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公开(公告)号：KR101529741B1
公开(公告)日：2015-06-17
申请号：KR1020100020826
申请日：2010-03-09
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01L21/027
CPC classification number: G03F7/3021 , H01L21/6715
Abstract: 본발명은현상액을기판에균일성높게공급하여수율의저하를억제할수 있는현상장치를제공하는것을목적으로한다. 표면에레지스트가도포되고, 노광된후의기판을수평으로유지하는기판유지부와, 상기기판에대한현상액의습윤성을높이기위한표면처리액을무화시키는표면처리액무화수단과, 무화된상기표면처리액을상기기판에분무하는제1 분무노즐과, 상기표면처리액이분무된기판에현상액을토출하여현상을행하기위한현상액토출노즐을구비하도록현상장치를구성한다. 무화된표면처리액은액상상태의표면처리액에비하여기판에대한표면장력이낮으므로, 기판상에서응집되는것이억제되어, 용이하게기판전체에공급할수 있어기판의습윤성을높일수 있다. 그결과로, 현상액을균일성높게기판에공급할수 있어수율의저하를억제할수 있다.
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公开(公告)号：KR101176882B1
公开(公告)日：2012-08-24
申请号：KR1020110007699
申请日：2011-01-26
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01L21/027
CPC classification number: G03F7/3021
Abstract: There is provided a developing apparatus and a developing method capable of rapidly forming a liquid film of a developing solution on an entire surface of a substrate while reducing a usage amount of the developing solution. The developing apparatus includes an airtightly sealed processing vessel that forms a processing atmosphere therein; a temperature control plate that is provided within the processing vessel and mounts the substrate thereon; an atmosphere gas supply unit that supplies an atmosphere gas including mist and vapor of a developing solution onto a surface of the substrate within the processing vessel; and a first temperature control unit that controls the temperature control plate to a temperature allowing the atmosphere gas to be condensed on the substrate. Here, an inner wall of the processing vessel is maintained at a temperature at which the atmosphere gas is hardly condensed on the inner wall.
Abstract translation: 提供一种能够在减少显影液的使用量的同时在基板的整个表面上快速形成显影液的液膜的显影设备和显影方法。 显影装置包括在其中形成处理气氛的气密密封的处理容器; 温度控制板，其设置在所述处理容器内并且安装所述基板; 气氛气体供应单元，所述气氛气体供应单元将包括显影液的雾和蒸汽的气氛气体供应到所述处理容器内的所述基板的表面上; 以及第一温度控制单元，其将所述温度控制板控制在允许所述气氛气体在所述基板上冷凝的温度。 这里，处理容器的内壁保持在气氛气体几乎不凝结在内壁上的温度。
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公开(公告)号：KR1020120059413A
公开(公告)日：2012-06-08
申请号：KR1020110125773
申请日：2011-11-29
Applicant: 도쿄엘렉트론가부시키가이샤
CPC classification number: G03F7/3021 , G03F7/0025 , G03F7/162 , G03F7/168 , G03F7/3057 , H01L21/6715
Abstract: PURPOSE: A developing apparatus, a developing method, and memory media are provided to increase the reactivity of developing liquid and resist in a specific region of a substrate. CONSTITUTION: A developing apparatus includes a substrate loading and supporting part(11), a developing liquid supplying part, a radiation light irradiating part, and a washing liquid supplying part(71). Resist is applied on the surface of the substrate loading and supporting part. The substrate loading and supporting part horizontally loads and supports a substrate after exposure. The developing liquid supplying part supplies developing liquid to the surface of the substrate. The developing liquid supplying part develops the resist. The developing liquid on the specific region of the substrate is heated to improve the reactivity of the developing liquid to the resist by irradiating radiation light with a substrate material wavelength absorbing region. The washing liquid supplying part supplies washing liquid to the surface of the substrate to eliminate the developing liquid.
