公开(公告)号：KR101185072B1

公开(公告)日：2012-09-21

申请号：KR1020110012370

申请日：2011-02-11

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 아리마히로시 ,  요시하라코우스케 ,  요시다유이치 ,  타키구치야스시 ,  야마모토타로

IPC: H01L21/027 ,  G03F7/26 ,  H01L21/304

CPC classification number: G03F7/3021

Abstract: There is provided a developing apparatus capable of achieving high throughput. The developing apparatus includes an airtightly sealed processing vessel that forms a processing atmosphere therein; an atmosphere gas supply unit that supplies an atmosphere gas containing mist of a developing solution into the processing vessel in order to form a liquid film of the developing solution on a surface of a substrate loaded into the processing vessel; and a drying unit that dries the substrate in order to stop a developing process by the liquid film. A reaction between a resist and the developing solution can be stopped. Therefore, a developing process can be performed in parallel with a cleaning process performed by a cleaning module and high throughput is achieved.

公开(公告)号：KR1020110094246A

公开(公告)日：2011-08-23

申请号：KR1020110012370

申请日：2011-02-11

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 아리마히로시 ,  요시하라코우스케 ,  요시다유이치 ,  타키구치야스시 ,  야마모토타로

IPC: H01L21/027 ,  G03F7/26 ,  H01L21/304

CPC classification number: G03F7/3021 ,  H01L21/0274 ,  G03F1/60 ,  G03F7/265 ,  G03F7/32 ,  H01L21/3046

Abstract: PURPOSE: A developing apparatus, a developing method and a storage medium are provided to stop the reaction of a resist and developer and transfer a substrate to a cleaning apparatus by including a drying unit for stopping the development of a liquid film on the surface of the substrate. CONSTITUTION: In a developing apparatus, a developing method and a storage medium, a partitioning plate(13) is installed in a housing and divides the housing up and down. A reaction container(5) form a process condition pressure. A gas supply part(55) supplies gas including mist of a developer within the reaction container. A drying unit dries a substrate to stop the development of a liquid film. The drying unit includes a mounting unit for a substrate and a heating unit for a mounting plate.

Abstract translation: 目的：提供显影装置，显影方法和存储介质，以阻止抗蚀剂和显影剂的反应，并将基材转移到清洁装置，包括：用于停止在膜表面上形成液膜的干燥单元 基质。 构成：在显影装置，显影方法和存储介质中，分隔板（13）安装在壳体中并且上下分隔壳体。 反应容器（5）形成工艺条件压力。 气体供给部（55）在反应容器内供给含有显影剂雾的气体。 干燥单元干燥基板以停止液膜的显影。 干燥单元包括用于基板的安装单元和用于安装板的加热单元。

公开(公告)号：KR1020100103413A

公开(公告)日：2010-09-27

申请号：KR1020100022148

申请日：2010-03-12

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 요시다유우이찌 ,  아리마히로시 ,  야마모또다로오 ,  요시하라고오스께

IPC: H01L21/027

CPC classification number: H01L21/67748 ,  H01L21/67109 ,  H01L21/6715 ,  G03F7/0025 ,  G03F7/405 ,  G03F7/70875

Abstract: PURPOSE: A substrate processing apparatus, a substrate processing method, a coating and developing apparatus, a coating and developing method, and a storage media are provided to prevent the generation development defects by uniformly supplying a developing solution on a substrate. CONSTITUTION: A substrate(W) is undergone through an exposure process. A heating plate(31) heats the exposed substrate. A surface processing solution atomization unit(60) atomizes a surface processing solution in order to improve the wettability of the substrate. A cooling unit(15) cools the heat substrate. The surface processing solution supplying unit supplies the atomized surface processing solution to the substrate.

Abstract translation: 目的：提供基板处理装置，基板处理方法，涂覆和显影装置，涂覆和显影方法以及存储介质，以通过将显影液均匀地供应到基板上来防止发生发展缺陷。 构成：基片（W）经过曝光过程。 加热板（31）加热暴露的基板。 表面处理溶液雾化单元（60）使表面处理溶液雾化，以提高基材的润湿性。 冷却单元（15）冷却热衬底。 表面处理液供给部将该雾化表面处理液供给到基板。