公开(公告)号：US20050044893A1

公开(公告)日：2005-03-03

申请号：US10926619

申请日：2004-08-25

Applicant: Jeffrey Coon ,  John Lasala ,  Candace Quinn ,  Robert Sabia ,  Ronald Stewart ,  James Tingley ,  Ljerka Ukrainczyk ,  Joseph Whalen

Inventor： Jeffrey Coon ,  John Lasala ,  Candace Quinn ,  Robert Sabia ,  Ronald Stewart ,  James Tingley ,  Ljerka Ukrainczyk ,  Joseph Whalen

IPC: C03B19/12 ,  C03B19/14 ,  C03B32/00 ,  C03C3/06 ,  C03C23/00 ,  G02B6/34 ,  C03B37/00 ,  H01S3/081

CPC classification number: G02B6/29343 ,  C03B19/12 ,  C03B19/1453 ,  C03B32/00 ,  C03B32/005 ,  C03B2201/075 ,  C03B2201/23 ,  C03B2201/31 ,  C03C3/06 ,  C03C23/008 ,  C03C2201/23 ,  C03C2201/31 ,  C03C2203/50 ,  G02B6/29311

Abstract: Disclosed are optical resonators having low OH content in at least the near-surface region and a process for making low OH glass article by chlorine treatment of consolidated glass of the article. Cl2 gas was used to remove OH from depth as deep as 350 μm from the surface of the consolidated glass. The process can be used for treating flame-polished preformed optical resonator disks. A new process involving hot pressing or thermal reflowing for making planar optical resonator disks without the use of flame polishing is also disclosed.

Abstract translation: 公开了至少在近表面区域具有低OH含量的光学谐振器和通过氯处理制品的固结玻璃来制造低OH玻璃制品的方法。 使用Cl2气体从固结玻璃表面去除深度为350微米的OH。 该方法可用于处理火焰抛光的预制光学谐振器盘。 还公开了一种涉及用于制造平面光学谐振器盘而不使用火焰抛光的热压或热回流的新方法。

公开(公告)号：US20050000252A1

公开(公告)日：2005-01-06

申请号：US10497093

申请日：2003-02-26

Applicant: Chan-Joo Lee ,  Soo-Il Son ,  Ji-Sang Park

Inventor： Chan-Joo Lee ,  Soo-Il Son ,  Ji-Sang Park

IPC: C03B37/018

CPC classification number: C03B37/01853 ,  C03B37/01815 ,  C03B2201/04 ,  C03B2201/075 ,  Y02P40/57

Abstract: Disclosed is a method for fabricating an optical fiber preform using a double torch in MCVD, which includes a first process of heating a quartz tube (10) at a temperature lower than a sintering temperature by using a first torch (21) with putting reaction gas, oxygen gas and dehydration gas into the tube so that soot particles are generated and deposited, and heating the tube to a predetermined temperature by using a second torch (22) spaced apart from the first torch after the first torch (21) passes so that moisture in the soot particles is removed; and a second process of conducting dehydration for removing moisture in the soot particles by use of the first torch (21) again, and heating the tube above a sintering temperature by using the second torch (22) so that the soot particles free from moisture are vitrified.

Abstract translation: 公开了一种使用MCVD中的双炬制造光纤预制件的方法，该方法包括通过使用第一炬（21）将石英管（10）加热至低于烧结温度的第一工序， ，氧气和脱水气体进入管中，从而产生并沉积烟灰颗粒，并且通过在第一焊炬（21）通过之后使用与第一炬间隔开的第二炬（22）将管加热到预定温度，使得 除去烟灰颗粒中的水分; 以及再次通过使用第一炬（21）进行脱水以除去烟灰颗粒中的水分的第二过程，并且通过使用第二炬（22）将管加热到高于烧结温度，使得没有水分的烟灰颗粒是 玻璃化

公开(公告)号：US20040200241A1

公开(公告)日：2004-10-14

申请号：US10819955

申请日：2004-04-08

Applicant: Shin-Etsu Chemical Co., Ltd.

