公开(公告)号：DE19834184A1

公开(公告)日：2000-02-03

申请号：DE19834184

申请日：1998-07-29

Applicant: BASF AG

Inventor： SCHROF WOLFGANG ,  HORN DIETER ,  SCHWALM REINHOLD ,  MEISENBURG UWE ,  PFAU ANDREAS

IPC: G01N21/64 ,  B01J19/00 ,  B05C11/10 ,  B05D1/26 ,  B05D3/00 ,  B05D3/06 ,  B05D5/06 ,  C40B40/14 ,  C40B60/14 ,  G01N21/35 ,  G01N21/57 ,  G01N21/65 ,  G01N33/32 ,  B05D1/00 ,  G01N21/17 ,  G01N21/55 ,  B01L3/02 ,  G01J3/44

Abstract: The invention relates to a method and a device for optimising at least one lacquer in at least one place on the surface of a substrate to which the lacquer is applied. The method is carried out using the corresponding device and comprises at least the following steps: a) applying the at least one lacquer in at least one place on the surface of the substrate; b) curing the at least one lacquer in the at least one place on the surface of the substrate and c) determining the status of especially the curing and/or discoloration and/or lustre of the lacquer in the at least one place on the surface of the substrate following steps a) and b).

公开(公告)号：DE59309790D1

公开(公告)日：1999-10-28

申请号：DE59309790

申请日：1993-01-23

Applicant: BASF AG

Inventor： BINDER HORST ,  SCHWALM REINHOLD ,  FUNHOFF DIRK

IPC: G03F7/004 ,  C08L61/10 ,  G03F7/039 ,  H01L21/027

Abstract: The invention relates to a radiation-sensitive mixture essentially comprising (a) a water-insoluble binder or binder mixture, and (b) a compound which forms a strong acid on irradiation, where component (a) is a phenolic resin all or some of whose phenolic hydroxyl groups have been replaced by groups (IA) or (IB) in which R , R and R are alkyl radicals, or R together with R forms a ring, and X is CH2, O, S, SO2 or NR . This radiation-sensitive mixture is suitable for the production of relief structures.

公开(公告)号：DE4434554A1

公开(公告)日：1996-04-04

申请号：DE4434554

申请日：1994-09-28

Applicant: BASF AG

Inventor： HAEUSSLING LUKAS ,  JAEGER ULRICH ,  REICH WOLFGANG ,  BECK ERICH ,  LEBKUECHER WERNER ,  SCHWALM REINHOLD

IPC: C08G18/66 ,  C08G18/08 ,  C08G18/12 ,  C08G18/42 ,  C08G18/65 ,  C08G18/67 ,  C09D175/16 ,  C08J3/03 ,  C08L75/14 ,  C09D175/14

公开(公告)号：CA1338178C

公开(公告)日：1996-03-26

申请号：CA600065

申请日：1989-05-18

Applicant: BASF AG

Inventor： SCHWALM REINHOLD ,  BINDER HORST

IPC: G03F7/023 ,  C08F8/00 ,  C08F12/22 ,  C08G8/28 ,  C08G8/36 ,  C08K5/372 ,  C08L25/18 ,  C08L61/08 ,  C09D125/18 ,  C09D161/08 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  G03F7/38 ,  H01L21/027

Abstract: Positive and negative working radiation sensitive mixtures suitable in particular for producing relief patterns contain a polymeric binder and an organic compound whose solubility in an aqueous alkaline developer is increased by the action of acid and which contains at least one acid cleavable group and also an additional group which upon irradiation forms a strong acid, the polymeric binders being reaction products of polymers that contain phenolic hydroxyl groups with dihydropyran or with alkyl vinyl ethers.

公开(公告)号：CA1333400C

公开(公告)日：1994-12-06

申请号：CA570472

申请日：1988-06-27

Applicant: BASF AG

Inventor： SCHWALM REINHOLD ,  BOETTCHER ANDREAS

IPC: C07D333/46 ,  C07C67/00 ,  C07C69/96 ,  C07C325/00 ,  C07C381/12 ,  C07F7/08 ,  C07F7/18 ,  C08F2/50 ,  C08F4/00 ,  C09D7/12 ,  G03F7/004 ,  G03F7/029 ,  G03F7/031 ,  G03F7/26

Abstract: Sulfonium salts of the general formula where R1, R2 and R3 are identical or different and are aliphatic and/or aromatic radicals which may contain heteroatoms, or two of the radicals R1 to R3 are bonded to one another to form a ring, with the proviso that one or more of the radicals R1 to R3 contain one or more acidcleavable groups, or one of the radicals R1 to R3 is bonded to one or more further sulfonium salt radicals, if desired via acid-cleavable groups, and X- is a nonnucleophilic counter-ion, are suitable as photoinitiators for cationic polymerization.

