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    Production of stable, radiation-curable urethane prepolymer for coating substrates
    181.
    发明专利
    Production of stable, radiation-curable urethane prepolymer for coating substrates 未知

    公开(公告)号：DE19814874A1

    公开(公告)日：1999-10-07

    申请号：DE19814874

    申请日：1998-04-02

    Applicant: BASF AG

    Inventor： SCHWALM REINHOLD ,  BECK ERICH ,  LOKAI MATTHIAS ,  MENZEL KLAUS

    IPC: C08G18/67 ,  C08G18/78 ,  C08G18/79 ,  C08G18/81 ,  C09D175/16 ,  C08G18/10 ,  C08L75/14 ,  C09D4/00 ,  C09D175/14

    Abstract: Radiation-curable urethane prepolymers are made from a mixture in which the isocyanate component contains two different trifunctional isocyanates or one tri- and one di-functional isocyanate, or the unsaturated polyol component contains at least two different unsaturated compounds with reactive hydroxyl groups and possibly other hydroxy compounds. A process for the production of radiation-curable, urethane group-containing prepolymers (PU) comprises reacting an isocyanate component (A) containing trifunctional isocyanate(s) (A1) and optionally difunctional isocyanate(s) (A2) with a polyol component (B) containing unsaturated compound(s) with at least one reactive hydroxyl group (B1) and optionally other OH group-containing compounds (B2), in which either (A) contains two different compounds (A1) or one (A1) and one (A2), or component (B) contains at least two different compounds (B1). Independent claims are also included for the following: (1) radiation-curable urethane prepolymers obtained by this process; (2) radiation-curable preparations containing prepolymers (PU) as above and possibly conventional additives etc.; (3) a process for coating substrates by applying PU or preparations containing PU to the substrate, removing any solvent; and hardening with UV or electron beam radiation; (4) coated substrates obtained by this process.

    RADIATION SENSITIVE MIXTURE AND PRODUCTION OF RELIEF PATTERNS
    183.
    发明专利
    RADIATION SENSITIVE MIXTURE AND PRODUCTION OF RELIEF PATTERNS 未知

    公开(公告)号：CA1338177C

    公开(公告)日：1996-03-26

    申请号：CA600064

    申请日：1989-05-18

    Applicant: BASF AG

    Inventor： SCHWALM REINHOLD ,  BINDER HORST

    IPC: G03F7/023 ,  C08L61/08 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027

    Abstract: A radiation sensitive mixture useful for producing relief patterns contains (a) a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions and (b) an organic compound whose solubility in an aqueous alkaline developer is increased by the action of acid and which contains at least one acid cleavable group and also a group which on irradiation forms a strong acid, wherein the polymeric binder (a) contains from 5 to 40 mol % of monomer units having groups in copolymerized or cocondensed form or the groups introduced by polymer analogous reaction, with the proviso that the radical R contains from 5 to 9 carbon atoms.

    RADIATION SENSITIVE MIXTURE AND PRODUCTION OF RELIEF PATTERNS
    184.
    发明专利
    RADIATION SENSITIVE MIXTURE AND PRODUCTION OF RELIEF PATTERNS 未知

    公开(公告)号：CA1334059C

    公开(公告)日：1995-01-24

    申请号：CA598317

    申请日：1989-05-01

    Applicant: BASF AG

    Inventor： SCHWALM REINHOLD ,  BINDER HORST ,  BOETTCHER ANDREAS

    IPC: G03F7/004 ,  G03F7/039

    Abstract: A radiation sensitive mixture suitable for producing relief patterns contains (a) a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions and (b) an organic compound whose solubility in an aqueous alkaline developer is increased by the action of acid and which contains at least one acid cleavable group and additionally a group which forms a strong acid on irradiation, wherein the polymeric binder (a) contains from 5 to 35 mol % of monomer units having acid labile groups as copolymerized or cocondensed units or acid labile groups introduced by polymer analogous reaction.

    185.
    发明专利
    未知

    公开(公告)号：DE58904764D1

    公开(公告)日：1993-07-29

    申请号：DE58904764

    申请日：1989-04-05

    Applicant: BASF AG

    Inventor： SCHWALM REINHOLD

    IPC: G03F7/039 ,  G03F7/004

    Abstract: The invention relates to a radiation-sensitive mixture for light- sensitive coating materials, and also to a process for obtaining relief patterns and images. … The radiation-sensitive mixture contains… a) a water-insoluble polymeric binder which is soluble in aqueous alkaline solutions, and… b) an organic compound whose solubility in an aqueous alkaline developer is increased by exposure to acid and which contains at least one acid-cleavable grouping,… the polymeric binder (a) being a copolymer containing o-nitrobenzyl groupings. … The radiation-sensitive mixture according to the invention is suitable, in particular, for obtaining photoresists.

    187.
    发明专利
    未知

    公开(公告)号：DK362488D0

    公开(公告)日：1988-06-30

    申请号：DK362488

    申请日：1988-06-30

    Applicant: BASF AG

    Inventor： SCHWALM REINHOLD ,  BOETTCHER ANDREAS ,  BINDER HORST

    IPC: G03C1/72 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075 ,  G03C1/495

    Abstract: A radiation-sensitive mixture consists of a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions, and of an organic compound whose solubility in an aqueous alkaline developer is increased by the action of an acid and which contains both one or more acid-cleavable groups and a group which forms a strong acid under the action of radiation. The radiation-sensitive mixture is suitable for use in photosensitive coating materials for the production of relief patterns and relief images.

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