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公开(公告)号：KR101184820B1
公开(公告)日：2012-09-24
申请号：KR1020100103185
申请日：2010-10-22
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01L21/027
CPC classification number: G03F7/3021
Abstract: A pretreatment process, carried out prior to a developing process, spouts pure water, namely, a diffusion-assisting liquid for assisting the spread of a developer over the surface of a wafer, through a cleaning liquid spouting nozzle onto a central part of the wafer to form a puddle of pure water. The developer is spouted onto the central part of the wafer for prewetting while the wafer is rotated at a high rotating speed to spread the developer over the surface of the wafer. The developer dissolves the resist film partly and produces a solution. The rotation of the wafer is reversed, for example, within 7 s in which the solution is being produced to reduce the water-repellency of the wafer by spreading the solution over the entire surface of the wafer. Then, the developer is spouted onto the rotating wafer to spread the developer on the surface of the wafer.
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公开(公告)号：KR1020120059413A
公开(公告)日：2012-06-08
申请号：KR1020110125773
申请日：2011-11-29
Applicant: 도쿄엘렉트론가부시키가이샤
CPC classification number: G03F7/3021 , G03F7/0025 , G03F7/162 , G03F7/168 , G03F7/3057 , H01L21/6715
Abstract: PURPOSE: A developing apparatus, a developing method, and memory media are provided to increase the reactivity of developing liquid and resist in a specific region of a substrate. CONSTITUTION: A developing apparatus includes a substrate loading and supporting part(11), a developing liquid supplying part, a radiation light irradiating part, and a washing liquid supplying part(71). Resist is applied on the surface of the substrate loading and supporting part. The substrate loading and supporting part horizontally loads and supports a substrate after exposure. The developing liquid supplying part supplies developing liquid to the surface of the substrate. The developing liquid supplying part develops the resist. The developing liquid on the specific region of the substrate is heated to improve the reactivity of the developing liquid to the resist by irradiating radiation light with a substrate material wavelength absorbing region. The washing liquid supplying part supplies washing liquid to the surface of the substrate to eliminate the developing liquid.
Abstract translation: 目的：提供显影装置，显影方法和存储介质，以增加显影液和基板的特定区域中的抗蚀剂的反应性。 构成：显影装置包括基板装载和支撑部分（11），显影液体供应部分，辐射光照射部分和洗涤液体供应部分（71）。 抗蚀剂施加在基板装载和支撑部件的表面上。 衬底加载和支撑部分在曝光后水平地负载并支撑衬底。 显影液供给部将显影液供给到基板的表面。 显影液供给部显影抗蚀剂。 通过用基板材料波长吸收区域照射辐射光，加热基板的特定区域上的显影液，以提高显影液对抗蚀剂的反应性。 洗涤液供给部将清洗液供给到基板的表面，以除去显影液。
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公开(公告)号：KR1020110044707A
公开(公告)日：2011-04-29
申请号：KR1020100103185
申请日：2010-10-22
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01L21/027
CPC classification number: G03F7/3021 , H01L21/0274 , G03F7/32 , G03F7/70341
Abstract: PURPOSE: A developing device, developing method, and storage medium are provided to uniformly develop the entire substrate, thereby reducing defects during developing. CONSTITUTION: A substrate supporting unit(11) horizontally supports a substrate(W). A rotation device(13) rotates the substrate supporting unit around a vertical axis. A diffusion assisting solution nozzle supplies a diffusion assisting solution to the substrate to assist the diffusion of a developing solution. A developing solution nozzle(30) supplies the developing solution to the substrate. The developing solution nozzle is connected to a developing solution supply source(31) or a developing solution supply system(32) through a developing solution supply pipe(30a).
