公开(公告)号：US07469559B2

公开(公告)日：2008-12-30

申请号：US11004027

申请日：2004-12-02

Applicant: Laura J Ball ,  Bruno P M Baney ,  Dana C Bookbinder ,  Keith L House ,  Rostislav R Khrapko ,  Susan L Schiefelbein ,  Lisa A Moore

Inventor： Laura J Ball ,  Bruno P M Baney ,  Dana C Bookbinder ,  Keith L House ,  Rostislav R Khrapko ,  Susan L Schiefelbein ,  Lisa A Moore

IPC: C03C13/04

CPC classification number: C03C3/06 ,  C03B37/01211 ,  C03B37/01228 ,  C03B37/01426 ,  C03B37/01807 ,  C03B37/01861 ,  C03B37/01892 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/28 ,  C03B2201/31 ,  C03B2201/32 ,  C03B2201/50 ,  C03B2201/54 ,  C03B2203/26 ,  C03B2207/30 ,  C03B2207/90 ,  C03C25/602 ,  C03C25/607 ,  C03C25/68 ,  C03C2201/11 ,  C03C2201/23 ,  C03C2201/50 ,  C03C2203/50 ,  G02B6/02

Abstract: A method of forming an alkali metal oxide-doped optical fiber by diffusing an alkali metal into a surface of a glass article is disclosed. The silica glass article may be in the form of a tube or a rod, or a collection of tubes or rods. The silica glass article containing the alkali metal, and impurities that may have been unintentionally diffused into the glass article, is etched to a depth sufficient to remove the impurities. The silica glass article may be further processed to form a complete optical fiber preform. The preform, when drawn into an optical fiber, exhibits a low attenuation.

Abstract translation: 公开了一种通过将碱金属扩散到玻璃制品的表面中形成掺杂碱金属氧化物的光纤的方法。 石英玻璃制品可以是管或棒的形式，或者是管或棒的集合。 含有碱金属的二氧化硅玻璃制品和可能已经无意地扩散到玻璃制品中的杂质被蚀刻到足以除去杂质的深度。 石英玻璃制品可以进一步加工以形成完整的光纤预型件。 当预成型件被拉入光纤时，表现出低的衰减。

公开(公告)号：US20080213591A1

公开(公告)日：2008-09-04

申请号：US11885742

申请日：2006-02-15

Applicant: Jurgen Meyer ,  Monika Oswald ,  Klaus Deller

Inventor： Jurgen Meyer ,  Monika Oswald ,  Klaus Deller

IPC: B32B15/02 ,  C01B33/12

CPC classification number: C09C1/3036 ,  C01B33/18 ,  C01P2006/11 ,  C01P2006/12 ,  C01P2006/14 ,  C01P2006/17 ,  C01P2006/19 ,  C03B19/106 ,  C03B19/108 ,  C03B2201/03 ,  Y10T428/2982 ,  Y10T428/2991 ,  Y10T428/2993 ,  Y10T428/2995

Abstract: Granules based on pyrogenically prepared silicon dioxide, method for their preparation and use thereof Granules based on silicon dioxide and having the properties: Average grain size:10 to 120 μm BET surface area:40 to 400 m2/g Pore volume:0.5 to 2.5 ml/g Pore size distribution:less than 5% of the total pore volume exists of pores with a diameter

公开(公告)号：US20080057291A1

公开(公告)日：2008-03-06

申请号：US11514997

申请日：2006-09-05

Applicant: Yoshiaki Ikuta ,  Shinya Kikugawa

Inventor： Yoshiaki Ikuta ,  Shinya Kikugawa

IPC: B32B3/00

CPC classification number: C03B19/1453 ,  C03B2201/03 ,  C03B2201/12 ,  C03C3/06 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/23 ,  Y10T428/166 ,  Y10T428/249969 ,  Y10T428/252

Abstract: For a substrate having fine convexoconcave patterns on its surface, the dimensions of the convexoconcave patterns in a vertical direction of a quartz glass substrate are controlled to be uniform with extreme accuracy and over the entire substrate surface.The quartz glass substrate is made to have a fictive temperature distribution of at most 40° C. and a halogen concentration of less than 400 ppm, and the etching rate of the surface of the quartz glass substrate is made uniform, whereby the dimensions of the convexoconcave patterns in a vertical direction of the quartz glass substrate are controlled to be uniform with good accuracy and over the entire substrate surface.