公开(公告)号：CA1332031C

公开(公告)日：1994-09-20

申请号：CA570471

申请日：1988-06-27

Applicant: BASF AG

Inventor： SCHWALM REINHOLD ,  BOETTCHER ANDREAS ,  BINDER HORST

IPC: G03C1/72 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075

Abstract: Disclosed is a radiation-sensitive mixture consists of a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions, and of an organic compound whose solubility is an aqueous alkaline developer is increased by the action of an acid and which contains both one or more acid-cleavable groups and a group which forms a strong acid under the action of radiation. The radiation-sensitive mixture is suitable for use in photosensitive coating materials for the production of relief patterns and relief images.

公开(公告)号：CA2007765A1

公开(公告)日：1990-07-25

申请号：CA2007765

申请日：1990-01-15

Applicant: SCHWALM REINHOLD ,  BASF AG

Inventor： SCHWALM REINHOLD ,  BOETTCHER ANDREAS

IPC: C08F8/00 ,  C08F20/10 ,  C08F20/38 ,  C08F20/52 ,  C08F28/00 ,  C08F30/08 ,  C08F212/14 ,  C08F220/10 ,  C08F220/38 ,  C08F220/58 ,  C08F228/02 ,  C08F230/08 ,  C08F246/00 ,  C08G59/00 ,  C08L63/00 ,  G03F7/038 ,  G03F7/039 ,  G03F7/075 ,  C08F214/16 ,  G03F7/029

Abstract: Disclosed are radiation-sensitive polymers which contain acid-labile groups and onium salt groups with nonnucleophilic counterions in one and the same molecule. These radiations sensitive polymers are highly suitable for use as photoresists and produce the desired resist profiles without additional measures or process steps. They are therefore very advantageously suitable for fabricating semiconductor components.

公开(公告)号：DK362488A

公开(公告)日：1989-02-20

申请号：DK362488

申请日：1988-06-30

Applicant: BASF AG

Inventor： SCHWALM REINHOLD ,  BOETTCHER ANDREAS ,  BINDER HORST

IPC: G03C1/72 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075 ,  G03C1/495

Abstract: A radiation-sensitive mixture consists of a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions, and of an organic compound whose solubility in an aqueous alkaline developer is increased by the action of an acid and which contains both one or more acid-cleavable groups and a group which forms a strong acid under the action of radiation. The radiation-sensitive mixture is suitable for use in photosensitive coating materials for the production of relief patterns and relief images.

公开(公告)号：AU1861388A

公开(公告)日：1989-01-05

申请号：AU1861388

申请日：1988-07-01

Applicant: BASF AG

Inventor： SCHWALM REINHOLD ,  BOETTCHER ANDREAS

IPC: C07D333/46 ,  C07C67/00 ,  C07C69/96 ,  C07C325/00 ,  C07C381/12 ,  C07F7/08 ,  C07F7/18 ,  C08F2/50 ,  C08F4/00 ,  C09D7/12 ,  G03F7/004 ,  G03F7/029 ,  G03F7/031 ,  G03F7/26 ,  C07C149/46

Abstract: Sulphonium salts of the formula … … in which R , R and R are identical to or different from one another and represent aliphatic and/or aromatic radicals which may contain heteroatoms, or two of the radicals R to R are linked to one another to form a ring, with the proviso that at least one of the radicals R to R contains at least one grouping cleavable by acid or one of the radicals R to R is linked to one or more further sulphonium salt radicals, if desired via groupings cleavable by acid, and X denotes a non-nucleophilic counterion… are suitable as photoinitiators for cationic polymerisation.

公开(公告)号：AU1062388A

公开(公告)日：1988-07-28

申请号：AU1062388

申请日：1988-01-20

Applicant: BASF AG

Inventor： SCHWALM REINHOLD ,  BINDER HORST

IPC: G03C1/72 ,  C08F20/34 ,  C08F220/36 ,  C08F220/42 ,  C08F220/48 ,  C08F222/22 ,  G03F7/039 ,  C08F232/06 ,  H01L21/02 ,  G03F7/02

Abstract: Copolymers containing from 5 to 50 mol % of monomers having o-nitrocarbinol ester groups, from 94 to 30 mol % of methacrylonitrile, from 1 to 20 mol % of olefinically unsaturated copolymerizable carboxylic acid and from 0 to 30 mol % of other copolymerizable monomers as copolymerized units are useful for fabricating semiconductor components.