Abstract translation: 目的：提供显影装置，显影方法和存储介质以均匀地显影整个基板，从而减少显影过程中的缺陷。 构成：基板支撑单元（11）水平地支撑基板（W）。 旋转装置（13）使基板支撑单元绕垂直轴旋转。 扩散辅助溶液喷嘴向扩散辅助溶液提供辅助溶液以帮助显影液的扩散。 显影溶液喷嘴（30）将显影液供应到基底。 显影液喷嘴通过显影液供给管（30a）与显影液供给源（31）或显影液供给系统（32）连接。
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公开(公告)号：KR101522437B1
公开(公告)日：2015-05-21
申请号：KR1020100022148
申请日：2010-03-12
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01L21/027
CPC classification number: H01L21/67748 , H01L21/67109 , H01L21/6715
Abstract: 본발명의과제는현상결함을억제하여, 수율의저하를억제할수 있고, 또한후단의장치에있어서의처리의수고를경감시킬수 있는, 노광된후의기판을가열하는기판처리장치를제공하는것이다. 표면에레지스트가도포되고, 또한노광된후의기판을가열하는가열판과, 상기레지스트에공급하는현상액의상기기판으로의습윤성을높이기위한표면처리액을무화하는표면처리액무화수단과, 상기가열판에의해가열된기판을냉각하기위한냉각수단과, 상기가열판에의한가열이개시된후 상기냉각수단에의한냉각이종료될때까지, 무화된상기표면처리액을기판에공급하는표면처리액공급수단을구비하도록기판처리장치를구성한다.
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Patent Agency Ranking
公开(公告)号：KR1020120047825A
公开(公告)日：2012-05-14
申请号：KR1020110113921
申请日：2011-11-03
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01L21/302
CPC classification number: G03F7/422 , H01L21/67051
Abstract: PURPOSE: A substrate cleaning apparatus and method, and a storage media for substrate cleaning are provided to efficiently clean a substrate by transferring a supply place of washing solution and a discharge place of gas to a peripheral part of the substrate and promoting the drying of a dry region. CONSTITUTION: A carrier station(1) comprises a load unit(11) loading a carrier(10), an opening and closing unit(12), and a transmitting means(A1). The transmitting means takes out a wafer(W) from the carrier through the opening and closing unit. A processing unit(2) comprises a shelf units(U1, U2, U3) and liquid processing units(U4, U5). An interface unit(3) is composed of a first transfer room(3A) and a second transfer room(3B) installed between the processing unit and a light exposed unit(4). A temperature-humidity control unit(22) controls temperature and humidity of processing liquid.
Abstract translation: 目的：提供一种基板清洗装置和方法以及用于基板清洗的存储介质，以通过将洗涤溶液的供应位置和气体排放位置转移到基板的周边部分来有效地清洁基板，并促进干燥 干燥区域。 构成：载体站（1）包括装载载体（10）的装载单元（11），打开和关闭单元（12）以及传送装置（A1）。 发送装置通过打开和关闭单元从载体中取出晶片（W）。 处理单元（2）包括搁板单元（U1，U2，U3）和液体处理单元（U4，U5）。 接口单元（3）由安装在处理单元和曝光单元（4）之间的第一传送室（3A）和第二传送室（3B）组成。 温度调节单元（22）控制处理液的温度和湿度。
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公开(公告)号：KR1020100012835A
公开(公告)日：2010-02-08
申请号：KR1020090068611
申请日：2009-07-28
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01L21/027 , H01L21/302
CPC classification number: G03F7/3057 , G03F7/3021 , G03F7/70925 , H01L21/67017 , H01L21/6715
Abstract: PURPOSE: A developing processing method and developing a processing apparatus are provided to allow a substrate to be cleaned and dried without scattering of a cleansing solution by moving a nozzle and diffuser from the center of the substrate the outer circumference of the substrate. CONSTITUTION: A substrate holding unit(40) horizontally keeps a substrate(W). A revolving mechanism(42) rotates the substrate holding unit around a vertical axis. A supply nozzle is installed upper part of the substrate and supplies the cleansing solution on the surface of the substrate. A diffuser(53) induces the flow of current dud to substrate rotation to the liquid film. A transfer apparatus maintains the nozzle and diffuser parallel with each other at the same time and move them from the center of the substrate to the outer circumference of the substrate.
