公开(公告)号：US20110239706A1

公开(公告)日：2011-10-06

申请号：US13078426

申请日：2011-04-01

Applicant: Chikaya Tamitsuji ,  Kunio Watanabe ,  Akio Koike

Inventor： Chikaya Tamitsuji ,  Kunio Watanabe ,  Akio Koike

IPC: C03B20/00

CPC classification number: C03B19/1461 ,  C03B19/1453 ,  C03B2201/12 ,  C03B2201/42

Abstract: The present invention relates to a method for production of a synthetic quartz glass having a fluorine concentration of 1,000 ppm by mass or higher, comprising the following processes steps (a) to (c): (a) depositing and growing quartz glass fine particles obtained by flame hydrolysis of a glass-forming material onto a substrate, to thereby form a porous glass body; (b) maintaining the porous glass body in a reaction vessel under an elemental fluorine (F2)-containing atmosphere of 400° C. or lower, to thereby obtain a fluorine-containing porous glass body; and (c) heating the fluorine-containing porous glass body in a vitrification furnace to a transparent vitrification temperature, to thereby obtain a fluorine-containing transparent glass body, wherein, in step (b), elemental fluorine (F2) is continuously or intermittently supplied to the reaction vessel and the gas in the reaction vessel is continuously or intermittently discharged from the reaction vessel.

Abstract translation: 本发明涉及氟浓度为1000质量ppm以上的合成石英玻璃的制造方法，其特征在于，包括以下工序（a）〜（c）：（a）沉积并生长获得的石英玻璃微粒 通过将玻璃形成材料火焰水解成基材，从而形成多孔玻璃体; （b）在400℃以下的元素含氟（F2）的气氛下将多孔玻璃体保持在反应容器中，得到含氟多孔玻璃体; （c）将玻璃化炉中的含氟多孔质玻璃体加热至透明玻璃化温度，得到含氟透明玻璃体，其中，在步骤（b）中，元素氟（F2）连续或间歇地 供给反应容器，反应容器内的气体从反应容器连续地或间歇地排出。

公开(公告)号：US20110179827A1

公开(公告)日：2011-07-28

申请号：US13080704

申请日：2011-04-06

Applicant: Chikaya TAMITSUJI ,  Kunio Watanabe ,  Akio Koike

Inventor： Chikaya TAMITSUJI ,  Kunio Watanabe ,  Akio Koike

IPC: C03B8/04 ,  C03B20/00

CPC classification number: C03B19/1461 ,  C03B2201/12 ,  C03B2201/42 ,  C03C3/06 ,  C03C2201/12 ,  C03C2201/42

Abstract: The present invention relates to a process for production of a synthetic quartz glass having a fluorine concentration of 1,000 mass ppm or more, the process comprising: (a) a step of depositing and growing quartz glass fine particles obtained by flame hydrolysis of a glass forming raw material onto a substrate, to thereby form a porous glass body; (b) a step of keeping the porous glass body in a reaction vessel that is filled with elemental fluorine (F2) or a mixed gas comprising elemental fluorine (F2) diluted with an inert gas and contains a solid metal fluoride, to thereby obtain a fluorine-containing porous glass body; and (c) a step of heating the fluorine-containing porous glass body to a transparent vitrification temperature, to thereby obtain a fluorine-containing transparent glass body.

Abstract translation: 本发明涉及一种氟浓度为1000质量ppm以上的合成石英玻璃的制造方法，其特征在于，包括：（a）沉积和生长通过玻璃成形的火焰水解得到的石英玻璃微粒子的工序 原料在基板上，从而形成多孔玻璃体; （b）将多孔玻璃体保持在填充有元素氟（F2）的反应容器或包含用惰性气体稀释的元素氟（F2）的混合气体并含有固体金属氟化物的步骤，从而获得 含氟多孔玻璃体; 和（c）将含氟多孔质玻璃体加热至透明玻璃化温度的步骤，得到含氟透明玻璃体。

公开(公告)号：US20110028299A1

公开(公告)日：2011-02-03

申请号：US12904236

申请日：2010-10-14

Applicant: Kenta SAITOU ,  Akio Koike ,  Mitsuhiro Kawata

Inventor： Kenta SAITOU ,  Akio Koike ,  Mitsuhiro Kawata

IPC: C03C3/04

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/23 ,  C03B2201/30 ,  C03B2201/42 ,  C03C3/076 ,  C03C4/0085 ,  C03C23/0095 ,  C03C2201/23 ,  C03C2201/30 ,  C03C2201/42 ,  C03C2203/44 ,  C03C2203/52 ,  Y02P40/57

