公开(公告)号：JP2002091002A

公开(公告)日：2002-03-27

申请号：JP2000282250

申请日：2000-09-18

Applicant: JSR CORP

Inventor： NISHIMURA YUKIO ,  DOUKI KATSUJI ,  YAMAMOTO MASASHI ,  KAJITA TORU ,  SHIMOKAWA TSUTOMU

IPC: G03F7/039 ,  C08F32/00 ,  C08K5/00 ,  C08L45/00 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a new radiation sensitive resin composition having high transparency to radiation and superior developability, excellent in adhesiveness to a substrate as well as in basic solid state properties as a resist, e.g. sensitivity, resolution and pattern shape, causing no development defects in microfabrication and capable of producing semiconductor devices in a high yield. SOLUTION: The radiation sensitive resin composition contains (A) a copolymer having repeating units of formula (1) [wherein R1-R3 are each H, a 1-4C alkyl, a monovalent O-containing polar group or a monovalent N-containing polar group; R4-R6 are each H, a 1-6C alkyl, a 1-6C alkoxy or a 2-7C alkoxycarbonyl; and (n) and (m) are each an integer of 0-2] as essential units and (B) a radiation sensitive acid generating agent.

公开(公告)号：JP2002062657A

公开(公告)日：2002-02-28

申请号：JP2001095877

申请日：2001-03-29

Applicant: JSR CORP

Inventor： NISHIMURA YUKIO ,  DOUKI KATSUJI ,  KAJITA TORU ,  SHIMOKAWA TSUTOMU

IPC: C08F220/28 ,  C08F232/00 ,  C08K5/00 ,  C08L33/14 ,  C08L45/00 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition having high transparency to radiation as a chemical amplification type positive type resist, excellent in basic solid state properties as the resist, e.g. sensitivity, resolution and pattern shape, not causing development defects in microfabrication and capable of producing semiconductor devices in a high yield. SOLUTION: The radiation sensitive resin composition contains (A) an alkali- insoluble or slightly alkali-soluble acid dissociable group-containing resin having a lactone ring structure of formula (1) [where (a) is an integer of 1-3; (b) is an integer of 0-9; and R1 is a monovalent organic group] and made alkali-soluble when the acid dissociable group is dissociated and (B) a radiation sensitive acid generating agent.

公开(公告)号：JP2001316471A

公开(公告)日：2001-11-13

申请号：JP2000135787

申请日：2000-05-09

Applicant: UNIV KANAGAWA ,  JSR CORP

Inventor： NISHIKUBO TATATOMI ,  KAMEYAMA ATSUSHI ,  NISHIMURA ISAO ,  SHIMOKAWA TSUTOMU

IPC: C08G75/28

Abstract: PROBLEM TO BE SOLVED: To provide a novel polymer containing sulfur atom comprising repeating units each of which contains sulfur atoms in a high density and has many aromatic rings and a method for producing the same. SOLUTION: The polymer containing sulfur atom comprises repeating units of formula (1) [wherein Ar1 and Ar2, which may be the same or different from each other, are each a phenylene group or a divalent organic group having an aromatic substituent on each terminal; and p is the number of repeating units and is an integer of 4 or greater]. This polymer is obtained by polymerizing a cyclic thiocarbonate compound represented by formula (2) [wherein Ar1 and Ar2 are as defined in formula (1), and n is the number of the repeating units that constitute the ring and is an integer of 2 or greater] under heating in the presence or absence of a quaternary onium salt compound.

公开(公告)号：JP2001316470A

公开(公告)日：2001-11-13

申请号：JP2000135786

申请日：2000-05-09

Applicant: UNIV KANAGAWA ,  JSR CORP

Inventor： NISHIKUBO TATATOMI ,  KAMEYAMA ATSUSHI ,  NISHIMURA ISAO ,  SHIMOKAWA TSUTOMU

IPC: G02B1/04 ,  C08G75/26

Abstract: PROBLEM TO BE SOLVED: To provide a polymer containing a sulfur atom with high density, which comprises a repeating unit having a great number of an aromatic ring, and to provide its production method. SOLUTION: The polymer containing the sulfur atom comprises the repeating unit represented by formula (1) (wherein R1 is a phenylene group which may have a substituting group, a divalent organic group having an aromatic substituting groups at both ends, or an alkylene group of =4). The polymer is obtained by heat polymerizing a cyclic thiocarbonate compound represented by formula (2) (wherein R1 and R2 are the same as the definition in formula (1) and a ring construction unit number, n is an integer of >=2) in the presence of or in the absence of a quaternary onium salt, a fatty acid metallic salt or a crown ether compound.

