公开(公告)号：KR1020140020750A

公开(公告)日：2014-02-19

申请号：KR1020130089468

申请日：2013-07-29

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 아이우라가즈히로 ,  이토노리히로 ,  하시모토유스케 ,  나가이다카시

IPC: H01L21/683 ,  G01B11/00

CPC classification number: H01L22/30 ,  H01L21/67259 ,  H01L21/68728 ,  H01L21/68792 ,  H01L2924/0002 ,  H01L2924/00

Abstract: The purpose of the present invention is to improve arrangement freedom degree of a device for determining maintenance of a substrate and freedom degree of an execution time of the maintenance determination. A device for treating a substrate comprises light projectors (61, 71) for irradiating detection light toward a region where a substrate may exist when the substrate is maintained by a substrate maintaining member and light receptors (62, 72) for receiving the detection light irradiated from the light projectors. Light paths (64, 74) of the detection light heading from the light projectors to the light receptors pass through substrate peripheral members (20, 30, 31, 34, 38, etc.), which are elements of the device for treating a substrate and are installed to be located in the periphery of the substrate maintained by the substrate maintaining member. The detection light projects the substrate peripheral members and has a wavelength which does not project the substrate.

Abstract translation: 本发明的目的是提高用于确定基板的维护的装置的布置自由度和维护确定的执行时间的自由度。 用于处理基板的装置包括用于当基板由基板保持构件保持时将检测光照射到可存在基板的区域的光投射器（61,71）和用于接收检测光照射的光接收器（62,72） 从光投影机。 从光投射器到光接收器的检测光的光路（64,74）通过作为用于处理基板的装置的元件的基板周边构件（20,30,31,34,38等） 并且被安装成位于由基板保持构件保持的基板的周边。 检测光投影基板周边部件，并且具有不投影基板的波长。

公开(公告)号：KR1020130046364A

公开(公告)日：2013-05-07

申请号：KR1020120118595

申请日：2012-10-24

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 나가미네슈이치 ,  하시모토유스케

IPC: H01L21/02 ,  H01L21/67 ,  H01L21/687

CPC classification number: H01L21/67051 ,  H01L21/02057 ,  H01L21/6715 ,  H01L21/02052 ,  H01L21/68764

Abstract: PURPOSE: A liquid processing apparatus, a liquid processing method, and a storage medium are provided to improve process speed by supplying a process liquid while rotating a substrate. CONSTITUTION: A substrate support part(10) supports a wafer in an upper direction. The substrate support part is rotatably arranged. A top plate nozzle supplies a rinse liquid to the wafer. A base plate nozzle is formed in the central part of a low flowing bottom part(20). A cup part(40) includes a first liquid storage part and a second liquid storage part. [Reference numerals] (AA) Exhaust gas; (BB) Acid; (CC) Alkali; (DD) SC1 and etc; (EE) Drain

Abstract translation: 目的：提供液体处理装置，液体处理方法和存储介质，以通过在旋转基板的同时提供处理液来提高处理速度。 构成：衬底支撑部分（10）沿上方支撑晶片。 基板支撑部可旋转地布置。 顶板喷嘴将冲洗液体提供给晶片。 底板喷嘴形成在低流动底部（20）的中心部分。 杯部（40）包括第一液体储存部和第二液体储存部。 （附图标记）（AA）废气; （BB）酸; （CC）碱 （DD）SC1等; （EE）排水