CRYOGENIC POLISHING METHOD FOR SOFT ACRYLIC ARTICLES
    113.
    发明申请
    CRYOGENIC POLISHING METHOD FOR SOFT ACRYLIC ARTICLES 审中-公开
    软质丙烯酸制品的低温抛光方法

    公开(公告)号:WO1998019826A1

    公开(公告)日:1998-05-14

    申请号:PCT/US1997019881

    申请日:1997-10-31

    Abstract: A method for polishing articles comprising soft acrylic materials is disclosed. The method includes a cryogenic polishing step and a cleaning step. In the polishing step, a receptacle is charged with polishing beads of various sizes, sodium bicarbonate, a swelling agent and the articles to be polished, for a period of time and at a rotation speed sufficient to remove surface irregularities. Following the polishing step, a receptacle is charged with (a) a cleaning slurry comprising cleaning beads of various sizes and (i) sodium hydroxide and water or (ii) alumina, a surfactant and a solvent and (b) the articles to be cleaned, for a period of time and at a rotation speed sufficient to clean the surface of the polished articles. Agitation is preferably accomplished by a tumbling machine.

    Abstract translation: 公开了一种用于抛光包含柔软丙烯酸材料的制品的方法。 该方法包括低温​​抛光步骤和清洁步骤。 在抛光步骤中,在容器中装入各种尺寸的抛光珠,碳酸氢钠,溶胀剂和待抛光的物品一段时间,并以足以去除表面不规则的旋转速度。 在抛光步骤之后,向容器中装入(a)包括各种尺寸的清洁珠粒和(i)氢氧化钠和水或(ii)氧化铝,表面活性剂和溶剂的清洁浆料的清洁浆料和(b)待清洁的物品 一段时间并且以足以清洁抛光制品表面的旋转速度。 搅拌优选通过滚筒机实现。

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