Inventor： Tetsuya Otosaka ,  Dai Inoue ,  Hiroshi Oyamada ,  Hideo Hirasawa

IPC: C03B037/018

CPC classification number: C03B37/01466 ,  C03B37/01413 ,  C03B2201/04 ,  C03B2201/075 ,  G02B6/02004 ,  G02B6/03638 ,  G02B6/03694

Abstract: A method for manufacturing a glass base material for an optical fiber by forming a core rod having a core section and a portion of a clad, forming an additional clad by depositing glass particles on circumference of the core rod, and performing a sintering and vitrifying process on an obtained porous base material, includes the step of forming the core rod in order that the relation 3.75nulla/mnull6 is satisfied, where nullanull denotes an outer diameter of a section corresponding to the core rod, and nullmnull denotes a mode field diameter at 1385 nm in wavelength with regard to the optical fiber obtained by drawing the glass base material.

Abstract translation: 一种制造光纤用玻璃基材的方法，其特征在于，通过形成具有芯部和包层的一部分的芯棒，通过在所述芯棒的周围沉积玻璃粒子而形成附加的包层，并进行烧结和玻璃化处理 在获得的多孔基材上，包括形成芯棒的步骤，以满足3.75 <= a / m <= 6的关系，其中“a”表示对应于芯棒的部分的外径，以及 “m”表示相对于通过拉制玻璃基材而获得的光纤的波长为1385nm的模场直径。

公开(公告)号：US06698247B2

公开(公告)日：2004-03-02

申请号：US09848904

申请日：2001-05-04

Applicant: David L. Tennent ,  Joseph M. Whalen

Inventor： David L. Tennent ,  Joseph M. Whalen

IPC: C03B37075

CPC classification number: C03B37/01413 ,  C03B19/106 ,  C03B19/1415 ,  C03B2201/06 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2207/30 ,  C03B2207/38

Abstract: A method for making silica includes delivering a silica precursor comprising a perfluorinated group to a conversion site and passing the silica precursor through a conversion flame to produce silica soot.

Abstract translation: 制备二氧化硅的方法包括将包含全氟化基团的二氧化硅前体输送到转化位点并使二氧化硅前体通过转化火焰以产生二氧化硅烟灰。

公开(公告)号：US06689705B2

公开(公告)日：2004-02-10

申请号：US10048309

申请日：2002-01-29

Applicant: Akira Fujinoki ,  Hiroyuki Nishimura ,  Toru Yokota ,  Yasuyuki Yaginuma ,  Akira Sato ,  Tetsuji Ueda

Inventor： Akira Fujinoki ,  Hiroyuki Nishimura ,  Toru Yokota ,  Yasuyuki Yaginuma ,  Akira Sato ,  Tetsuji Ueda

IPC: C03C306

CPC classification number: C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2207/32 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2203/54 ,  Y02P40/57

Abstract: An object of the present invention is to provide a synthetic quartz glass optical material having a high optical transmittance for a radiation 157 nm in wavelength emitted from F2 excimer laser and a high resistance against irradiation of a F2 excimer laser radiation, yet having a uniformity suitable for such a fine patterning using a F2 excimer laser, and to provide an optical member using the same. The problems above are solved by a synthetic quartz glass optical material for F2 excimer lasers having an OH group concentration of 0.5 ppm or lower, a fluorine concentration of 0.1 to 2 mol %, a hydrogen molecule concentration of 5×1016 molecules/cm3 or lower, a difference between the maximum and minimum fluorine concentrations within 20 mol ppm, and a difference between the maximum and minimum refraction indices of 2×10−5 or lower.

