公开(公告)号：US08410458B2

公开(公告)日：2013-04-02

申请号：US13262298

申请日：2010-03-11

Applicant: Christian Neumann

Inventor： Christian Neumann

IPC: G21K5/00

CPC classification number: G02B5/208 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/30 ,  C03C2201/42 ,  C03C2203/10 ,  G02B5/226

Abstract: The invention relates to an optical filter material made of doped quartz glass, which at a low dopant concentration exhibits spectral transmission as high as possible of at least 80% cm−1 for operating radiation of 254 nm, transmission as low as possible in the wave range below approximately 250 nm, and an edge wavelength λc within the wave range of 230 to 250 nm. It was found that this aim is achieved by doping comprising a gallium compound, which in the wave range below 250 nm has a maximum of an absorption band and thus determines the edge wave range λc.

Abstract translation: 本发明涉及由掺杂石英玻璃制成的滤光材料，其在低掺杂浓度下表现出尽可能高的至少80％cm -1的光谱透射率，用于操作254nm的辐射，在波中尽可能低的透射 范围在250nm以下，边缘波长λc在230〜250nm的波长范围内。 发现该目的通过掺杂包括镓化合物来实现，该镓化合物在250nm以下的波长范围内具有最大吸收带，从而确定边缘波长λc。

公开(公告)号：US08329604B2

公开(公告)日：2012-12-11

申请号：US12351998

申请日：2009-01-12

Applicant: Yasutomi Iwahashi ,  Akio Koike

Inventor： Yasutomi Iwahashi ,  Akio Koike

IPC: C03C3/06 ,  C03C3/04

CPC classification number: C03B19/1415 ,  C03B19/1461 ,  C03B2201/12 ,  C03B2201/42 ,  C03C3/06 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/42 ,  C03C2203/40 ,  C03C2203/54

Abstract: A silica glass containing TiO2, which has a fictive temperature of at most 1,200° C., a F concentration of at least 100 ppm and a coefficient of thermal expansion of 0±200 ppb/° C. from 0 to 100° C.A process for producing a silica glass containing TiO2, which comprises a step of forming a porous glass body on a target quartz glass particles obtained by flame hydrolysis of glass-forming materials, a step of obtaining a fluorine-containing porous glass body, a step of obtaining a fluorine-containing vitrified glass body, a step of obtaining a fluorine-containing formed glass body and a step of carrying out annealing treatment.

Abstract translation: 含有TiO 2的二氧化硅玻璃，其假想温度为至多1200℃，F浓度为至少100ppm，热膨胀系数为0±200ppb /℃，为0〜100℃。 含有TiO 2的二氧化硅玻璃的制造方法，其包括在通过玻璃形成材料的火焰水解得到的目标石英玻璃粒子上形成多孔玻璃体的工序，得到含氟多孔玻璃体的工序， 获得含氟玻璃化玻璃体，获得含氟成形玻璃体的步骤和进行退火处理的步骤。

公开(公告)号：US20120238434A1

公开(公告)日：2012-09-20

申请号：US13486485

申请日：2012-06-01

Applicant: Akio Koike ,  Takahiro Mitsumori ,  Tomonori Ogawa

Inventor： Akio Koike ,  Takahiro Mitsumori ,  Tomonori Ogawa

IPC: C03C3/06

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/10 ,  C03B2201/12 ,  C03B2201/23 ,  C03B2201/28 ,  C03B2201/42 ,  C03B2201/50 ,  C03C2201/10 ,  C03C2201/20 ,  C03C2201/28 ,  C03C2201/42

Abstract: The present invention relates to a TiO2-containing silica glass containing TiO2 in an amount of from 5 to 10 mass % and at least one of B2O3, P2O5 and S in an amount of from 50 ppb by mass to 5 mass % in terms of the total content.

Abstract translation: 本发明涉及含有5〜10质量％的TiO 2和B 2 O 3，P 2 O 5，S中的至少一种的含TiO 2的二氧化硅玻璃，其量为50ppb〜5质量％ 总内容

公开(公告)号：US20120205343A1

公开(公告)日：2012-08-16

申请号：US13445345

申请日：2012-04-12

Applicant: Akio Koike ,  Junko Miyasaka

Inventor： Akio Koike ,  Junko Miyasaka

IPC: C03C15/00

CPC classification number: G03F7/0002 ,  B29C33/3842 ,  B82Y10/00 ,  B82Y40/00 ,  C03B19/14 ,  C03B2201/42 ,  C03C3/06 ,  C03C15/00 ,  C03C2201/42 ,  C03C2203/44

Abstract: The present invention relates to a method for producing a silica glass substrate for an imprint mold, containing: obtaining a glass body from a glass-forming raw material containing an SiO2 precursor; machining the glass body into a glass substrate having a predetermined shape; and removing an affected layer on a surface of the glass substrate, to produce a silica glass substrate for an imprint mold having a fictive temperature distribution in a region from the surface to a depth of 10 μm on the side to be subjected to a transfer pattern formation of the glass substrate being within ±30° C.

