公开(公告)号：EP2821778A1

公开(公告)日：2015-01-07

申请号：EP13754054.8

申请日：2013-02-26

Applicant: Kyoto University

Inventor： YOSHIDA, Hiroyuki

IPC: G01N21/62

CPC classification number: G01J3/30 ,  G01J3/443 ,  G01N21/66 ,  G01N23/2251 ,  G01N2223/08 ,  H01J37/06

Abstract: Intensity of near-ultraviolet light or visible light of 180 to 700 nm emitted from a solid sample, such as an organic semiconductor, irradiated with an electron beam is measured, while kinetic energy (accelerating energy) of the electron beam is changed in a range of 0 to 5 eV so as to obtain a spectrum. Peaks are detected from the spectrum, and the energy thereof is defined as unoccupied-states energy of the sample. The onset energy of the first peak represents electronic affinity energy (electron affinity) of the sample. Since the energy of the electron beam irradiated onto the sample is 5 eV or less, almost no damage is exerted on the sample even when the sample is an organic semiconductor.

Abstract translation: 测量从用电子束照射的固体样品（例如有机半导体）发射的近紫外光或可见光的180至700nm的强度，同时电子束的动能（加速能）在一定范围内变化 为0〜5eV，得到光谱。 从光谱中检测峰，其能量被定义为样品的空闲状态能量。 第一峰的起始能量表示样品的电子亲和力（电子亲和力）。 由于照射到样品上的电子束的能量为5eV以下，所以即使在样品为有机半导体时也几乎不会对样品施加损伤。

公开(公告)号：EP2795340A1

公开(公告)日：2014-10-29

申请号：EP12860555.7

申请日：2012-11-01

Applicant: Electro Scientific Industries, Inc.

Inventor： O'CONNOR, Ciaran John Patrick ,  HILLIARD, Shane

IPC: G01N35/10 ,  G01N1/28

CPC classification number: G01N1/22 ,  G01J3/0202 ,  G01J3/0286 ,  G01J3/0291 ,  G01J3/443 ,  G01N21/84 ,  H01J49/0463

Abstract: An apparatus can include ablation chamber body having a transmission window and defining an accommodation region configured to accommodate a target that is movable relative to the transmission window. An aerosol transmission conduit is configured to transport an aerosol produced within the accommodation region to a sample receiving region of an analysis system along a substantially straight transport path.

公开(公告)号：EP2614363A1

公开(公告)日：2013-07-17

申请号：EP11754371.0

申请日：2011-09-06

Applicant: Commissariat à l'Énergie Atomique et aux Énergies Alternatives

Inventor： LACOUR, Jean-Luc ,  CARON, Nadège ,  BERANGER, Kévin

IPC: G01N21/71 ,  G01J3/443

CPC classification number: G01N21/718 ,  G01J3/0208 ,  G01J3/0218 ,  G01J3/443 ,  G01J2003/1226

Abstract: Device (1) for mapping and analysing at least one element of interest within a solid specimen (10) by laser-induced plasma optical emission spectroscopy, allowing high-resolution mapping, especially of elements such as hydrogen and oxygen. The present invention may apply to the nuclear and aeronautical industry fields and has in particular the advantage of not requiring expensive equipment. In one of the embodiments of the invention, simultaneous mapping of elements such as hydrogen, oxygen and/or lithium can in particular be carried out.

公开(公告)号：EP2359110A1

公开(公告)日：2011-08-24

申请号：EP09759753.8

申请日：2009-11-03

Applicant: Bertin Technologies

Inventor： SENAC Stéphane

IPC: G01J3/02 ,  G01J3/443 ,  G01N21/27 ,  G01N21/71

CPC classification number: G01J3/443 ,  G01J3/02 ,  G01J3/0208 ,  G01J3/0256 ,  G01J3/0272 ,  G01J3/0291 ,  G01N21/718 ,  G01N2201/0221

Abstract: The invention relates to a device for analysing materials by plasma spectroscopy, of the type that is portable and self-contained and including a housing (10) containing a laser generator (18) generating laser pulses that are focalised onto the surface of a material to be analysed by a parabolic mirror (32) capable of translation in the housing so as to carry out a series of point measurements along a scanning line at the surface of the material to be analysed and a measurement on a calibration sample (50) mounted in the measurement endpiece (22) of the housing (10).