Abstract translation: 对于在其表面上具有细凹凸图案的基板，石英玻璃基板的垂直方向上的凸凹图案的尺寸被控制为以极高的精度和整个基板表面均匀。 使石英玻璃基板具有至多40℃的假想温度分布和小于400ppm的卤素浓度，并且使石英玻璃基板的表面的蚀刻速率均匀，由此， 在石英玻璃基板的垂直方向上的凸凹图案被控制为具有良好的精度和整个基板表面的均匀。

公开(公告)号：US20060258525A1

公开(公告)日：2006-11-16

申请号：US10569822

申请日：2004-08-27

Applicant: Takashi Uchino ,  Tomoko Yamada

Inventor： Takashi Uchino ,  Tomoko Yamada

IPC: C03B19/09 ,  C03C3/06 ,  C03B19/01

CPC classification number: C03C12/00 ,  C03B19/06 ,  C03B19/066 ,  C03B20/00 ,  C03B2201/03 ,  C03B2201/04

Abstract: It is an object of the present invention to provide a light emitting device of the next generation optical device having a broad emission property that a width at half maximum of an emission spectrum is large in a wavelength range of visible light and capable of recognizing white light emitting by photoluminescence (PL). In a baking process for baking a pressure molding formed by pressure molding of silica fine particles such as fumed silica, a baking temperature is made as not more than 1000° C., hydroxyl groups of the silica fine particles are sufficiently subjected to dehydration condensation reaction so that the particles becomes transparent, a structural defect generated in the process is held without being relaxed, and thus a silica glass is generated. The silica glass is employed as a fluorescent substance.

Abstract translation: 本发明的目的是提供一种具有宽发射特性的下一代光学器件的发光器件，其发射光谱的一半宽度在可见光的波长范围内大，并且能够识别白光 通过光致发光（PL）发射。 在通过对二氧化硅微粒如热解法二氧化硅进行加压成型而形成的压力成型的烘烤处理中，烧成温度为1000℃以下，二氧化硅微粒的羟基充分进行脱水缩合反应 使得颗粒变得透明，在不松弛的情况下保持在该过程中产生的结构缺陷，因此产生石英玻璃。 石英玻璃用作荧光物质。

公开(公告)号：US07093465B2

公开(公告)日：2006-08-22

申请号：US10297451

申请日：2001-05-31

Applicant: Tetsuji Ueda ,  Hiroyuki Nishimura ,  Akira Fujinoki

Inventor： Tetsuji Ueda ,  Hiroyuki Nishimura ,  Akira Fujinoki

IPC: C03C15/00

CPC classification number: C03C23/007 ,  C03B19/1453 ,  C03B32/00 ,  C03B2201/03 ,  Y10S65/90

Abstract: An object of the present invention is to overcome the problems of the prior art technique, and to provide a heat treatment method as well as a heat treatment apparatus capable of heat treating, with higher efficiency, a synthetic quartz glass for optical use having higher homogeneity and higher purity. Another object of the present invention is to provide and a synthetic quartz glass for optical use.The problems above are solved by, in a method for heat treating a flat cylindrical synthetic quartz glass body provided as the object to be heat treated in a heating furnace, a method for heat treating a synthetic quartz glass for optical use comprising preparing a vessel made of quartz glass and having a flat cylindrical space for setting therein the object synthetic quartz glass body, placing two or more object synthetic quartz glass bodies into the vessel in parallel with each other, filling the space with SiO2 powder, setting the vessel inside the heating furnace with its lid closed, and applying the heat treatment to the vessel.