Abstract translation: 本发明的目的是提供一种合成石英玻璃光学材料，其对于从F2准分子激光器发射的波长为157nm的辐射具有高的透光率，并且具有高的对F2准分子激光辐射照射的抗性，但具有适合的均匀性 对于使用F2准分子激光器的精细图案化，并提供使用其的光学部件。 上述问题由OH基浓度为0.5ppm以下，氟浓度为0.1〜2mol％，氢分子浓度为5×10 16分子/ cm 2的F2准分子激光的合成石英玻璃光学材料解决， 3>以下，最大和最小氟浓度在20mol ppm内的差异，以及最大和最小折射率之间的差异为2×10 -5或更低。

公开(公告)号：US06606883B2

公开(公告)日：2003-08-19

申请号：US09844081

申请日：2001-04-27

Applicant: Kenneth E. Hrdina ,  Nikki J. Russo ,  Michael H. Wasilewski

Inventor： Kenneth E. Hrdina ,  Nikki J. Russo ,  Michael H. Wasilewski

IPC: C03B1914

CPC classification number: C03B19/1453 ,  C03B19/1407 ,  C03B19/1484 ,  C03B2201/04 ,  C03B2201/075 ,  C03B2201/42 ,  C03B2207/32

Abstract: A method for forming a fused silica glass includes delivering a silica precursor to a burner and passing the silica precursor through the flame of the burner to form silica particles, depositing the silica particles on a planar surface to form a flat, porous preform, dehydrating the porous preform, and consolidating the porous preform into a flat, dense glass.

公开(公告)号：US20030148194A1

公开(公告)日：2003-08-07

申请号：US10342717

申请日：2003-01-13

Inventor： John T. Brown ,  Stephen C. Currie ,  Lisa A. Moore ,  Susan L. Schiefelbein ,  Robert S. Pavlik JR.

IPC: G03F009/00 ,  G03C005/00 ,  C03B005/26 ,  C03B007/00 ,  B32B009/00 ,  B32B017/06

CPC classification number: G03F7/70216 ,  C03B19/1407 ,  C03B19/1415 ,  C03B19/1423 ,  C03B19/1453 ,  C03B37/01202 ,  C03B37/01406 ,  C03B37/01413 ,  C03B37/0142 ,  C03B37/0146 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/21 ,  C03B2207/06 ,  C03B2207/14 ,  C03B2207/20 ,  C03B2207/30 ,  C03B2207/32 ,  C03B2207/36 ,  C03B2207/38 ,  C03B2207/40 ,  C03B2207/46 ,  C03B2207/54 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/12 ,  C03C2201/20 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/30 ,  C03C2201/32 ,  C03C2203/54 ,  G03F1/60 ,  G03F7/70958 ,  Y02P40/57

Abstract: High purity direct deposit vitrified silicon oxyfluoride glass suitable for use as a photomask substrates for photolithography applications in the VUV wavelength region below 190 nm is disclosed. The inventive direct deposit vitrified silicon oxyfluoride glass is transmissive at wavelengths around 157 nm, making it particularly useful as a photomask substrate at the 157 nm wavelength region. The inventive photomask substrate is a dry direct deposit vitrified silicon oxyfluoride glass which exhibits very high transmittance in the vacuum ultraviolet (VUV) wavelength region while maintaining the excellent thermal and physical properties generally associated with high purity fused silica. In addition to containing fluorine and having little or no OH content, the inventive direct deposit vitrified silicon oxyfluoride glass suitable for use as a photomask substrate at 157 nm is also characterized by having less than 1null1017 molecules/cm3 of molecular hydrogen and low chlorine levels.

公开(公告)号：US06544914B1

公开(公告)日：2003-04-08

申请号：US09701191

申请日：2000-12-28

Applicant: Shinya Kikugawa ,  Yoshiaki Ikuta ,  Akio Masui ,  Noriaki Shimodaira ,  Shuhei Yoshizawa

Inventor： Shinya Kikugawa ,  Yoshiaki Ikuta ,  Akio Masui ,  Noriaki Shimodaira ,  Shuhei Yoshizawa

IPC: C03C306

CPC classification number: C03C23/002 ,  B08B7/0057 ,  C03B19/1453 ,  C03B19/1469 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03C3/06 ,  C03C2201/23 ,  C03C2203/50 ,  Y02P40/57

Abstract: A process for producing a synthetic quartz glass for an optical member, which comprises a step of irradiating a synthetic quartz glass having an OH group content of 50 ppm or lower with vacuum ultraviolet light having a wavelength of 180 nm or shorter to improve the transmittance in a region of wavelengths of not longer than 165 nm.

