公开(公告)号：KR1020100138760A

公开(公告)日：2010-12-31

申请号：KR1020100055594

申请日：2010-06-11

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 미나미테루오미 ,  카미무라후미히로 ,  코사이카즈키 ,  야부타타카시 ,  요코미조켄지 ,  미조타쇼고

IPC: H01L21/306

CPC classification number: H01L21/67051 ,  H01L21/6708

Abstract: PURPOSE: A liquid processing apparatus and a liquid processing method are provided to eliminate a first film and a second film from a substrate regardless of the dissolvability of the second film with respect to first liquid. CONSTITUTION: A first liquid supplying part(51) supplies first liquid to a substrate in order to dissolve a first film on a substrate. A second liquid supplying part supplies second liquid to the substrate in order to reduce the intensity of a second film on the substrate. An impact alleviating part applies impact to the second film on the substrate. A fluid supplying part(52) supplies fluid to the substrate in order to discharge the particles of the second film.

Abstract translation: 目的：提供一种液体处理装置和液体处理方法，以便从第二膜与第一液体的溶解性无关地从基材上除去第一膜和第二膜。 构成：第一液体供应部分（51）将第一液体供应到基底以便将第一膜溶解在基底上。 为了降低基板上的第二膜的强度，第二液体供给部件将第二液体供给到基板。 冲击减轻部件对基板上的第二膜施加冲击。 流体供应部分（52）为了排出第二膜的颗粒而向流体供应流体。