Abstract: The present invention provides a TiO2-containing silica glass from which a transparent extremely low thermal expansion glass having excellent transparency and having a temperature region in which the coefficient of thermal expansion is substantially zero can be obtained. The present invention relates to a TiO2-containing silica glass for optical member for EUV lithography, having a TiO2 concentration of from 3 to 14% by mass; an internal transmittance per 1-mm thickness in a wavelength region of from 400 to 700 nm, T400-700, of 97% or more; and an internal transmittance per 1-mm thickness in a wavelength region of from 400 to 3,000 nm, T400-3000, of 70% or more.

Abstract translation: 本发明提供一种含TiO 2的二氧化硅玻璃，可以得到透明度极高的透明性高且热膨胀系数基本上为零的温度区域的玻璃。 本发明涉及TiO 2浓度为3〜14质量％的用于EUV光刻用的光学部件的含TiO 2的二氧化硅玻璃， 在400〜700nm波长范围内，每1mm厚的内透射率，T400-700，97％以上; 在400〜3000nm的波长范围内，每1mm厚的内透射率为T400〜3000，为70％以上。

公开(公告)号：US20100179047A1

公开(公告)日：2010-07-15

申请号：US12718776

申请日：2010-03-05

Applicant: Akio KOIKE ,  Chikaya Tamitsuji ,  Kunio Watanabe ,  Tomonori Ogawa

Inventor： Akio KOIKE ,  Chikaya Tamitsuji ,  Kunio Watanabe ,  Tomonori Ogawa

IPC: C03C3/06 ,  C03C10/00

CPC classification number: C03C3/06 ,  C03B19/1423 ,  C03B19/1453 ,  C03B19/1461 ,  C03B25/02 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/42 ,  C03B2207/36 ,  C03C4/0085 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/42 ,  C03C2203/54

Abstract: The present invention relates to an optical member including a TiO2-containing silica glass having: a TiO2 concentration of from 3 to 10% by mass; a Ti3+ concentration of 100 wt ppm or less; a thermal expansion coefficient at from 0 to 100° C., CTE0-100, of 0±150 ppb/° C.; and an internal transmittance in the wavelength range of 400 to 700 nm per a thickness of 1 mm, T400-700, of 80% or more, in which the optical member has a ratio of variation of Ti3+ concentration to an average value of the Ti3+ concentration, ΔTi3+/Ti3+, on an optical use surface, is 0.2 or less.

Abstract translation: 本发明涉及一种含有TiO2含量为3〜10质量％的含TiO 2的二氧化硅玻璃的光学构件， Ti3 +浓度为100重量ppm以下; 0-100℃的热膨胀系数，CTE0-100，为0±150ppb /℃。 并且在400〜700nm的波长范围内的内部透射率，每1mm厚度，T400〜700，为80％以上，其中光学部件具有Ti 3+浓度的变化比与Ti 3+的平均值的比值， 在光学用表面上的浓度＆Dgr; Ti 3+ / Ti 3+为0.2以下。

公开(公告)号：USRE41220E1

公开(公告)日：2010-04-13

申请号：US11880425

申请日：2000-07-10

Applicant: Claude L. Davis Jr. ,  Kenneth E. Hrdina

Inventor： Claude L. Davis Jr. ,  Kenneth E. Hrdina

IPC: G21K1/06

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  C03B19/1415 ,  C03B2201/07 ,  C03B2201/42 ,  G02B5/0891 ,  G02B17/0615 ,  G02B17/0636 ,  G03F1/24 ,  G03F1/60 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70283 ,  G03F7/70891 ,  G03F7/70958 ,  G21K1/062 ,  G21K2201/064 ,  G21K2201/067

Abstract: The projection lithographic method for producing integrated circuits and forming patterns with extremely small feature dimensions includes an illumination sub-system (36) for producing and directing an extreme ultraviolet soft x-ray radiation λ from an extreme ultraviolet soft x-ray source (38); a mask stage (22) illuminated by the extreme ultraviolet soft x-ray radiation λ produced by illumination stage and the mask stage (22) includes a pattern when illuminated by radiation λ. A protection sub-system includes reflective multilayer coated Ti doped high purity SiO2 glass defect free surface (32) and printed media subject wafer which has a radiation sensitive surface.