Abstract translation: 目的：提供一种显影处理方法和显影处理装置，以便通过从衬底的中心移动喷嘴和扩散器，使衬底被清洗和干燥，而不会使清洁溶液散开。 构成：基板保持单元（40）水平地保持基板（W）。 旋转机构（42）使基板保持单元绕垂直轴旋转。 供应喷嘴安装在基板的上部，并将清洁溶液供应到基板的表面上。 漫射器（53）引起电流流向衬底旋转到液膜的流动。 传送装置将喷嘴和扩散器同时保持彼此平行并将其从基板的中心移动到基板的外周。
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公开(公告)号：KR101704059B1
公开(公告)日：2017-02-07
申请号：KR1020110125773
申请日：2011-11-29
Applicant: 도쿄엘렉트론가부시키가이샤
Abstract: 기판의면내에서균일성높게패턴을형성할수 있는현상장치를제공하는것이다. 표면에레지스트가도포되고, 노광된후의기판을수평으로보유지지하는기판보유지지부와, 상기기판의표면에현상액을공급하고, 상기레지스트를현상하기위한현상액공급부와, 기판상에있어서미리설정되어있는특정영역에, 현상액을가열하여현상액과레지스트의반응의정도를높이기위해, 기판재료의파장흡수영역을포함하는복사광을조사하는복사광조사부와, 기판의표면에세정액을공급하여현상액을제거하는세정액공급부를구비하도록현상장치를구성한다.
Abstract translation: 要解决的问题：提供能够以高均匀性在基板表面内形成图案的显影装置。解决方案：显影装置包括：用于水平保持其表面已被涂覆的基板的基板保持单元 与抗蚀剂和暴露; 显影液供给单元，用于将显影液供给到所述基板的表面并显影所述抗蚀剂; 辐射光照射单元，其对包含基板的材料的波长吸收区域的辐射光照射在基板上的预定的某一区域，以便加热显影溶液并增强显影液和抗蚀剂之间的反应程度; 以及用于将清洗液供给到基板的表面以除去显影液的清洗液供给单元。
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公开(公告)号：KR101387771B1
公开(公告)日：2014-04-21
申请号：KR1020090068611
申请日：2009-07-28
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01L21/027 , H01L21/302
Abstract: 본 발명은, 세정·건조 시간의 단축을 도모할 수 있는 동시에, 줄무늬와 같은 건조 결함 제거를 도모할 수 있도록 한 현상 처리 방법 및 현상 처리 장치를 제공한다.
이를 해결하기 위해, 노광된 반도체 웨이퍼(W)의 표면으로 현상액을 공급하여 현상을 행한 후에, 웨이퍼의 표면에 순수를 공급하여 세정을 행하는 현상 처리 방법에 있어서, 웨이퍼를 수평으로 유지한 스핀 척을 연직축 주위로 회전시키면서 웨이퍼의 중심부 상방에서 린스 노즐(58)로부터 순수를 공급하는 동시에, 린스 노즐에 인접하는 디퓨저(53)에 의해 웨이퍼의 회전에 의해 발생하는 기류(A)를 순수의 액막(F)으로 유도 확산시키고, 린스 노즐과 디퓨저를 평행 상태로 하여 웨이퍼의 중심부로부터 웨이퍼의 외주연을 향하여 직경 방향으로 동시에 이동시켜 웨이퍼의 세정 및 건조를 행한다.
반도체 웨이퍼, 현상액, 기류, 노즐, 건조-
公开(公告)号：KR1020100103413A
公开(公告)日：2010-09-27
申请号：KR1020100022148
申请日：2010-03-12
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01L21/027
CPC classification number: H01L21/67748 , H01L21/67109 , H01L21/6715 , G03F7/0025 , G03F7/405 , G03F7/70875
Abstract: PURPOSE: A substrate processing apparatus, a substrate processing method, a coating and developing apparatus, a coating and developing method, and a storage media are provided to prevent the generation development defects by uniformly supplying a developing solution on a substrate. CONSTITUTION: A substrate(W) is undergone through an exposure process. A heating plate(31) heats the exposed substrate. A surface processing solution atomization unit(60) atomizes a surface processing solution in order to improve the wettability of the substrate. A cooling unit(15) cools the heat substrate. The surface processing solution supplying unit supplies the atomized surface processing solution to the substrate.
Abstract translation: 目的：提供基板处理装置，基板处理方法，涂覆和显影装置，涂覆和显影方法以及存储介质，以通过将显影液均匀地供应到基板上来防止发生发展缺陷。 构成：基片（W）经过曝光过程。 加热板（31）加热暴露的基板。 表面处理溶液雾化单元（60）使表面处理溶液雾化，以提高基材的润湿性。 冷却单元（15）冷却热衬底。 表面处理液供给部将该雾化表面处理液供给到基板。
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