Abstract translation: 目的：提供显影装置，显影方法和存储介质，以增加显影液和基板的特定区域中的抗蚀剂的反应性。 构成：显影装置包括基板装载和支撑部分（11），显影液体供应部分，辐射光照射部分和洗涤液体供应部分（71）。 抗蚀剂施加在基板装载和支撑部件的表面上。 衬底加载和支撑部分在曝光后水平地负载并支撑衬底。 显影液供给部将显影液供给到基板的表面。 显影液供给部显影抗蚀剂。 通过用基板材料波长吸收区域照射辐射光，加热基板的特定区域上的显影液，以提高显影液对抗蚀剂的反应性。 洗涤液供给部将清洗液供给到基板的表面，以除去显影液。
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公开(公告)号：KR1020110094242A
公开(公告)日：2011-08-23
申请号：KR1020110007700
申请日：2011-01-26
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01L21/027
CPC classification number: G03B27/52 , G03F7/3021 , H01L21/6715 , H01L21/67178 , H01L21/6719 , H01L21/67745 , H01L21/67748 , H01L21/68742 , H01L21/68785 , H01L21/0274
Abstract: PURPOSE: A coating and developing apparatus, a developing method and a non-transitory medium are provided to suppress the deterioration of throughout by processing a substrate in a developing module and a cleaning module. CONSTITUTION: In a coating and developing apparatus, a developing method and a non-transitory medium, a develop unit(20) comprises a developer module(2) a cleaning module(7) washing a wafer. The developer module supplies steam vapor of a developer to a housing(21). The wafer is returned to an exposure apparatus by an interface arm(9). A lathe unit(U1~U5) is comprised of a plurality of laminated modules in order to face with the develop unit. A transfer arm(A1) is installed in a DEV layer(B1) and sends the wafer to each heating module.
Abstract translation: 目的：提供一种涂布和显影装置，显影方法和非暂时性介质，以通过在显影模块和清洁模块中处理基板来抑制整个劣化。 构成：在涂布和显影装置中，显影方法和非瞬时介质，显影单元（20）包括显影剂模块（2）清洗晶片的清洁模块（7）。 显影剂模块将显影剂的蒸汽蒸气提供到壳体（21）。 晶片通过接口臂（9）返回到曝光装置。 为了与显影单元相对，车床单元（U1〜U5）由多个层压模块构成。 传送臂（A1）安装在DEV层（B1）中，并将晶片发送到每个加热模块。
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公开(公告)号：KR1020120047825A
公开(公告)日：2012-05-14
申请号：KR1020110113921
申请日：2011-11-03
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01L21/302
CPC classification number: G03F7/422 , H01L21/67051
Abstract: PURPOSE: A substrate cleaning apparatus and method, and a storage media for substrate cleaning are provided to efficiently clean a substrate by transferring a supply place of washing solution and a discharge place of gas to a peripheral part of the substrate and promoting the drying of a dry region. CONSTITUTION: A carrier station(1) comprises a load unit(11) loading a carrier(10), an opening and closing unit(12), and a transmitting means(A1). The transmitting means takes out a wafer(W) from the carrier through the opening and closing unit. A processing unit(2) comprises a shelf units(U1, U2, U3) and liquid processing units(U4, U5). An interface unit(3) is composed of a first transfer room(3A) and a second transfer room(3B) installed between the processing unit and a light exposed unit(4). A temperature-humidity control unit(22) controls temperature and humidity of processing liquid.