Abstract translation: 用于制造集成电路和形成具有极小特征尺寸的图案的投影光刻方法包括用于产生和引导来自极紫外线软X射线源（38）的极紫外线软X射线辐射λ的照明子系统（36） ; 由照射级产生的极紫外线软X射线辐射λ照射的掩模台（22）和掩模台（22）包括当被辐射λ照射时的图案。 保护子系统包括具有辐射敏感表面的反射多层涂覆的Ti掺杂的高纯度SiO 2玻璃无缺陷表面（32）和印刷媒体对象晶片。

公开(公告)号：US07635658B2

公开(公告)日：2009-12-22

申请号：US11583619

申请日：2006-10-19

Applicant: Dana Craig Bookbinder ,  Richard Michael Fiacco ,  Ulrich Wilhelm Heinz Neukirch

Inventor： Dana Craig Bookbinder ,  Richard Michael Fiacco ,  Ulrich Wilhelm Heinz Neukirch

IPC: C03C3/06 ,  C03C15/00 ,  C03B19/06 ,  C03B37/00 ,  C03B37/014

CPC classification number: C03C3/06 ,  C03B19/06 ,  C03B19/066 ,  C03B19/12 ,  C03B19/14 ,  C03B19/1453 ,  C03B20/00 ,  C03B32/00 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/08 ,  C03B2201/12 ,  C03B2201/22 ,  C03B2201/23 ,  C03B2201/32 ,  C03B2201/42 ,  C03C4/0085 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/22 ,  C03C2201/23

Abstract: What is disclosed includes OD-doped synthetic silica glass capable of being used in optical elements for use in lithography below about 300 nm. OD-doped synthetic silica glass was found to have significantly lower polarization-induced birefringence value than non-OD-doped silica glass with comparable concentration of OH. Also disclosed are processes for making OD-doped synthetic silica glasses, optical member comprising such glasses, and lithographic systems comprising such optical member. The glass is particularly suitable for immersion lithographic systems due to the exceptionally low polarization-induced birefringence values at about 193 nm.

Abstract translation: 公开的内容包括能够用于低于约300nm的光刻中的光学元件的OD掺杂合成石英玻璃。 发现OD掺杂的合成二氧化硅玻璃具有比具有相当浓度的OH的非OD掺杂的石英玻璃具有显着更低的偏振诱导双折射值。 还公开了制造掺杂OD的合成二氧化硅玻璃，包含这种玻璃的光学构件以及包括这种光学构件的光刻系统的方法。 由于在约193nm处极度低的偏振诱发双折射值，该玻璃特别适用于浸没式光刻系统。

公开(公告)号：US20090235696A1

公开(公告)日：2009-09-24

申请号：US11992544

申请日：2007-08-23

Applicant: Tomomi Ichinose ,  Toru Achiwa ,  Kouichi Sawafuji

Inventor： Tomomi Ichinose ,  Toru Achiwa ,  Kouichi Sawafuji

IPC: C03B37/016

CPC classification number: G02B3/0087 ,  C03B19/12 ,  C03B37/027 ,  C03B2201/30 ,  C03B2201/32 ,  C03B2201/40 ,  C03B2201/42 ,  C03B2203/26 ,  C03C1/006 ,  Y02P40/57

Abstract: A method of manufacturing a GRIN lens includes a forming a wet gel from an alcohol solution containing a silicon alkoxide, a dopant alkoxide, and an aluminum alkoxide; dissolving by leaching the dopant and aluminum away from an outer peripheral surface of the wet gel to provide a refractive index distribution; forming a dry gel by drying the wet gel; forming a glass preform by firing the dry gel; and wire-drawing the perform. In the step of leaching, most aluminum dissolves from the wet gel, thereby increasing the porosity of the dry gel and preventing cracking during sintering and foaming during wire-drawing.

Abstract translation: 制造GRIN透镜的方法包括从含有硅醇盐，掺杂剂醇盐和烷氧基铝的醇溶液形成湿凝胶; 通过将掺杂剂和铝从湿凝胶的外周表面浸出而溶解以提供折射率分布; 通过干燥湿凝胶形成干凝胶; 通过焙烧干凝胶形成玻璃预制件; 并绘制表演。 在浸出步骤中，大多数铝从湿凝胶中溶解，从而增加干凝胶的孔隙率，并防止在拉丝过程中烧结和发泡期间的开裂。

