公开(公告)号：CA2709626A1

公开(公告)日：2011-12-21

申请号：CA2709626

申请日：2010-07-13

Applicant: BREWER SCIENCE INC

Inventor： MCCUTCHEON JEREMY W ,  BROWN ROBERT D

IPC: H01L21/687

Abstract: New demounting methods and apparatuses for separating temporarily, permanently, or semi-permanently bonded substrates and articles formed from those methods and apparatuses are provided. The methods comprise demounting a device wafer from a carrier wafer or substrate that have only been strongly bonded at their outer perimeters. The edge bonds are chemically, mechanically, acoustically, or thermally softened, dissolved, or disrupted to allow the wafers to be easily separated with very low forces and at or near room temperature at the appropriate stage in the fabrication process. A clamp for facilitating separation of the bonded substrates is also provided.

公开(公告)号：DE202009018064U1

公开(公告)日：2010-12-02

申请号：DE202009018064

申请日：2009-01-23

Applicant: BREWER SCIENCE INC

IPC: H01L21/60 ,  H01L21/98 ,  H01L23/492 ,  H01L23/52

公开(公告)号：DE60236210D1

公开(公告)日：2010-06-10

申请号：DE60236210

申请日：2002-02-11

Applicant: BREWER SCIENCE INC

Inventor： ENOMOTO TOMOYUKI ,  MIZUSAWA KEN-ICHI ,  ARASE SHIN-YA ,  PULIGADDA RAMA

IPC: G03F7/004 ,  G03F7/11 ,  C08F18/00 ,  C08F18/16 ,  C08F220/12 ,  C08F220/22 ,  C08F220/28 ,  C09D133/16 ,  G03F7/038 ,  G03F7/09 ,  G03F7/26 ,  G03F7/40 ,  H01L21/027

Abstract: Anti-reflective coatings formed from polymers and having high etch rates are provided. Broadly, the coatings are formed from a polymer binder and a light attenuating compound. The polymer binder has halogen atoms bonded thereto, preferably to functional groups on the polymer binder rather than to the polymer backbone. Preferred polymer binders comprise acrylic polymers while it is preferred that the halogenated functional groups of the polymer binders be dihalogenated, and more preferably trihalogenated, with chlorine, fluorine, or bromine atoms.

公开(公告)号：DE60141833D1

公开(公告)日：2010-05-27

申请号：DE60141833

申请日：2001-02-02

Applicant: BREWER SCIENCE INC

Inventor： PAGEL RUSSELL T ,  MCCUTCHEON JEREMY W ,  KOHNE JEFFREY L

IPC: B05C5/00 ,  B65D37/00 ,  B05C5/02 ,  B05C11/10 ,  B65D47/22 ,  F16K7/06 ,  H01L21/00

Abstract: A dispenser (10) for flowable, viscous material (52) is provided which includes a reservoir (50) for the material (52) with an elongated, synthetic resin deformable outlet tube (80) presenting an outlet end (82) coupled to the reservoir (50). A flow-controlling assembly (16) including a tube-engaging element (84, 132, 150, 158) and an actuator linkage assembly (86, 130, 144, 154) allows precise on-off operation of the dispenser (10). In the flow-permitting position, the element (84, 132, 150, 158) is adjacent the tube (80). When it is desired to terminate material flow, the actuator linkage assembly (86, 130, 144, 154) is operated to cause the element (84, 132,150, 158) to move into deforming engagement with the tube (80) against a backing surface (41); continued movement of the element (84, 132, 150, 158) along the length of the tube (80) in a direction away from outlet end (82) generates a suction force causing material (52) adjacent the end (82) to be drawn into the confines of the tube (80). This prevents air-drying of the material (52) at outlet end (82), ensuring continued smooth operation of the dispenser (10) while minimizing material loss. Preferably, the assembly (16) applies resilient flow-blocking force against the outlet tube (80).

公开(公告)号：AT464127T

公开(公告)日：2010-04-15

申请号：AT01906946

申请日：2001-02-02

Applicant: BREWER SCIENCE INC

Inventor： PAGEL RUSSELL ,  MCCUTCHEON JEREMY ,  KOHNE JEFFREY

IPC: B05C5/00 ,  B05C5/02 ,  B05C11/10 ,  B65D47/22 ,  F16K7/06 ,  H01L21/00

Abstract: A dispenser (10) for flowable, viscous material (52) is provided which includes a reservoir (50) for the material (52) with an elongated, synthetic resin deformable outlet tube (80) presenting an outlet end (82) coupled to the reservoir (50). A flow-controlling assembly (16) including a tube-engaging element (84, 132, 150, 158) and an actuator linkage assembly (86, 130, 144, 154) allows precise on-off operation of the dispenser (10). In the flow-permitting position, the element (84, 132, 150, 158) is adjacent the tube (80). When it is desired to terminate material flow, the actuator linkage assembly (86, 130, 144, 154) is operated to cause the element (84, 132,150, 158) to move into deforming engagement with the tube (80) against a backing surface (41); continued movement of the element (84, 132, 150, 158) along the length of the tube (80) in a direction away from outlet end (82) generates a suction force causing material (52) adjacent the end (82) to be drawn into the confines of the tube (80). This prevents air-drying of the material (52) at outlet end (82), ensuring continued smooth operation of the dispenser (10) while minimizing material loss. Preferably, the assembly (16) applies resilient flow-blocking force against the outlet tube (80).