Abstract translation: 本发明的目的是克服现有技术的问题，提供热处理方法以及能够以更高的效率对具有较高均匀性的光学用合成石英玻璃进行热处理的热处理装置 和更高的纯度。 本发明的另一个目的是提供一种用于光学用途的合成石英玻璃。 上述问题是通过在加热炉中对作为热处理对象的平坦圆筒形合成石英玻璃体进行热处理的方法来解决的，该方法是用于热处理用于光学用途的合成石英玻璃的方法，包括制备容器 的石英玻璃，并且具有平坦的圆柱形空间用于在其中设置物体合成石英玻璃体，将两个或更多个目标合成石英玻璃体彼此平行地放置在容器中，用SiO 2填充空间， 粉末，将容器置于加热炉内并关闭盖子，并对容器进行热处理。

公开(公告)号：US20060183623A1

公开(公告)日：2006-08-17

申请号：US11398669

申请日：2006-04-06

Applicant: Yoshiaki Ikuta ,  Noriyuki Agata

Inventor： Yoshiaki Ikuta ,  Noriyuki Agata

IPC: C03C3/06 ,  C03B37/07 ,  C03B37/018

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/36 ,  Y02P40/57

Abstract: A synthetic quartz glass for an optical member which is free from compaction and rarefaction is obtained. A synthetic quartz glass for an optical member to be used for an optical device employing a light having a wavelength of at most 400 nm and at least 170 nm as a light source, which contains substantially no oxygen excess defects, dissolved oxygen molecules nor reduction type defects, which has a chlorine concentration of at most 50 ppm and a OH group concentration of at most 100 ppm, and which contains oxygen deficient defects within a concentration range of at most 5×1014 defects/cm3 and at least 1×1013 defects/cm3. The fluorine concentration is preferably at most 100 ppm.

Abstract translation: 得到不含压实和稀释的用于光学构件的合成石英玻璃。 用于光学元件的合成石英玻璃，其用于使用波长最多为400nm且至少170nm的光作为光源的光学元件，其基本上不含氧过剩缺陷，溶解氧分子或还原型 缺陷，其氯浓度最多为50ppm，OH基浓度为至多100ppm，并且其含有缺氧缺陷的浓度范围至多为5×10 14个/ cm 2以下 > 3％和至少1×10 3个缺陷/ cm 3。 氟浓度优选为100ppm以下。

公开(公告)号：US20060137398A1

公开(公告)日：2006-06-29

申请号：US11148764

申请日：2005-06-08

Applicant: Daniel Bleaking ,  Dana Bookbinder ,  Richard Fiacco ,  Kenneth Hrdina ,  Pushkar Tandon ,  John Maxon ,  Kimberly Wilbert

Inventor： Daniel Bleaking ,  Dana Bookbinder ,  Richard Fiacco ,  Kenneth Hrdina ,  Pushkar Tandon ,  John Maxon ,  Kimberly Wilbert

IPC: C03B20/00 ,  C03C3/06

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/21 ,  C03B2201/23 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/23

Abstract: Disclosed are high purity synthetic silica glass material having a high OH concentration homogeneity in a plane perpendicular to the optical axis, and process of making the same. The glass has high refractive index homogeneity. The glass can have high internal transmission of at least 99.65%/cm at 193 nm. The process does not require a post-sintering homogenization step. The controlling factors for high compositional homogeneity, thus high refractive index homogeneity, include high initial local soot density uniformity in the soot preform and slow sintering, notably isothermal treatment during consolidation.

公开(公告)号：US20060059948A1

公开(公告)日：2006-03-23

申请号：US10535935

申请日：2003-11-28

Applicant: Tatsuhiro Sato ,  Takahiro Kaitou ,  Akira Fujinoki ,  Toshiyuki Kato ,  Tohru Segawa ,  Nobumasa Yoshida

Inventor： Tatsuhiro Sato ,  Takahiro Kaitou ,  Akira Fujinoki ,  Toshiyuki Kato ,  Tohru Segawa ,  Nobumasa Yoshida

IPC: C03C25/64

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/20 ,  C03B2201/24 ,  C03C2201/02 ,  C03C2201/11 ,  C03C2201/23 ,  C03C2201/24 ,  C03C2201/26

Abstract: First of all, there is provided a production process of a synthetic quartz glass which has less impurity, has a high-temperature viscosity characteristic equal to or more than that of a natural quartz glass, and hardly deforms even in a high-temperature environment, and especially a production process of a highly heat resistant synthetic quartz glass which is free from the generation of bubbles and is dense. Secondly, there is provided a highly heat resistant synthetic quartz glass body which is easily obtained by the production process of the present invention, and especially a transparent or black quartz glass body which is free from the generation of bubbles, is dense, has high infrared absorption rate and emission rate, and has an extremely high effect for preventing diffusion of alkali metal. The process is a process of producing a highly heat resistant quartz glass body having an absorption coefficient at 245 nm of 0.05 cm−1 or more, and the silica porous body was subjected to a reduction treatment, followed by baking, thereby forming a dense glass body.