公开(公告)号：US07585598B2

公开(公告)日：2009-09-08

申请号：US11634270

申请日：2006-12-06

Applicant: Shigeru Maida ,  Motoyuki Yamada

Inventor： Shigeru Maida ,  Motoyuki Yamada

IPC: G03F1/00 ,  C03C3/06 ,  G02B1/00

CPC classification number: C03B19/1407 ,  B82Y10/00 ,  B82Y40/00 ,  C03B19/1415 ,  C03B19/1446 ,  C03B19/1453 ,  C03B19/1484 ,  C03B2201/42 ,  C03C3/06 ,  C03C2201/11 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/42 ,  G03F1/24 ,  G03F1/60 ,  G21K2201/067

Abstract: A titania-doped quartz glass containing 3-12 wt % of titania at a titania concentration gradient less than or equal to 0.01 wt %/μm and having an apparent transmittance to 440 nm wavelength light of at least 30% at a thickness of 6.35 mm is of such homogeneity that it provides a high surface accuracy as required for EUV lithographic members, typically EUV lithographic photomask substrates.

Abstract translation: 在二氧化钛浓度梯度小于或等于0.01重量％/重量的情况下，含有3-12重量％的二氧化钛的二氧化钛掺杂的石英玻璃，并且对于440nm波长具有至多30％的表观透射率，厚度为6.35mm 具有这样的同质性，其提供了EUV光刻元件（通常为EUV光刻光掩模基板）所需的高表面精度。

公开(公告)号：US20090019894A1

公开(公告)日：2009-01-22

申请号：US12185463

申请日：2008-08-04

Applicant: Pieter Matthijse ,  Mattheus Jacobus Stralen ,  Mark Peter Marie Jetten ,  Gert-Jan Krabshuis

Inventor： Pieter Matthijse ,  Mattheus Jacobus Stralen ,  Mark Peter Marie Jetten ,  Gert-Jan Krabshuis

IPC: C03B37/018

CPC classification number: G02B6/02047 ,  C03B37/01807 ,  C03B2201/10 ,  C03B2201/12 ,  C03B2201/24 ,  C03B2201/28 ,  C03B2201/30 ,  C03B2201/31 ,  C03B2201/32 ,  C03B2201/40 ,  C03B2201/42 ,  C03B2203/26 ,  G02B6/0281 ,  G02B6/0288 ,  G02B6/036

Abstract: The invention relates to a multimode optical fibre having a refractive index profile, comprising a light-guiding core surrounded by one or more cladding layers. The present invention furthermore relates to an optical communication system comprising a transmitter, a receiver and a multimode optical fibre.

Abstract translation: 本发明涉及一种具有折射率分布的多模光纤，包括由一个或多个包覆层包围的导光芯。 本发明还涉及一种包括发射机，接收机和多模光纤的光通信系统。

公开(公告)号：US07429546B2

公开(公告)日：2008-09-30

申请号：US11172950

申请日：2005-07-05

Applicant: Yasutomi Iwahashi ,  Akio Koike

Inventor： Yasutomi Iwahashi ,  Akio Koike

IPC: C03C3/06 ,  C03C3/076 ,  C03C3/11 ,  C03C3/112 ,  C03B19/06 ,  C03B37/018

CPC classification number: C03B19/1415 ,  C03B19/1461 ,  C03B2201/12 ,  C03B2201/42 ,  C03C3/06 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/42 ,  C03C2203/40 ,  C03C2203/54

Abstract: A silica glass containing TiO2, which has a fictive temperature of at most 1,200° C., a F concentration of at least 100 ppm and a coefficient of thermal expansion of 0±200 ppb/° C. from 0 to 100° C.A process for producing a silica glass containing TiO2, which comprises a step of forming a porous glass body on a target quartz glass particles obtained by flame hydrolysis of glass-forming materials, a step of obtaining a fluorine-containing porous glass body, a step of obtaining a fluorine-containing vitrified glass body, a step of obtaining a fluorine-containing formed glass body and a step of carrying out annealing treatment.

Abstract translation: 含有TiO 2的二氧化硅玻璃，其具有至多1200℃的假想温度，至少100ppm的F浓度和0±200ppb /℃的热膨胀系数。 0至100℃。一种制备含有TiO 2的石英玻璃的方法，其包括在通过玻璃形成材料的火焰水解获得的目标石英玻璃颗粒上形成多孔玻璃体的步骤 ，获得含氟多​​孔玻璃体的步骤，获得含氟玻璃化玻璃体的步骤，获得含氟成形玻璃体的步骤和进行退火处理的步骤。