公开(公告)号：JP2001235864A

公开(公告)日：2001-08-31

申请号：JP2000046031

申请日：2000-02-23

Applicant: JSR CORP

Inventor： DOUKI KATSUJI ,  YAMAHARA NOBORU ,  KAJITA TORU ,  SHIMOKAWA TSUTOMU

IPC: G03F7/039 ,  C08K5/00 ,  C08K5/12 ,  C08L45/00 ,  C08L101/02 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition excellent particularly in pattern shape as a chemical amplification type resist and excellent also in balance of characteristics including sensitivity and resolution. SOLUTION: The radiation sensitive resin composition contains (A) an alkali- insoluble or slightly alkali-soluble acid dissociable group-containing resin which is made alkali-soluble when the acid dissociable group is dissociated, (B) a radiation sensitive acid generating agent and (C) a compound of formula 1, formula 2 or the like.

公开(公告)号：JP2001147532A

公开(公告)日：2001-05-29

申请号：JP32822499

申请日：1999-11-18

Applicant: JSR CORP

Inventor： DOUKI KATSUJI ,  KAJITA TORU ,  SHIMOKAWA TSUTOMU

IPC: H01L21/027 ,  G03F7/039

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition excellent in dry etching resistance, sensitivity, resolution, etc., as a chemical amplification type resist, capable of avoiding a change of the line width of a resist pattern due to a change of the time elapsed from exposure to post-exposure heating and having superior process stability. SOLUTION: The radiation sensitive resin composition contains (A) an alkali- insoluble or slightly alkali-soluble acid dissociable group-containing resin typified by copolymer of 8-methyl-8hydroxytetracyclo[4.4.0.12,5'.17,10]dodec-3-ene, itaconic anhydride and t-butyl (meth)acrylate and (B) a radiation sensitive acid generating agent. The resin A is made alkali-soluble when the acid dissociable group is dissociated.

公开(公告)号：JP2000250047A

公开(公告)日：2000-09-14

申请号：JP5513299

申请日：1999-03-03

Applicant: JSR CORP

Inventor： MUTSUKA YASUAKI ,  EGUCHI KAZUHIRO ,  KURIYAMA KEISUKE ,  SHIMOKAWA TSUTOMU ,  BESSHO NOBUO

IPC: G02F1/1337 ,  C08L79/08

Abstract: PROBLEM TO BE SOLVED: To obtain a liquid crystal alignment agent having excellent transparency by incorporating a polyamic acid and/or polyimide having a specified content of aromatic rings in the polymer. SOLUTION: The liquid crystal alignment agent used contains a polyamide acid and/or polyimide having

公开(公告)号：JP2000239386A

公开(公告)日：2000-09-05

申请号：JP4531599

申请日：1999-02-23

Applicant: UNIV KANAGAWA ,  JSR CORP

Inventor： NISHIKUBO TATATOMI ,  KAMEYAMA ATSUSHI ,  BESSHO NOBUO ,  SHIMOKAWA TSUTOMU ,  NISHIMURA ISAO

IPC: C08G75/28

Abstract: PROBLEM TO BE SOLVED: To obtain the subject compound consisting of a specific cyclic aryl thiocarbonate, having high refractive index, and therefore useful as a material for optical members. SOLUTION: This compound is a cyclic aryl thiocarbonate of the formula [X1 and X2 are each a group of the formula: CH2-O-R (R is a 1-6C alkyl or the like), Y1 and Y2 are each H; (a) and (b) are each 0 or >=1; Ar1 and Ar2 are each phenylene or a bivalent organic group; n is >=2]. The compound of the formula where (a) and (b) are each 0 is obtained, preferably, by reaction between an aromatic dithiol compound and an aromatic compound having a bifunctional haloformyloxy group in a solvent in the presence of a quaternary onium salt as a phase-transfer catalyst pref. at 0-120 deg.C for 0.5-96 h; wherein the concentration of the aromatic dithiol compound in the solvent is pref. 0.005-0.05 mol/L when a cyclic compound is to be synthesized; and the amount of the catalyst to be used is pref. 5-10 mol% based on the total amount of the raw material compounds for the reaction.