃的阳离子含量为40％以上且60％以下的Si，阳离子％为10％以上且35％以下的Al，20质量％的Mg， 以上且35％以下，以阳离子％计。 在光学玻璃中，Si，Al，Mg的总量为99.5％以上。 此外，光学玻璃含有0.01重量ppm以下的Fe和Na，并且对于厚度为5mm的波长为248nm的光的透射率为40％以上。

    Optical fiber manufacturing method and optical fiber
    107.
    发明授权
    Optical fiber manufacturing method and optical fiber 失效
    光纤制造方法和光纤

    公开(公告)号：US07010203B2

    公开(公告)日：2006-03-07

    申请号：US10479852

    申请日：2003-04-03

    Applicant: Tomoyuki Yokokawa ,  Eiji Yanada ,  Masaaki Hirano

    Inventor： Tomoyuki Yokokawa ,  Eiji Yanada ,  Masaaki Hirano

    IPC: G02B6/02 ,  G02B6/22

    CPC classification number: G02B6/03694 ,  C03B37/01211 ,  C03B37/01892 ,  C03B2201/03 ,  C03B2201/07 ,  C03B2203/22 ,  C03B2203/36 ,  G02B6/02261 ,  G02B6/02271 ,  G02B6/0228 ,  G02B6/03644 ,  G02B6/03666

    Abstract: An object of the present invention is to provide an optical fiber manufacturing method and an optical fiber in which an increase in the transmission loss is suppressed by preventing hydroxyl group from entering near the core portion.This invention provides a method for manufacturing an optical fiber 10 including forming a glass pipe 16 by applying a ring portion 15 on the inner face of a starting pipe 14 as a starting material, inserting a glass rod 13 that becomes a central core portion 11 and a depressed portion 12 into the inside of the glass pipe 16, integrating the glass pipe 16 and the glass rod 13 by collapse to form a glass body 17, forming a preform 10a by providing a jacket portion 18 outside the glass body 17, and drawing the preform 10a, wherein the thickness of the starting pipe 14 is set in a range from 4 mm to 8 mm.

    Abstract translation: 本发明的目的是提供一种光纤制造方法和光纤，其中通过防止羟基进入芯部附近而抑制传输损耗的增加。 本发明提供了一种制造光纤10的方法，该光纤10包括通过在作为起始材料的起始管14的内表面上施加环形部分15，插入成为中心芯部11的玻璃棒13和 在玻璃管16的内部设有凹部12，将玻璃管16和玻璃棒13倒塌形成玻璃体17，通过在玻璃体17的外侧设置护套部18而形成预制件10a; 拉制预制件10a，其中起始管14的厚度设定在4mm至8mm的范围内。

    Photolithography methods and systems
    108.
    发明授权
    Photolithography methods and systems 失效
    光刻方法和系统

    公开(公告)号：US06982232B2

    公开(公告)日：2006-01-03

    申请号：US10842979

    申请日：2004-05-11

    Applicant: Nicholas F. Borrelli ,  Charlene M. Smith ,  Johannes Moll

    Inventor： Nicholas F. Borrelli ,  Charlene M. Smith ,  Johannes Moll

    IPC: C03C3/06

    CPC classification number: G03F7/70041 ,  C03B19/1423 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/36 ,  C03C3/06 ,  C03C4/0085 ,  C03C23/002 ,  C03C2201/21 ,  C03C2201/23 ,  G03F7/70058 ,  G03F7/70941 ,  G03F7/70958 ,  G03F7/70966

    Abstract: Lithographic methods are disclosed. In one such method, a pulsed ultraviolet radiation source for producing ultraviolet lithography radiation having a wavelength shorter than about 300 nm at a fluence of less than 10 mJ/cm2/pulse and a high purity fused silica lithography glass having a concentration of molecular hydrogen of between about 0.02×1018 molecules/cm3 and about 0.18×1018 molecules/cm3 are provided. A lithography pattern is formed with the ultraviolet lithography radiation; the lithography pattern is reduced to produce a reduced lithography pattern; and the reduced lithography pattern is projected onto a ultraviolet radiation sensitive lithography medium to form a printed lithography pattern. At least one of the forming, reducing, and projecting steps includes transmitting the ultraviolet lithography radiation through the high purity fused silica lithography glass. Lithography systems and high purity fused silica lithography glass are also described.

    Abstract translation: 公开了平版印刷方法。 在一种这样的方法中，用于产生具有小于约300nm的波长的紫外光刻辐射的脉冲紫外辐射源，其注量小于10mJ / cm 2 /脉冲和高纯度熔融石英光刻 分子氢浓度在约0.02×10 18分子/ cm 3至约0.18×10 18分子/ cm 3之间的玻璃 。 用紫外光刻法形成光刻图案; 光刻图案被减少以产生减小的光刻图案; 并且将还原的光刻图案投影到紫外线照射敏感光刻介质上以形成印刷光刻图案。 形成，还原和突出步骤中的至少一个步骤包括通过高纯度熔融石英光刻玻璃传输紫外光刻辐射。 还描述了平版印刷系统和高纯度熔融石英光刻玻璃。

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