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    PROCESS FOR PRODUCING HYDROGEN PEROXIDE, C1 TO C4 MONOPERCARBOXYLIC ACID AND C4 TO C18 DIPERCARBOXYLIC ACID COMPLEXES BY THE FLUIDISED BED PROCESS
    152.
    发明专利
    PROCESS FOR PRODUCING HYDROGEN PEROXIDE, C1 TO C4 MONOPERCARBOXYLIC ACID AND C4 TO C18 DIPERCARBOXYLIC ACID COMPLEXES BY THE FLUIDISED BED PROCESS 未知

    公开(公告)号：CA2179663A1

    公开(公告)日：1995-06-29

    申请号：CA2179663

    申请日：1994-12-10

    Applicant: BASF AG

    Inventor： BREITENBACH JOERG ,  GRABOWSKI SVEN ,  SANNER AXEL

    IPC: C07C407/00 ,  C01B15/037 ,  C07C409/00 ,  C07C409/24 ,  C07C409/26 ,  C08K3/20 ,  C08K5/14 ,  C08L5/00 ,  C08L5/16 ,  C08L39/00 ,  C07H3/00 ,  C01B15/01 ,  C08B31/18 ,  C08B37/16

    Abstract: The production of hydrogen peroxide, C1 to C4 monopercarboxylic acid and C4 to C18 dipercarboxylic acid complexes by the fluidised bed process by the addition of a solution of hydrogen peroxide, C1 to C4 monopercarboxylic acid, C4 to C18 dipercarboxylic acid or a mixture thereof in water or carboxylic acids to a powdered or pregranulated matrix in or outside the fluidised bed and simultaneously or successively drying of the fluidised bed, in which use is made as a matrix of: A) N-vinyl caprolactam homopolymer, B) N-vinyl caprolactam copolymers with N-vinyl pyrrolidone, N-vinyl imidazole, acryl or methacryl amidopropyl-3-sulphonic acid, acrylic or methacrylic acid or mixtures thereof as comonomers in the proportion by weight of N-vinyl caprolactam to comonomers of 20:1 to 1:20, C) N-vinyl pyrrolidone copolymer with N-vinyl imidazole, acrylic or methacrylic acid or mixtures thereof as comonomers in the proportion by weight of N-vinyl pyrrolidone to comonomers of 20:1 to 1:20, D) N-vinyl imidazole homopolymers which may be substituted in the heterocyclic ring by up to three C1 to C4 alkyl radicals and may be present in C1 to C4 alkyl N-quaternised form, E) mixtures of monosaccharides, oligosaccharides, polysaccharides or derivatives thereof with the polymers A to D in the proportion by weight of 1:99 to 90:10, F) mixtures of monosaccharides, oligosaccharides, starches, starch decomposition products or derivatives thereof with N-vinyl pyrrolidone homopolymers in the proportion by weight of 1:99 to 90:10, G) mixtures of trehalose, saccharose, glucose, .alpha. or .beta. or .gamma. cyclodextrins or derivatives of said cyclodextrins or mixtures thereof with polymers A to D or with N-vinyl pyrrolidone homopolymers in the proportion by weight of 1:99 to 100:0 or H) in the case of C1 to C4 monopercarboxylic acid and C4 to C18 dipercarboxylic acid complexes, N-vinyl pyrrolidone homopolymers.

    153.
    发明专利
    未知

    公开(公告)号：MX9304658A

    公开(公告)日：1994-02-28

    申请号：MX9304658

    申请日：1993-08-02

    Applicant: BASF AG

    Inventor： GRABOWSKI SVEN ,  SANNER AXEL ,  ROSENBERG JOERG

    IPC: A01N25/12 ,  A01N25/10 ,  A61K9/14 ,  A61K9/20 ,  A61K9/22 ,  A61K9/26 ,  A01N25/18

    Abstract: Preparations in solid particle form containing active compounds, obtainable by intimate mixing of the active compound with a water-soluble melt of a) 10 to 90% by weight of a water-soluble polymer A of a viscosity Va of 1,000 to 120,000 cps and b) 10 to 90% by weight of a water-soluble polymer B of a viscosity Vb of 1 to 500 cps as a carrier substance, the viscosities Va and Vb being those of a 2% strength by weight aqueous solution at 20@C, measured by the capillary method ASTM D 2363-72 (European Pharmacopoeia, Vol. III, p. 37), and processing of the melt with shaping to give the particles.

    DRY FILM RESIST AND PRODUCTION OF RESIST IMAGES
    156.
    发明专利
    DRY FILM RESIST AND PRODUCTION OF RESIST IMAGES 未知

    公开(公告)号：CA1259218A

    公开(公告)日：1989-09-12

    申请号：CA498088

    申请日：1985-12-19

    Applicant: BASF AG

    Inventor： ELZER ALBERT ,  SCHORNICK GUNNAR ,  SANNER AXEL

    IPC: G03C1/00 ,  G03F7/004 ,  G03F7/027 ,  G03C1/68

    Abstract: In dry film resists possessing a solid photopolymerizable resist layer, which is applied on a temporary base and can be developed with aqueous, in particular aqueous alkaline, media, and, if required, a cover sheet on the resist layer, the said resist layer is built from a homogeneous mixture of a) not less than 40% by weight of one or more oligomers which contain free carboxyl groups and more than two acryloyl and/or methacryloyl groups and are soluble or dispersible in aqueous alkaline solutions, b) from 1 to 35% by weight of one or more film-forming compatible polymers which are soluble in aqueous media, c) from 1 to 30% by weight of one or more compatible photopolymerizable monomers, d) from 0.001 to 10% by weight of one or more photoinitiators and e) from 0 to 30% by weight of further additives and/or assistants. Resist images are produced on a substrate by a process employing photopolymerizable resist layers of the type stated above.

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