플라즈마 처리 장치와 온도 측정 방법 및 장치
    11.
    发明公开
    플라즈마 처리 장치와 온도 측정 방법 및 장치 有权
    等离子体加工装置和温度测量方法及其使用的装置

    公开(公告)号:KR1020100089034A

    公开(公告)日:2010-08-11

    申请号:KR1020100009300

    申请日:2010-02-01

    Abstract: PURPOSE: A plasma processing unit, a method and an apparatus for measuring temperature are provided to measure the temperature of a substrate by forming a temperature-measuring window which tightly sealed. CONSTITUTION: A vacuum chamber(2) plasma-processes a substrate(W). The substrate is loaded on a loading stand(3). A splitter separates light from light source into measurement-light and reference-light. A reflective unit for the reference-light reflects the reference-light from the splitter. Optical fiber(20 to 23) radiates the measurement-light to the substrate. Collimators(24 to 27) are arranged on the outlet side of the optical fiber.

    Abstract translation: 目的:提供一种用于测量温度的等离子体处理单元,方法和装置,以通过形成密封的温度测量窗来测量基板的温度。 构成:真空室(2)等离子体处理衬底(W)。 将基板装载在装载台(3)上。 分光器将光从光源分离成测量光和参考光。 用于参考光的反射单元反射来自分离器的参考光。 光纤(20〜23)将测量光照射到基板上。 准直器(24至27)布置在光纤的出口侧。

    온도 측정 장치 및 온도 측정 방법
    12.
    发明公开
    온도 측정 장치 및 온도 측정 방법 有权
    温度测量装置和方法

    公开(公告)号:KR1020090097116A

    公开(公告)日:2009-09-15

    申请号:KR1020090018798

    申请日:2009-03-05

    CPC classification number: G01K11/00 G01K11/125

    Abstract: A temperature measuring apparatus and a method for measuring temperature are provided to improve the precision of the temperature measurement by producing interference position based on signals filtered by frequency and producing corresponding interference position from the result. A temperature measuring apparatus(100) comprises a light source(110), a first splitter(120), a reference light reflective unit(140), an optical path length changing unit(150), a second splitter(121), a first detector(160), a second optical detector(161), and a temperature production unit. The first splitter divides the light into measurement light and reference light. The optical path length changing unit diversifies the optical path length of the reflected reference light. The second splitter divides the reflection reference light into the first reflection reference light and the second reflection reference light. The first detector measures interference between the reflection measurement light and the first reflection reference light. The second optical detector measures the intensity of the second reflection reference light. The temperature production unit produces the interference position and the temperature of the temperature measurement object from the result produced by subtracting the output signal of the second optical detector from the output signal of the first detector.

    Abstract translation: 提供了一种用于测量温度的温度测量装置和方法,以通过基于频率滤波的信号产生干涉位置并从结果产生相应的干涉位置来提高温度测量的精度。 一种温度测量装置(100),包括光源(110),第一分离器(120),参考光反射单元(140),光路长度改变单元(150),第二分离器(121) 检测器(160),第二光学检测器(161)和温度生成单元。 第一个分离器将光分成测量光和参考光。 光路长度改变单元使反射的参考光的光程长度多样化。 第二分离器将反射参考光分成第一反射参考光和第二反射参考光。 第一检测器测量反射测量光和第一反射参考光之间的干涉。 第二光学检测器测量第二反射参考光的强度。 温度生成单元根据从第一检测器的输出信号减去第二光检测器的输出信号而得到的结果,产生干涉位置和温度测量对象的温度。

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