Abstract translation: 目的：提供一种基板清洗装置和方法以及用于基板清洗的存储介质，以通过将洗涤溶液的供应位置和气体排放位置转移到基板的周边部分来有效地清洁基板，并促进干燥 干燥区域。 构成：载体站（1）包括装载载体（10）的装载单元（11），打开和关闭单元（12）以及传送装置（A1）。 发送装置通过打开和关闭单元从载体中取出晶片（W）。 处理单元（2）包括搁板单元（U1，U2，U3）和液体处理单元（U4，U5）。 接口单元（3）由安装在处理单元和曝光单元（4）之间的第一传送室（3A）和第二传送室（3B）组成。 温度调节单元（22）控制处理液的温度和湿度。
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Patent Agency Ranking
公开(公告)号：KR1020110094241A
公开(公告)日：2011-08-23
申请号：KR1020110007699
申请日：2011-01-26
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01L21/027
CPC classification number: G03F7/3021 , H01L21/0274
Abstract: PURPOSE: A developing apparatus, a developing method thereof, and a storage medium are provided to form a liquid film over the surface of a substrate by setting the temperature of a heating plate to be below a temperature in which the vapor of a developing solution is condensed in a substrate. CONSTITUTION: In a developing apparatus, a developing method thereof, and a storage medium, a reaction container(5) forms a process condition. A heating plate(3) is installed in the reaction container and mounts a substrate(W). A gas supply unit(55) supplies gas including the mist and steam vapor of a developer to the surface of the substrate. A developer supply source(58) supplies the developer to the lower part of the gas supply unit. A gas heating unit(56) heats the gas to be a certain temperature.
Abstract translation: 目的：提供显影装置，显影方法和存储介质，以通过将加热板的温度设定在显影液的蒸气的温度以下而在基板的表面上形成液膜 在底物中冷凝。 构成：在显影装置中，其显影方法和存储介质，反应容器（5）形成工艺条件。 加热板（3）安装在反应容器中并安装基板（W）。 气体供给单元（55）将包括显影剂的雾和蒸汽的气体供给到基板的表面。 显影剂供应源（58）将显影剂供应到气体供应单元的下部。 气体加热单元（56）将气体加热到一定温度。
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公开(公告)号：KR101685961B1
公开(公告)日：2016-12-28
申请号：KR1020110007700
申请日：2011-01-26
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01L21/027
CPC classification number: G03B27/52 , G03F7/3021 , H01L21/6715 , H01L21/67178 , H01L21/6719 , H01L21/67745 , H01L21/67748 , H01L21/68742 , H01L21/68785
Abstract: 기판표면전체에균일성높게현상액의액막을형성하고또한높은스루풋을얻을수 있는도포현상장치를제공한다. 현상모듈과, 세정모듈과, 상기현상모듈에의해현상된기판을상기세정모듈로반송하는반송기구를구비하고, 상기현상모듈은, 처리분위기를형성하는기밀한처리용기와, 이처리용기내에설치되며기판을재치하여냉각시키기위한온조플레이트와, 상기처리용기내로현상액의미스트를포함하는분위기가스를공급하는증기공급부와, 상기온조플레이트를상기증기가기판상에결로되는온도로조정하기위한온조부를구비하도록도포현상장치를구성한다. 현상모듈과세정모듈에서병행하여처리를행할수 있으므로, 높은스루풋을얻을수 있다.
Abstract translation: 涂层和显影设备开发其表面被抗蚀剂涂覆并暴露于光的基底。 涂料和显影装置包括显影模块; 清洁模块; 以及传送机构，其构造成将由显影模块显影的基板传送到清洁模块。 显影模块包括构造成形成处理气氛的气密密封处理容器; 设置在处理容器中并安装在其上的温度控制板并冷却基板; 以及气氛气体供给单元，被构造成将处理容器内的显影液的气雾气体气体供给至基板的表面。 清洁模块包括：安装台，其安装在其上; 以及清洗液供给单元，其构造成将清洗液供给到安装在所述安装台上的基板。
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公开(公告)号：KR101522437B1
公开(公告)日：2015-05-21
申请号：KR1020100022148
申请日：2010-03-12
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01L21/027
CPC classification number: H01L21/67748 , H01L21/67109 , H01L21/6715
Abstract: 본발명의과제는현상결함을억제하여, 수율의저하를억제할수 있고, 또한후단의장치에있어서의처리의수고를경감시킬수 있는, 노광된후의기판을가열하는기판처리장치를제공하는것이다. 표면에레지스트가도포되고, 또한노광된후의기판을가열하는가열판과, 상기레지스트에공급하는현상액의상기기판으로의습윤성을높이기위한표면처리액을무화하는표면처리액무화수단과, 상기가열판에의해가열된기판을냉각하기위한냉각수단과, 상기가열판에의한가열이개시된후 상기냉각수단에의한냉각이종료될때까지, 무화된상기표면처리액을기판에공급하는표면처리액공급수단을구비하도록기판처리장치를구성한다.