Abstract translation: 首先，提供了杂质少，具有等于或高于天然石英玻璃的高温粘度特性的合成石英玻璃的制造方法，即使在高温环境下也几乎不变形， 特别是高度耐热的合成石英玻璃的生产过程，其不产生气泡并且致密。 其次，提供了通过本发明的制造方法容易获得的高耐热性合成石英玻璃体，特别是不产生气泡的透明或黑色石英玻璃体，具有高红外 吸收率和排放率，对防止碱金属的扩散具有极高的效果。 该方法是生产具有245nm的吸收系数为0.05cm -1以上的高耐热性石英玻璃体的工序，对二氧化硅多孔体进行还原处理，其次是 烘烤，从而形成致密的玻璃体。

公开(公告)号：US20050129603A1

公开(公告)日：2005-06-16

申请号：US10943747

申请日：2004-09-17

Applicant: Holger Szillat ,  Fritz Schwertferger ,  Bernd Haack ,  Marcus Schafer

Inventor： Holger Szillat ,  Fritz Schwertferger ,  Bernd Haack ,  Marcus Schafer

IPC: C01B39/00 ,  C01B33/18 ,  C03B19/10 ,  C03C3/06 ,  C03C12/00 ,  C01B33/12 ,  B01J8/04 ,  B01J10/00

CPC classification number: B82Y30/00 ,  C01B33/183 ,  C01P2002/84 ,  C01P2004/32 ,  C01P2004/51 ,  C01P2004/61 ,  C01P2004/62 ,  C01P2004/64 ,  C01P2006/12 ,  C01P2006/80 ,  C03B19/1025 ,  C03B2201/03 ,  C03B2207/06 ,  C03B2207/08 ,  C03B2207/12 ,  C03B2207/20 ,  C03B2207/42 ,  C03B2207/46 ,  C03C3/06 ,  C03C12/00 ,  C03C2201/02 ,  C03C2203/44

Abstract: Use of a flame hydrolysis apparatus for preparing fumed silica particles or a plasma torch apparatus for sintering fumed silica particles to fused silica particles is capable of producing highly pure silica with non-silicon metal impurities less than 500 pb, when at least an inner nozzle is constructed of a silicon-containing material having a low level of non-silicon metal impurities. Preferably, all surfaces in the respective apparatus which contact silica are of similar construction. The silica contains a low level of impurities as produced, without requiring further purification.

Abstract translation: 使用火焰水解装置制备气相二氧化硅颗粒或用于将热解法二氧化硅颗粒烧结成熔融二氧化硅颗粒的等离子体焰炬装置能够产生具有小于500pb的非硅金属杂质的高纯度二氧化硅，当至少内部喷嘴为 由具有低水平的非硅金属杂质的含硅材料构成。 优选地，接触二氧化硅的相应装置中的所有表面具有相似的结构。 二氧化硅含有低水平的杂质，不需要进一步纯化。

公开(公告)号：US20040213724A1

公开(公告)日：2004-10-28

申请号：US10481063

申请日：2004-03-17

Inventor： Masaki Kusuhara ,  Hiroyuki Watanabe ,  Hirofumi Uehara ,  Keiko Sanpei ,  Naoyasu Kurita ,  Shuichi Tada ,  Jinichi Omi ,  Makio Takahashi ,  Hiroshi Morita

IPC: C01B033/12 ,  C03C003/06

CPC classification number: C03B19/1065 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/23 ,  C03C1/026 ,  C03C3/06 ,  C03C2201/02

Abstract: High purity synthetic quartz glass particles are derived from alkali metal silicate and have a total amount of metal impurities content of at least 1 nullg/g and, in particular, have oxygen-deficient defects. The high-purity synthetic quartz glass particles having high viscosity similar to natural quartz and high-purity similar to known synthetic quartz can be provided at a low cost.

Abstract translation: 高纯度合成石英玻璃颗粒来源于碱金属硅酸盐，并且金属杂质含量的总量至少为1mug / g，特别是具有缺氧缺陷。 可以以低成本提供与天然石英相似的高粘度和类似于已知的合成石英的高纯度的高纯度合成石英玻璃颗粒。