公开(公告)号：KR100600583B1

公开(公告)日：2006-07-18

申请号：KR1020040089411

申请日：2004-11-04

Applicant: 삼성전자주식회사

Inventor： 박종록 ,  최진혁 ,  조형철 ,  이근석

IPC: H01L21/20

Abstract: 본 발명은 냉각을 위하여 냉각장치를 갖춘 반도체 제조용 공정챔버에 관한 것이다.
본 발명에 따른 반도체 제조용 공정챔버는 상부에 고주파가 인가되는 안테나가 배치되는 공정챔버와, 공정챔버 상측에 설치되어 안테나와 공정챔버를 구획하는 윈도우와, 윈도우의 상측에 배치되어 윈도우를 냉각하는 냉각장치를 구비한 것으로, 냉각장치는 윈도우 중앙부를 냉각하는 제 1 냉각플레이트와 윈도우의 외곽부를 냉각하는 제 2 냉각플레이트를 포함하여 제 1 냉각플레이트와 제 2 냉각플레이트에 의해 윈도우 중앙부와 윈도우 외곽부가 고른 온도분포를 갖도록 냉각될 수 있게 되는 작용효과가 있다.

公开(公告)号：KR1020120062172A

公开(公告)日：2012-06-14

申请号：KR1020100123316

申请日：2010-12-06

Applicant: 삼성전자주식회사

Inventor： 박무윤 ,  김희동 ,  김규상 ,  조형철 ,  이희영 ,  정영환 ,  박희석

IPC: F21S8/10 ,  F21Y101/02

CPC classification number: F21V19/003 ,  F21S2/005

Abstract: PURPOSE: A light emitting assembly and a headlight therewith are provided to minimize light loss because a physical shield for forming light distribution patterns is not required. CONSTITUTION: A light emitting assembly(10) comprises a base unit(130) and a light distribution unit(140). The base unit comprises multiple light emitting elements(110) and a substrate(120). The light emitting elements are arranged on the substrate in a line. The light distribution unit is arranged on one end of the base unit and comprises one or more light emitting elements protruded from the base unit.

Abstract translation: 目的：提供一种发光组件及其头灯，以使光损失最小化，因为不需要用于形成配光图案的物理屏蔽。 构成：发光组件（10）包括基座单元（130）和配光单元（140）。 基体单元包括多个发光元件（110）和基底（120）。 发光元件一行地配置在基板上。 配光单元布置在基座单元的一端，并且包括从基座单元突出的一个或多个发光元件。

公开(公告)号：KR1020120051938A

公开(公告)日：2012-05-23

申请号：KR1020100113319

申请日：2010-11-15

Applicant: 삼성전자주식회사

Inventor： 박무윤 ,  김규상 ,  김희동 ,  조형철 ,  이희영 ,  정영환 ,  박희석

IPC: H01L33/60 ,  B60Q1/04

CPC classification number: H01L2224/48091 ,  H01L2224/73265 ,  H01L2224/8592 ,  H01L2924/00014

Abstract: PURPOSE: A light emitting device assembly is provided to omit a separate shield structure for increasing a contrast ratio, thereby reducing manufacturing costs. CONSTITUTION: A light emitting device is arranged on the upper part of a substrate(10). A light transmissive layer is arranged on the upper part of the light emitting device. A fluorescent substance(30) is arranged on the upper part of the light transmissive layer. A concavo-convex part(31) is formed on the upper surface of the fluorescent substance. A reflection layer(20) is arranged by covering a side surface part of the fluorescent substance, the light transmissive layer, and the light emitting device. The reflection layer comprises a lower reflection part(21) and an upper reflection part(23).