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公开(公告)号：KR1020100103377A
公开(公告)日：2010-09-27
申请号：KR1020100020826
申请日：2010-03-09
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01L21/027
CPC classification number: G03F7/3021 , H01L21/6715 , G03F7/16 , G03F7/70925 , H01L21/67017 , H01L21/67051
Abstract: 본발명은현상액을기판에균일성높게공급하여수율의저하를억제할수 있는현상장치를제공하는것을목적으로한다. 표면에레지스트가도포되고, 노광된후의기판을수평으로유지하는기판유지부와, 상기기판에대한현상액의습윤성을높이기위한표면처리액을무화시키는표면처리액무화수단과, 무화된상기표면처리액을상기기판에분무하는제1 분무노즐과, 상기표면처리액이분무된기판에현상액을토출하여현상을행하기위한현상액토출노즐을구비하도록현상장치를구성한다. 무화된표면처리액은액상상태의표면처리액에비하여기판에대한표면장력이낮으므로, 기판상에서응집되는것이억제되어, 용이하게기판전체에공급할수 있어기판의습윤성을높일수 있다. 그결과로, 현상액을균일성높게기판에공급할수 있어수율의저하를억제할수 있다.
Abstract translation: 目的：提供显影装置，显影方法和存储介质，以通过将显影溶液均匀地涂覆在基板上来抑制显影缺陷的产生。 构成：用曝光操作处理的基板（W）由基板保持单元水平地保持。 表面处理溶液雾化单元（40）使表面处理溶液雾化，以增加显影液相对于基材的润湿性。 第一喷射喷嘴（41）将雾化的表面处理溶液喷射到基底上。 开发溶液雾化单元使显影液雾化。 第二喷嘴（51）相对于基板喷射雾化的显影液。
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公开(公告)号：KR101704059B1
公开(公告)日：2017-02-07
申请号：KR1020110125773
申请日：2011-11-29
Applicant: 도쿄엘렉트론가부시키가이샤
Abstract: 기판의면내에서균일성높게패턴을형성할수 있는현상장치를제공하는것이다. 표면에레지스트가도포되고, 노광된후의기판을수평으로보유지지하는기판보유지지부와, 상기기판의표면에현상액을공급하고, 상기레지스트를현상하기위한현상액공급부와, 기판상에있어서미리설정되어있는특정영역에, 현상액을가열하여현상액과레지스트의반응의정도를높이기위해, 기판재료의파장흡수영역을포함하는복사광을조사하는복사광조사부와, 기판의표면에세정액을공급하여현상액을제거하는세정액공급부를구비하도록현상장치를구성한다.
Abstract translation: 要解决的问题：提供能够以高均匀性在基板表面内形成图案的显影装置。解决方案：显影装置包括：用于水平保持其表面已被涂覆的基板的基板保持单元 与抗蚀剂和暴露; 显影液供给单元，用于将显影液供给到所述基板的表面并显影所述抗蚀剂; 辐射光照射单元，其对包含基板的材料的波长吸收区域的辐射光照射在基板上的预定的某一区域，以便加热显影溶液并增强显影液和抗蚀剂之间的反应程度; 以及用于将清洗液供给到基板的表面以除去显影液的清洗液供给单元。
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