Abstract:
A titania precursor (18) and a silica precursor (6) are mixed in a manifold (14) and are fed to a burner (28) to create soot (40) which is deposited on a deposition surface (34) which is rotated and elevated. The end product is useful for Extreme UV lithography.
Abstract:
The present disclosure is directed to a doped silica-titania glass, DST glass, consisting essentially of 0.1 wt.% to 5 wt.% halogen, 50 ppm-wt. to 6 wt.% of one or more oxides of Al, Ta and Nb, 3 wt.% to 10 wt.% TiO 2 and the remainder SiO 2 . In an embodiment the halogen content can be in the range of 0.2 wt.% to 3 wt.% along with 50 ppm-wt. to 6 wt.% one or more oxides of Al, Ta and Nb, 3 wt.% to 10 wt.% TiO 2 and the remainder SiO 2 . In an embodiment the DST glass has an OH concentration of less than 100 ppm. In another embodiment the OH concentration is less than 50 ppm. The DST glass has a Active temperature T f of less than 875°C. In an embodiment T f is less than 825°C. In another embodiment T f is less than 775°C.
Abstract:
This disclosure is directed to a silica-titania-niobia glass and to a method for making the glass. The composition of the silica-titania-niobia (SiO 2 -TiO 2 -Nb 2 O 5 ) glass, determined as the oxides, is Nb 2 O 5 in an amount in the range of 0.005 wt.% to 1.2 wt.% TiO 2 , in an amount in the range of 5 wt.% to 10 wt.%, and the remainder of glass is SiO 2 . In the method, the STN glass precursor is consolidated into a glass by heating to a temperature of 1600°C to 1700°C in flowing helium for 6 hours to 10 hours. When this temperature is reached, the helium flow can be replaced by argon for the remainder of the time. Subsequently the glass is cooled to approximately 1050°C, and then from 1050°C to 700°C followed by turning off the furnace and cooling the glass to room temperature at the natural cooling rate of the furnace.
Abstract:
A method of moving alkali metal ions in a glass substrate to form a glass substrate having an intrinsic alkali metal barrier layer or an enhanced alkali metal layer by applying voltage to at least one of the surfaces of the substrate such that at least a portion of the alkali metal ions, alkaline earth metal ions, or the combination thereof in the at least one surface move into the thickness of the glass substrate.
Abstract:
A fused silica glass and a fused silica article having a combined concentration of at least one of OH and OD of up to about 50 ppm. The fused silica glass is formed by drying a fused silica soot blank or preform in an inert atmosphere containing a drying agent, followed by removal of residual drying agent from the dried soot blank by heating the dried soot blank in an atmosphere comprising an inert gas and of oxygen.
Abstract:
Disclosed in the application are a synthetic silica glass having low fluence-dependent transmission, particularly at about 193 nm, and a process for making the same. The glass may desirably exhibit a low level of fluorescence at 290 and 390 nm when activated at about 248 nm. The glass may desirably exhibit low level of LIWFD, [SiH*] and/or [ODC].