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公开(公告)号:KR1020130085990A
公开(公告)日:2013-07-30
申请号:KR1020130005859
申请日:2013-01-18
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01L21/205 , H01L21/02
CPC classification number: C23C16/4581 , C23C16/4405 , C23C16/4554 , C23C16/45551 , C23C16/4584 , C23C16/50 , H01J37/32458 , H01J37/32715 , H01J37/32733 , H01J37/32825 , H01J2237/032 , H01J2237/201 , H01J2237/20214 , H01J2237/332 , H01L21/0206
Abstract: PURPOSE: A particle reduction method and a deposition method are provided to reduce particles generated from a concaved portion of a susceptor by efficiently removing quartz particles in a low surface of the concaved portion. CONSTITUTION: A vacuum container (1) is installed inside as an insulating material and a susceptor (2) on which a substrate loading portion on the surface is installed allowing rotation. A first gas is supplied to the vacuum container. A plasma is generated from the first gas supplying a high frequency to a plasma generation source installed to the vacuum container. A substrate loating part is exposed to the plasma in a state a substrate loading uit is exposed by rotation the susceptor. [Reference numerals] (100) Control unit; (101) Memory unit; (102) Medium; (AA,BB,CC,DD) N_2 gas
Abstract translation: 目的:提供一种降低粒子的方法和沉积方法,以通过有效地去除凹部的低表面中的石英颗粒来减少从基座的凹部产生的粒子。 构成:真空容器(1)作为绝缘材料安装在内部,并且其上安装有表面上的基板装载部分允许旋转的基座(2)。 向真空容器供给第一气体。 从提供高频的第一气体产生等离子体到安装在真空容器上的等离子体发生源。 衬底驻留部分在衬底加载的状态下通过转动感受器而暴露于等离子体。 (附图标记)(100)控制单元; (101)存储单元; (102)中等; (AA,BB,CC,DD)N_2气体
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公开(公告)号:KR102010122B1
公开(公告)日:2019-08-12
申请号:KR1020160077823
申请日:2016-06-22
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01L21/02 , H01L21/311 , H01L21/687
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