Abstract translation: 本发明涉及一种压印模具用石英玻璃基板的制造方法，其特征在于，包括：从含有SiO 2前体的玻璃成形原料获得玻璃体; 将玻璃体加工成具有预定形状的玻璃基板; 并除去玻璃基板的表面上的受影响层，从而生成用于压印模具的石英玻璃基板，该印模具具有在要进行转印图案的一侧的表面至深度10μm的区域中具有虚构的温度分布 玻璃基板的形成在±30℃以内

公开(公告)号：US08093165B2

公开(公告)日：2012-01-10

申请号：US12869035

申请日：2010-08-26

Applicant: Akio Koike ,  Yasutomi Iwahashi ,  Shinya Kikugawa ,  Yuko Tachibana

Inventor： Akio Koike ,  Yasutomi Iwahashi ,  Shinya Kikugawa ,  Yuko Tachibana

IPC: C03C3/06 ,  C03B19/06 ,  C03B37/018 ,  C03B25/00

CPC classification number: C03B19/1453 ,  B82Y10/00 ,  B82Y40/00 ,  C03B2201/075 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2201/42 ,  C03C3/06 ,  C03C3/076 ,  C03C4/0071 ,  C03C4/0085 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/42 ,  C03C2203/44 ,  C03C2203/52 ,  C03C2203/54 ,  G03F1/24 ,  G03F7/70958 ,  Y02P40/57

Abstract: The present invention provides a TiO2—SiO2 glass in which when used as an optical member for an exposure tool for EUVL, a thermal expansion coefficient is substantially zero at the time of irradiation with high-EUV energy light, and physical properties of a multilayer can be kept over a long period of time by releasing hydrogen from the glass. The present invention relates to a TiO2-containing silica glass having a fictive temperature of 1,100° C. or lower, a hydrogen molecule concentration of 1×1016 molecules/cm3 or more, and a temperature, at which a linear thermal expansion coefficient is 0 ppb/° C., falling within the range of from 40 to 110° C.

Abstract translation: 本发明提供了一种TiO 2 -SiO 2玻璃，其中当用作用于EUVL的曝光工具的光学部件时，在高EUV能量光照射时热膨胀系数基本上为零，并且多层罐的物理性能 通过从玻璃中释放氢气，保持很长一段时间。 本发明涉及一种假想温度为1100℃或更低，氢分子浓度为1×1016分/厘米3或更高的含钛二氧化硅玻璃以及线性热膨胀系数为0的温度 ppb /℃，在40〜110℃的范围内。

公开(公告)号：US07939457B2

公开(公告)日：2011-05-10

申请号：US12277611

申请日：2008-11-25

Applicant: Kenneth Edward Hrdina ,  Robert Sabia

Inventor： Kenneth Edward Hrdina ,  Robert Sabia

IPC: C03C3/06 ,  C03C3/04

CPC classification number: C03C3/06 ,  C03B19/1407 ,  C03B19/143 ,  C03B19/1484 ,  C03B2201/42 ,  C03C2201/42 ,  C03C2203/40

Abstract: A low expansion glass substrate includes titania and silica and has a thermal expansivity with an average gradient less than 1 ppb/° C./° C. in a temperature range of 19° C. to 25° C.

Abstract translation: 低膨胀玻璃基板包括二氧化钛和二氧化硅，并且在19℃至25℃的温度范围内具有平均梯度小于1ppb /℃/℃的热膨胀性。

公开(公告)号：US07935648B2

公开(公告)日：2011-05-03

申请号：US12133007

申请日：2008-06-04

Applicant: Shigeru Maida ,  Hisatoshi Otsuka

Inventor： Shigeru Maida ,  Hisatoshi Otsuka

IPC: C03C3/06 ,  C03C3/076

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/42 ,  C03C2203/44 ,  C03C2203/52

Abstract: In the nanoimprint lithography, a titania-doped quartz glass having a CTE of −300 to 300 ppb/° C. between 0° C. and 250° C. and a CTE distribution of up to 100 ppb/° C. at 25° C. is suited for use as nanoimprint molds.