Abstract translation: 一种用于制造用于光学构件的合成石英玻璃的方法，其包括用波长为180nm或更短的真空紫外光照射具有50ppm或更低的OH基含量的合成石英玻璃以提高透射率的步骤 波长不超过165nm的区域。

公开(公告)号：US06541168B2

公开(公告)日：2003-04-01

申请号：US09841517

申请日：2001-04-24

Applicant: John T. Brown ,  Stephen C. Currie ,  Lisa A. Moore ,  Susan L. Schiefelbein ,  Robert S. Pavlik, Jr.

Inventor： John T. Brown ,  Stephen C. Currie ,  Lisa A. Moore ,  Susan L. Schiefelbein ,  Robert S. Pavlik, Jr.

IPC: G03F900

CPC classification number: G03F7/70216 ,  C03B19/1407 ,  C03B19/1415 ,  C03B19/1423 ,  C03B19/1453 ,  C03B37/01202 ,  C03B37/01406 ,  C03B37/01413 ,  C03B37/0142 ,  C03B37/0146 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/21 ,  C03B2207/06 ,  C03B2207/14 ,  C03B2207/20 ,  C03B2207/30 ,  C03B2207/32 ,  C03B2207/36 ,  C03B2207/38 ,  C03B2207/40 ,  C03B2207/46 ,  C03B2207/54 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/12 ,  C03C2201/20 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/30 ,  C03C2201/32 ,  C03C2203/54 ,  G03F1/60 ,  G03F7/70958 ,  Y02P40/57

Abstract: High purity direct deposit vitrified silicon oxyfluoride glass suitable for use as a photomask substrates for photolithography applications in the VUV wavelength region below 190 nm is disclosed. The inventive direct deposit vitrified silicon oxyfluoride glass is transmissive at wavelengths around 157 nm, making it particularly useful as a photomask substrate at the 157 nm wavelength region. The inventive photomask substrate is a dry direct deposit vitrified silicon oxyfluoride glass which exhibits very high transmittance in the vacuum ultraviolet (VUV) wavelength region while maintaining the excellent thermal and physical properties generally associated with high purity fused silica. In addition to containing fluorine and having little or no OH content, the inventive direct deposit vitrified silicon oxyfluoride glass suitable for use as a photomask substrate at 157 nm is also characterized by having less than 1×1017 molecules/cm3 of molecular hydrogen and low chlorine levels.

公开(公告)号：US20030021015A1

公开(公告)日：2003-01-30

申请号：US10238099

申请日：2002-09-09

Inventor： Robert L. Maier ,  Lisa A. Moore ,  Charlene M. Smith

IPC: G02B001/00

CPC classification number: C03C17/02 ,  C03B19/1453 ,  C03B19/1461 ,  C03B2201/075 ,  C03B2201/12 ,  C03C3/06 ,  C03C17/3452 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2203/46 ,  G02B1/105 ,  G02B1/14 ,  G02B5/208 ,  G03F7/70958

Abstract: The invention provides coated optical lithography elements and methods of coating optical elements, and particularly optical photolithography elements for use in below 240 nm optical photolithography systems utilizing vacuum ultraviolet light (VUV) lithography wavelengths no greater than about 193 nm, such as VUV projection lithography systems utilizing wavelengths in the 193 nm or 157 nm region. The optical devices manipulate vacuum ultraviolet lithography light less than 250 nm utilizing a deposited silicon oxyfluoride film. The deposited silicon oxyfluoride optical coating assists in the manipulation of incident light and protects the underlying optical materials, layers, and surfaces.