公开(公告)号：AT444316T

公开(公告)日：2009-10-15

申请号：AT02797325

申请日：2002-12-13

Applicant: BREWER SCIENCE INC

Inventor： DESHPANDE SHREERAM

IPC: C08F220/68 ,  C08F8/14 ,  C08F24/00 ,  C08F34/02 ,  C08G59/14 ,  C08G59/32 ,  C08G59/42 ,  C08G59/62 ,  C08G63/68 ,  C08G63/91 ,  C08G65/329 ,  C09D133/02 ,  C09D163/00 ,  C09D167/00 ,  C09D171/02 ,  C09D201/02 ,  G03F7/00 ,  G03F7/09

Abstract: New polymers and new anti-reflective compositions containing such polymers are provided. The compositions comprise a polymer (e.g., epoxy cresol novolac resins) bonded with a chromophore (4-hydroxybenzoic acid, trimellitic anhydride). The inventive compositions can be applied to substrates (e.g., silicon wafers) to form anti-reflective coating layers having high etch rates which minimize or prevent reflection during subsequent photoresist exposure and developing.

公开(公告)号：DE60320292T2

公开(公告)日：2009-07-16

申请号：DE60320292

申请日：2003-09-19

Applicant: BREWER SCIENCE INC

Inventor： ENOMOTO TOMOYUKI ,  NAKAYAMA KEISUKE ,  PULIGADDA RAMA

IPC: H01L23/29 ,  B32B27/32 ,  G03F20060101 ,  G03F7/004 ,  G03F7/09 ,  H01L21/44

Abstract: The present invention relates to an anti-reflective coating composition characterized by comprising a resin made from triazine compounds having at least two nitrogen atoms substituted a hydroxymethyl group and/or an alkoxymethyl group, and a light absorbing compound and/or a light absorbing resin. The present invention offers an anti-reflective coating composition for the anti-reflective coating having high light absorption property of the light used for the lithography process in the preparation of semiconductor device, showing high reflective light preventing effect, being used at thinner film thickness more than before, and having greater dry etching rate in comparison to photoresist layer.

公开(公告)号：SG152244A1

公开(公告)日：2009-05-29

申请号：SG2009025776

申请日：2005-01-07

Applicant: BREWER SCIENCE INC

Inventor： LI CHENGHONG ,  RUBEN KIMBERLY A ,  FLAIM TONY D

IPC: B32B9/04 ,  C09D125/12 ,  H01L21/308 ,  H01L21/311

Abstract: New protective coating layers for use in wet etch processes during the production of semiconductor and MEMS devices are provided. The layers include a primer layer, a first protective layer, and an optional second protective layer. The primer layer preferably comprises an organo silane compound in a solvent system. The first protective layer includes thermoplastic copolymers prepared from styrene, acrylonitrile, and optionally other addition- polymerizable monomers such as (meth)acrylate monomers, vinylbenzyl chloride, and diesters of maleic acid or fumaric acid. The second protective layer comprises a highly halogenated polymer such as a chlorinated polymer which may or may not be crosslinked upon heating.

公开(公告)号：AT392011T

公开(公告)日：2008-04-15

申请号：AT03770384

申请日：2003-09-19

Applicant: BREWER SCIENCE INC

Inventor： ENOMOTO TOMOYUKI ,  NAKAYAMA KEISUKE ,  PULIGADDA RAMA

IPC: H01L23/29 ,  B32B27/32 ,  G03F20060101 ,  G03F7/004 ,  G03F7/09 ,  H01L21/44

Abstract: The present invention relates to an anti-reflective coating composition characterized by comprising a resin made from triazine compounds having at least two nitrogen atoms substituted a hydroxymethyl group and/or an alkoxymethyl group, and a light absorbing compound and/or a light absorbing resin. The present invention offers an anti-reflective coating composition for the anti-reflective coating having high light absorption property of the light used for the lithography process in the preparation of semiconductor device, showing high reflective light preventing effect, being used at thinner film thickness more than before, and having greater dry etching rate in comparison to photoresist layer.

公开(公告)号：DE60315177T2

公开(公告)日：2008-04-10

申请号：DE60315177

申请日：2003-05-13

Applicant: BREWER SCIENCE INC

Inventor： XU GU ,  MEADOR JIMMY D ,  BEHAVE MANDER R ,  DESHPANDE SHREERAM V ,  NOWAK KELLY A

IPC: C08F212/08 ,  C09D101/00 ,  C09D129/08 ,  G02B1/11 ,  G03F7/09 ,  H01L21/768

Abstract: New anti-reflective or fill compositions having improved flow properties are provided. The compositions comprise a styrene-allyl alcohol polymer and preferably at least one other polymer (e.g., cellulosic polymers) in addition to the styrene-allyl alcohol polymer. The inventive compositions can be used to protect contact or via holes from degradation during subsequent etching in the dual damascene process. The inventive compositions can also be applied to substrates (e.g., silicon wafers) to form anti-reflective coating layers having high etch rates which minimize or prevent reflection during subsequent photoresist exposure and developing.