Abstract translation: 用于通过等离子体光谱法分析材料的装置是便携式和独立型的装置，包括一个包含激光发生器（18）的壳体（10），该激光发生器（18）发射激光脉冲，该激光脉冲通过抛物面方式聚焦在待分析材料的表面上 反射镜（32），其可在壳体内平移地移动，以便沿着要分析的材料的表面上的扫描线执行一系列点测量，并且从安装在所述待校准样品中的校准样品（50）进行测量 壳体（10）的测量端部件（22）。

公开(公告)号：EP2333503A2

公开(公告)日：2011-06-15

申请号：EP10192471.0

申请日：2010-11-24

Applicant: General Electric Company

Inventor： Li, Hejie ,  Brown, Roderick Gordon (Deceased) ,  Dasgupta, Samhita ,  Furlong, Edward Randall ,  Nirmalan, Nirm Velumylum ,  Wang, Anquan ,  Wang, Guanghua ,  Walls, Stephen Thomas

IPC: G01J5/00 ,  G01J5/58 ,  G01J3/36 ,  G01J3/42 ,  G01J3/443 ,  G01J3/28 ,  G01J3/02 ,  G01J5/02 ,  G01J5/08

CPC classification number: G01J5/0014 ,  G01J3/02 ,  G01J3/0216 ,  G01J3/0218 ,  G01J3/28 ,  G01J3/36 ,  G01J3/42 ,  G01J3/443 ,  G01J5/0022 ,  G01J5/0044 ,  G01J5/0088 ,  G01J5/08 ,  G01J5/0815 ,  G01J5/0821 ,  G01J5/0846 ,  G01J5/0862 ,  G01J5/58

Abstract: A thermal measurement system (10) comprises a light collection device (22); and a detection system (40, 140, 240, 340) in communication with the light collection device (22). The detection system (40, 140, 240, 340) is configured to detect light (94) intensity from a gas (80). The present invention has been described in terms of specific embodiment(s), and it is recognized that equivalents, alternatives, and modifications, aside from those expressly stated, are possible and within the scope of the appending claims.

Abstract translation: 热测量系统（10）包括光收集装置（22）; 以及与所述光采集装置（22）连通的检测系统（40,140,​​240,340）。 检测系统（40,140,​​240,340）被配置为从气体（80）检测光（94）的强度。 已经根据具体实施例描述了本发明，并且认识到除了明确说明的那些之外的等同物，替代方案和修改是可能的并且在所附权利要求的范围内。

公开(公告)号：EP2076741A2

公开(公告)日：2009-07-08

申请号：EP07853966.5

申请日：2007-10-11

Applicant: Jmar Research, Inc.

Inventor： RIEGER, Harry

IPC: G01J3/30

CPC classification number: G01J3/10 ,  G01J3/443 ,  G01N21/718 ,  H01S3/08054 ,  H01S3/10038 ,  H01S3/10046 ,  H01S3/107 ,  H01S3/1103 ,  H01S3/115 ,  H01S3/127 ,  H01S3/2316 ,  H01S3/2341 ,  H01S3/2383

Abstract: A sample analysis system comprises a laser unit and a spectrometer unit. The laser unit emits a first laser pulse and a second laser pulse towards the sample with a pulse separation time of between about 1 microsecond to 20 microseconds. The laser unit includes an oscillator unit which is configured to generate the first laser pulse and the second laser pulse. A pre-amplifier unit is configured to receive the first laser pulse and the second laser pulse and increase the energy levels of each pulse prior to the pulses being emitted from the laser unit. The spectrometer unit captures emissions generated by the sample after the sample is stuck by the first and second laser pulses and identifies the elemental constituents of the sample using the emissions.