Abstract translation: 目的：提供发光器件组件以省略用于增加对比度的单独的屏蔽结构，从而降低制造成本。 构成：在基板（10）的上部配置有发光元件。 透光层设置在发光器件的上部。 荧光体（30）配置在透光层的上部。 在荧光物质的上表面上形成有凹凸部（31）。 通过覆盖荧光物质的侧面部分，透光层和发光器件来布置反射层（20）。 反射层包括下反射部（21）和上反射部（23）。

公开(公告)号：KR100855002B1

公开(公告)日：2008-08-28

申请号：KR1020070050132

申请日：2007-05-23

Applicant: 삼성전자주식회사

Inventor： 이영동 ,  유리톨마체프 ,  블라디미르볼리네츠 ,  바실리파쉬코프스키 ,  안드레이우샤코프 ,  금경수 ,  한재현 ,  김동철 ,  조형철

IPC: H01L21/265

CPC classification number: H01J37/32449 ,  H01J37/32357 ,  H01J37/32412 ,  H01J37/3244 ,  H01J37/3255 ,  H01J37/32862 ,  H01L21/2236

Abstract: A system for implanting plasma ions is provided to generate only the ions and polymer radicals necessary for an ion implantation process and easily control implanted plasma ions by generating plasma having an characteristic advantageous for an ion implantation process as compared with an ICP(inductively coupled plasma) process. A process target(501) is positioned in a vacuum chamber(500) having a reaction space in which plasma is generated. A first gas supply apparatus supplies reaction gas to the vacuum chamber. A second gas supply apparatus supplies cleaning gas to the vacuum chamber. Upper and lower electrodes(502,553) are installed in the vacuum chamber, confronting each other. A conductive ring(551) is installed in the periphery of the process target. An RF supply apparatus supplies RF power to the upper electrode to generate plasma. A high voltage supply apparatus supplies a high voltage to the process target, the lower electrode and the conductive ring. The first and second gas supply apparatuses can be installed in the sidewall(504) of the vacuum chamber, confronting each other.

Abstract translation: 提供了用于植入等离子体离子的系统，以仅产生离子注入工艺所需的离子和聚合物自由基，并且通过产生具有有利于离子注入工艺的特性的等离子体容易地控制注入的等离子体离子，与ICP（电感耦合等离子体）相比， 处理。 处理目标（501）位于具有产生等离子体的反应空间的真空室（500）中。 第一气体供给装置向真空室供给反应气体。 第二气体供给装置向真空室供给清洁气体。 上下电极（502,553）安装在真空室中，彼此面对。 导电环（551）安装在处理靶的周围。 RF供给装置向上部电极提供RF功率以产生等离子体。 高压电源装置向工艺靶，下电极和导电环提供高电压。 第一和第二气体供给装置可以安装在真空室的侧壁（504）中，彼此面对。

公开(公告)号：KR1020080009566A

公开(公告)日：2008-01-29

申请号：KR1020060069332

申请日：2006-07-24

Applicant: 삼성전자주식회사

Inventor： 전상진 ,  정진욱 ,  이근석 ,  사승엽 ,  조형철

IPC: H01L21/205

CPC classification number: C23C16/507 ,  H01J37/321 ,  H05H1/46

Abstract: An apparatus for treating a substrate is provided to effectively perform plasma ignition through a high frequency antenna system using high frequency power, and to improve the efficiency of plasma generation by improving the inductive coupling between a low frequency antenna and plasma through a low frequency antenna system. An apparatus for treating a substrate includes a vacuum chamber(205), a low frequency antenna unit(215), a low frequency power supply device(218), a high frequency antenna unit(207), and a high frequency power supply device(211). The vacuum chamber places a substrate to be treated therein, and has a reaction space where plasma is generated. The low frequency antenna unit is placed outside the reaction space, and generates the plasma in the reaction space. The low frequency power supply device applies low frequency power to the low frequency antenna unit. The high frequency antenna unit is placed outside the reaction space, and generates the plasma in the reaction space. The high frequency power supply device applies high frequency power to the high frequency antenna unit.