Abstract translation: 在纳米压印光刻中，掺杂二氧化钛的石英玻璃在0℃和250℃之间具有-300至300ppb /℃的CTE，在25℃下的CTE分布高达100ppb /℃ C.适用于纳米压印模具。

公开(公告)号：US20110089612A1

公开(公告)日：2011-04-21

申请号：US12978837

申请日：2010-12-27

Applicant: YOSHIAKI IKUTA ,  Yasutomi Iwahashi ,  Kenji Okamura

Inventor： YOSHIAKI IKUTA ,  Yasutomi Iwahashi ,  Kenji Okamura

IPC: B29C35/08 ,  B29C59/02

CPC classification number: B29C33/38 ,  B82Y10/00 ,  B82Y40/00 ,  C03C3/06 ,  C03C2201/12 ,  C03C2201/42 ,  G03F7/0002

Abstract: An object of the present invention is to provide a TiO2-containing quartz glass substrate which, when used as a mold base for nanoimprint lithography, can form a concavity and convexity pattern having a dimensional variation falling within ±10%. The invention relates to a TiO2-containing quartz glass substrate: in which a coefficient of thermal expansion in the range of from 15 to 35° C. is within ±200 ppb/° C.; a TiO2 concentration is from 4 to 9 wt %; and a TiO2 concentration distribution, in a substrate surface on the side where a transfer pattern is to be formed, is within ±1 wt %.

Abstract translation: 本发明的目的是提供一种含TiO 2的石英玻璃基板，其用作纳米压印光刻用的模具基底时，可以形成尺寸变化在±10％以内的凹凸图案。 本发明涉及一种含TiO 2的石英玻璃基板，其中15至35℃范围内的热膨胀系数在±200ppb /℃以内。 TiO 2浓度为4〜9重量％。 并且在要形成转印图案的一侧的基板表面中的TiO 2浓度分布在±1重量％以内。

公开(公告)号：US20100323872A1

公开(公告)日：2010-12-23

申请号：US12869035

申请日：2010-08-26

Applicant: Akio KOIKE ,  Yasutomi IWAHASHI ,  Shinya KIKUGAWA ,  Yuko TACHIBANA

Inventor： Akio KOIKE ,  Yasutomi IWAHASHI ,  Shinya KIKUGAWA ,  Yuko TACHIBANA

IPC: C03C3/04

CPC classification number: C03B19/1453 ,  B82Y10/00 ,  B82Y40/00 ,  C03B2201/075 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2201/42 ,  C03C3/06 ,  C03C3/076 ,  C03C4/0071 ,  C03C4/0085 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/42 ,  C03C2203/44 ,  C03C2203/52 ,  C03C2203/54 ,  G03F1/24 ,  G03F7/70958 ,  Y02P40/57

Abstract: The present invention provides a TiO2—SiO2 glass in which when used as an optical member for an exposure tool for EUVL, a thermal expansion coefficient is substantially zero at the time of irradiation with high-EUV energy light, and physical properties of a multilayer can be kept over a long period of time by releasing hydrogen from the glass. The present invention relates to a TiO2-containing silica glass having a fictive temperature of 1,100° C. or lower, a hydrogen molecule concentration of 1×1016 molecules/cm3 or more, and a temperature, at which a linear thermal expansion coefficient is 0 ppb/° C., falling within the range of from 40 to 110° C.

Abstract translation: 本发明提供了一种TiO 2 -SiO 2玻璃，其中当用作用于EUVL的曝光工具的光学部件时，在高EUV能量光照射时热膨胀系数基本上为零，并且多层罐的物理性能 通过从玻璃中释放氢气，保持很长一段时间。 本发明涉及一种假想温度为1100℃或更低，氢分子浓度为1×1016分/厘米3或更高的含钛二氧化硅玻璃以及线性热膨胀系数为0的温度 ppb /℃，在40〜110℃的范围内。

公开(公告)号：US20100261597A1

公开(公告)日：2010-10-14

申请号：US12824923

申请日：2010-06-28

Applicant: Akio KOIKE ,  Yasutomi Iwahashi ,  Shinya Kikugawa

Inventor： Akio KOIKE ,  Yasutomi Iwahashi ,  Shinya Kikugawa

IPC: C03C3/04

CPC classification number: C03B19/1453 ,  C03B19/1461 ,  C03B32/00 ,  C03B2201/12 ,  C03B2201/23 ,  C03B2201/42 ,  C03C3/06 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/40 ,  C03C2201/42 ,  C03C2203/40 ,  C03C2203/46 ,  C03C2203/54 ,  Y02P40/57

Abstract: The present invention is to provide a TiO2—SiO2 glass having suitable thermal expansion properties as an optical member of an exposure tool for EUVL. The present invention relates to a TiO2-containing silica glass having a temperature, at which a coefficient of thermal expansion is 0 ppb/° C., falling within the range of 23±4° C. and a temperature width, in which a coefficient of thermal expansion is 0±5 ppb/° C., of 5° C. or more.

Abstract translation: 本发明提供具有合适的热膨胀性能的TiO 2 -SiO 2玻璃作为EUVL用曝光工具的光学部件。 本发明涉及热膨胀系数为0ppb /℃的温度为23±4℃的温度范围的含TiO 2的二氧化硅玻璃，其温度范围为 的热膨胀为0±5ppb /℃，为5℃以上。