公开(公告)号：EP1724574A4

公开(公告)日：2008-07-02

申请号：EP05719442

申请日：2005-02-23

Applicant: JAPAN SCIENCE & TECH AGENCY

Inventor： OGO SEIJI ,  FUKUZUMI SHUNICHI ,  WATANABE YOSHIHITO

IPC: G01N27/62 ,  G01J3/443 ,  G01N21/27 ,  G01N21/31 ,  G01N21/33 ,  G01N21/35 ,  G01N21/64 ,  G01N21/65 ,  H01J49/04 ,  H01J49/10

CPC classification number: G01J3/443 ,  G01N21/31 ,  G01N21/33 ,  G01N21/35 ,  G01N21/3504 ,  G01N21/64 ,  G01N21/65 ,  H01J49/0468 ,  H01J49/165

Abstract: An analyzer capable of substantially simultaneously analyzing an absorption/emission/scattering spectrum and a mass spectrum as means for controlling the amount of ion introduced (8) is disposed in an ionization chamber of analyzer (10) conducting the ion vaporization of a high-concentration test sample to thereby control the amount of test sample ion introduced in ion extraction electrode (9). Further providing the analyzer with low-temperature bath (106) for cooling a solution of the test sample prior to introduction into sprayer (104) and cooling gas introduction pipe (108) of structure independent from the sprayer for cooling the sprayer and the test sample solution introduced in the sprayer (104) realizes effective inhibition of heating of the test sample at high-voltage application. Thus, even when use is made of a test sample that is stable at extremely low temperatures, it is feasible to substantially simultaneously carry out absorption/emission/scattering spectroscopy and mass spectroscopy.

公开(公告)号：EP1929257A2

公开(公告)日：2008-06-11

申请号：EP06813961.7

申请日：2006-08-30

Applicant: PerkinElmer, Inc.

Inventor： MORRISROE, Peter, J.

IPC: G01J3/30 ,  G01N21/73

CPC classification number: G01N21/73 ,  G01J3/443 ,  G01N21/68 ,  G01N2201/126 ,  H01J49/105

Abstract: A device for sustaining a plasma in a torch is provided. In certain examples, the device comprises a first electrode configured to couple to a power source and constructed and arranged to provide a loop current along a radial plane of the torch. In some examples, the radial plane of the torch is substantially perpendicular to a longitudinal axis of the torch.

公开(公告)号：EP1664691A1

公开(公告)日：2006-06-07

申请号：EP04786908.6

申请日：2004-09-03

Applicant: THERMO ELECTRON CORPORATION

Inventor： VINCENT, Francois ,  CABRAS, Antonio

IPC: G01J1/42 ,  G01J3/443

CPC classification number: G01J1/429 ,  G01J3/443

Abstract: Vacuum ultraviolet radiation detection apparatus (10) comprises a radiation detector (30) in a chamber (12). The detector (30) receives ultraviolet radiation from a radiation source (36). The chamber is evacuated using a dry vacuum pump (18) to a relatively poor vacuum of no less than 5 Pa. UV transparent gas is supplied from a gas supply (26), into the chamber (12) at a relatively low flow rate (around 0.1 litres/minute) so as to provide an overall pressure in the chamber (12) of between 100 and 1,000 Pa. The use of a relatively inexpensive pump coupled with a lower gas flow rate provides significant cost savings.

公开(公告)号：EP1105703A4

公开(公告)日：2005-08-03

申请号：EP99918803

申请日：1999-04-23

Applicant: SANDIA CORP

Inventor： SMITH MICHAEL LANE JR ,  STEVENSON JOEL O'DON ,  WARD PAMELA DENISE PEARDON

IPC: G01J3/02 ,  G01J3/00 ,  G01J3/28 ,  G01J3/44 ,  G01J3/443 ,  G01N21/71 ,  H01J37/32 ,  H01L21/302 ,  H01L21/3065 ,  H05H1/00 ,  H01L21/66

CPC classification number: G01J3/443 ,  G01J3/28 ,  G01J2003/2866

Abstract: The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in some manner to calibrating or initializing a plasma monitoring assembly (174). This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window (124) through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber (74).