Abstract translation: 提供了一种用于处理基板的设备，以通过使用高频功率的高频天线系统来有效地执行等离子体点火，并且通过通过低频天线系统改进低频天线和等离子体之间的电感耦合来提高等离子体产生的效率 。 一种用于处理基板的设备包括：真空室（205），低频天线单元（215），低频电源装置（218），高频天线单元（207）和高频电源装置 211）。 真空室将要处理的基板放置在其中，并具有产生等离子体的反应空间。 将低频天线单元放置在反应空间的外部，并在反应空间中产生等离子体。 低频电源装置向低频天线装置施加低频功率。 高频天线单元放置在反应空间的外部，并在反应空间中产生等离子体。 高频电源装置向高频天线装置施加高频电力。

公开(公告)号：KR1020050013734A

公开(公告)日：2005-02-05

申请号：KR1020030052285

申请日：2003-07-29

Applicant: 삼성전자주식회사

Inventor： 권태용 ,  전상진 ,  한상철 ,  조형철

IPC: H01L21/3065

CPC classification number: H01J37/32082 ,  H01J37/32541

Abstract: PURPOSE: A plasma etching apparatus is provided to control properly intensity of RF electric field and improve etching uniformity by adjusting a shape of an upper electrode to form a discontinuous interval between opposite sides of the upper electrode and a lower electrode. CONSTITUTION: An upper electrode(25) is opposite to a lower electrode(23). A substrate(24) is arranged on the lower substrate. An RF generator is used for generating plasma by applying an RF voltage to one of the upper electrode and the lower electrode. An interval between opposite sides of the upper electrode and the lower electrode is discontinuously formed by adjusting a shape of the upper electrode.

Abstract translation: 目的：提供等离子体蚀刻装置，以通过调节上电极的形状来在上电极和下电极的相对侧之间形成不连续的间隔来控制RF电场的适当强度并提高蚀刻均匀性。 构成：上电极（25）与下电极（23）相对。 基板（24）布置在下基板上。 RF发生器用于通过向上电极和下电极之一施加RF电压来产生等离子体。 通过调节上电极的形状来不连续地形成上电极和下电极的相对侧之间的间隔。

公开(公告)号：KR101796115B1

公开(公告)日：2017-11-13

申请号：KR1020100099840

申请日：2010-10-13

Applicant: 삼성전자주식회사

Inventor： 홍종파 ,  조형철 ,  박희석 ,  손중곤

IPC: F21S8/10 ,  F21Y101/02 ,  F21W101/10

CPC classification number: F21S45/43 ,  F21S41/147 ,  F21S45/33

Abstract: 헤드램프조립체및 이를구비하는자동차가개시되어있다. 개시된헤드램프조립체는하우징; 및상기하우징내에배치되며제1 헤드램프케이스와제2 헤드램프케이스를포함하는복수의헤드램프케이스들;을구비한다. 상기제1 및제2 헤드램프케이스각각은, LED 광원, 상기 LED 광원으로부터발생된열을방열하는히트싱크, 및내부를순환하도록공기의유동을일으키는송풍팬을구비한다. 상기제1 및제2 헤드램프케이스들의송풍팬들은각각제1 및제2 램프케이스들의후면부분에위치함과아울러서로평행하게배치된다. 상기제1 헤드램프케이스의송풍팬은공기가상기제1 헤드램프케이스의전면에서주입되고상기제2 헤드램프케이스의후면으로배출되도록구성된다. 상기제2 헤드램프케이스의송풍팬은공기가상기제2 헤드램프케이스의후면에서주입되고상기제1 헤드램프케이스의전면으로배출되도록구성된다.

Abstract translation: 公开了一种前照灯组件和具有该前照灯组件的汽车。 所公开的头灯组件包括壳体; 并且多个头灯壳体设置在壳体中，头灯壳体包括第一头灯壳体和第二头灯壳体。 第一mitje第二头灯箱子各设置有LED光源，散热器消散来自LED光源产生的热，和鼓风扇引起的空气的流动，以内部循环。 第一和第二前照灯壳体的吹风扇分别位于第一和第二灯壳的后部，并且彼此平行地设置。 第一头灯壳体的送风风扇被配置在空气虚拟基座1前照灯外壳的前面被植入被排出到第二头灯壳体的后表面。 第二头灯壳体的送风风扇被配置在空气虚拟基座2前照灯外壳的背面并流出第一前照灯外壳的前被植入。

公开(公告)号：KR101584201B1

公开(公告)日：2016-01-13

申请号：KR1020140004205

申请日：2014-01-13

Applicant: 삼성전자주식회사

Inventor： 김태규 ,  정태오 ,  조형철 ,  한민수

IPC: H01L23/544 ,  H01L33/48

CPC classification number: H01L33/50 ,  H01L24/97 ,  H01L27/15 ,  H01L33/24 ,  H01L33/36 ,  H01L33/44 ,  H01L33/48 ,  H01L33/502 ,  H01L33/504 ,  H01L33/507 ,  H01L33/60 ,  H01L2224/16225 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2933/0033 ,  H01L2933/0041 ,  H01L2933/0058 ,  H01L2924/00

Abstract: 본발명의일 실시예는, 제1 및제2 전극이배치된제1 면과상기제1 면에반대되는제2 면을갖는반도체발광다이오드칩과, 상기반도체발광다이오드칩의제2 면에배치된보호막부와, 상기보호막부에제공되며, 상기반도체발광다이오드칩의특정방향을나타내도록구성된마크를포함하는반도체발광소자를제공할수 있다.

Abstract translation: 本发明的一个实施例是一种半导体发光器件，包括：半导体发光二极管芯片，具有其上设置有第一和第二电极的第一表面以及与第一表面相对的第二表面; 以及设置在保护膜部分上并用于显示半导体发光二极管芯片的特定方向的标记。

公开(公告)号：KR1020120051859A

公开(公告)日：2012-05-23

申请号：KR1020100113179

申请日：2010-11-15

Applicant: 삼성전자주식회사

Inventor： 조형철 ,  박희석 ,  최상배 ,  김용천

IPC: F21S8/10 ,  F21V29/15 ,  F21W101/10

Abstract: PURPOSE: A head lamp for a vehicle is provided to improve heat dissipation by expanding a thermal contact area. CONSTITUTION: A light source unit(10) is mounted on a head unit(H) of a vehicle and includes a light source body(11) and a light emitting device(12) formed in the light source body. A light source unit emits light to the front side of the vehicle and faces the head unit of the vehicle. A separation unit(20) separates the head unit of the vehicle from the light source unit. A separation unit is formed between the head unit of the vehicle and the rear of the light source body with a dual partition structure.

Abstract translation: 目的：提供车辆用前照灯，通过扩大热接触面积来提高散热。 构成：光源单元（10）安装在车辆的头单元（H）上，并且包括形成在光源体中的光源体（11）和发光装置（12）。 光源单元向车辆的前侧发射光并面向车辆的头部单元。 分离单元（20）将车辆的头单元与光源单元分离。 分离单元以双重分隔结构形成在车辆的头部单元和光源体的后部之间。

公开(公告)号：KR1020090041913A

公开(公告)日：2009-04-29

申请号：KR1020070107692

申请日：2007-10-25

Applicant: 삼성전자주식회사

Inventor： 조형철 ,  이영동 ,  진경환 ,  이형구 ,  박종록 ,  최희영

IPC: H01L21/02

Abstract: An air inflow detection device of a vacuum chamber and a method thereof are provided to detect an air inflow in a vacuum chamber although plasma is not generated in a vacuum room. An inflow detection room(210) of an air inflow detection chamber(200) is connected to a vacuum chamber(10). A reference gas and an air generate plasma in the air inflow detection room by a plasma source(300). An optical emission analyzer(250) is installed in one side of the air inflow detection chamber. The optical emission analyzer detects a light intensity having wavelength related to the reference gas and a light intensity having wavelength related to the air among lights generating the plasma. A control part(400) determines an air inflow by using the detected light intensity.

Abstract translation: 提供真空室的空气流入检测装置及其方法，以便在真空室中不产生等离子体来检测真空室中的空气流入。 空气流入检测室（200）的流入检测室（210）与真空室（10）连接。 参考气体和空气通过等离子体源（300）在空气流入检测室中产生等离子体。 光发射分析器（250）安装在空气流入检测室的一侧。 光发射分析仪在产生等离子体的光中检测具有与参考气体相关的波长的光强度和具有与空气相关的波长的光强度。 控制部件（400）通过使用检测到的光强度来确定空气流入。