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    다공성 박막 및 그 제조 방법
    11.
    发明公开
    다공성 박막 및 그 제조 방법 无效
    多孔薄膜及其制造方法

    公开(公告)号：KR1020090007168A

    公开(公告)日：2009-01-16

    申请号：KR1020070070867

    申请日：2007-07-13

    Applicant: 한국과학기술연구원

    Inventor： 김주선 ,  이해원 ,  이종호 ,  최선희 ,  조태신 ,  오건석

    IPC: C23C14/00 ,  C23C14/58

    Abstract: A manufacturing method of a porous thin film is provided to enable the porous thin film to be applied to an SOFC(Solid Oxide Fuel Cell) operated at high temperatures, and to obtain excellent adhesion with a substrate by manufacturing a porous thin film having a porous structure even at high temperatures, and the porous thin film manufactured by the same is provided. A manufacturing method of a porous thin film comprises: depositing reactive gas together with a thin film material using a thin film deposition process to form a thin film; removing the reactive gas from the thin film through heat treatment; and crystallizing the thin film to obtain a porous thin film. The thin film deposition process is one selected from sputtering, vapor deposition, ion plating, and PLD(Pulsed Laser Deposition) methods.

    Abstract translation: 提供一种多孔薄膜的制造方法，以使多孔薄膜能够应用于在高温下操作的SOFC（固体氧化物燃料电池），并且通过制造具有多孔薄膜的多孔薄膜来获得与基材的优异粘附性 结构即使在高温下也是这样，并且提供了由其制造的多孔薄膜。 多孔薄膜的制造方法包括：使用薄膜沉积工艺将薄膜材料与薄膜材料一起沉积以形成薄膜; 通过热处理从薄膜中除去反应气体; 并使该薄膜结晶，得到多孔薄膜。 薄膜沉积工艺是从溅射，气相沉积，离子镀和PLD（脉冲激光沉积）方法中选择的。

    화학적 기계적 평탄화 공정의 실시간 전기화학적 분석 장치
    14.
    发明公开
    화학적 기계적 평탄화 공정의 실시간 전기화학적 분석 장치 失效
    化学机械平面化的现场电化学监测系统

    公开(公告)号：KR1020030086143A

    公开(公告)日：2003-11-07

    申请号：KR1020020024523

    申请日：2002-05-03

    Applicant: 한국과학기술연구원

    Inventor： 이종호 ,  김주선 ,  이해원 ,  임건자 ,  김태은

    IPC: H01L21/304

    Abstract: PURPOSE: A system for in-situ electrochemical monitoring of chemical mechanical planarization is provided to be capable of observing polishing speed and the electrical chemical change of slurry and a semiconductor wafer in real time. CONSTITUTION: A system for in-situ electrochemical monitoring of chemical mechanical planarization is provided with an operation electrode(1) attached to a wafer chuck(2), a reference electrode(3) contacting the polishing slurry supplied to the center portion of a polishing pad(8), and a reverse electrode(4) contacting the slurry at the peripheral portion of the polishing pad. Preferably, the operation electrode is attached to the lateral portion of the wafer chuck. Preferably, the operation electrode has a curved contact part corresponding to the contact portion of the wafer chuck.

    Abstract translation: 目的：提供化学机械平面化的原位电化学监测系统，能够实时观察抛光速度和浆料和半导体晶片的电化学变化。 构成：用于化学机械平面化的原位电化学监测的系统设置有附接到晶片卡盘（2）的操作电极（1），与提供给抛光中心部分的研磨浆料接触的参比电极（3） 衬垫（8）和与抛光垫周边部分处的浆料接触的反向电极（4）。 优选地，操作电极附接到晶片卡盘的侧部。 优选地，操作电极具有对应于晶片卡盘的接触部分的弯曲接触部分。

    반응결합 탄화규소 제조방법
    15.
    发明公开
    반응결합 탄화규소 제조방법 失效
    生产反应性碳化硅的方法

    公开(公告)号：KR1020030085371A

    公开(公告)日：2003-11-05

    申请号：KR1020020023774

    申请日：2002-04-30

    Applicant: 한국과학기술연구원

    Inventor： 이해원 ,  김주선 ,  이종호 ,  송휴섭 ,  신현익

    IPC: C04B35/573

    CPC classification number: C04B35/63 ,  B82Y30/00 ,  C04B35/573 ,  C04B35/634 ,  C04B2235/3826 ,  C04B2235/422 ,  C04B2235/428 ,  C04B2235/48 ,  C04B2235/5436 ,  C04B2235/5454 ,  C04B2235/604 ,  C04B2235/608 ,  C04B2235/77

    Abstract: PURPOSE: Provided is a method for producing a reaction bonding silicon carbide, which supplies melted silicon effectively regardless of the form, size and thickness of the reaction bonding silicon carbide, prevents the cohesion of the melted silicon, and supplies the melted silicon uniformly. CONSTITUTION: The method comprises the steps of: preparing a silicon supplying specimen composed of a silicon powder and a thermosetting resin selected from the group consisting of a phenol resin, a furfuryl alcohol resin and an epoxy resin as a binding agent; preparing a silicon carbide/carbon filling body; contacting the silicon supplying specimen to one side of the filling body in a reaction bonding furnace; and heat treating at the temperature higher than the melting point of the silicon under vacuum or an inert atmosphere to infiltrate the melted silicon in the silicon supplying specimen into the inside of the filling body.

    Abstract translation: 目的：提供一种生产反应接合碳化硅的方法，无论反应结合碳化硅的形式，尺寸和厚度如何，均有效地提供熔融硅，防止熔融硅的内聚力，并均匀地供应熔融的硅。 方法：该方法包括以下步骤：制备由硅粉末和选自酚醛树脂，糠醇树脂和环氧树脂作为粘合剂的热固性树脂组成的供硅试样; 制备碳化硅/碳填充体; 在反应接合炉中使供硅试样与填充体的一侧接触; 在高于真空或惰性气氛的硅的熔点的温度下进行热处理，将硅供应试样中的熔融硅浸入填充体的内部。

    액상 응결법에 의한 분말 과립 제조 및 그 성형 방법
    16.
    发明公开
    액상 응결법에 의한 분말 과립 제조 및 그 성형 방법 失效
    通过液体浓缩法制备粉粒的方法和通过液相浓缩法处理粉粒的方法

    公开(公告)号：KR1020030073445A

    公开(公告)日：2003-09-19

    申请号：KR1020020013003

    申请日：2002-03-11

    Applicant: 한국과학기술연구원

    Inventor： 이해원 ,  김주선 ,  이종호 ,  송휴섭 ,  유장용 ,  이동석 ,  허장원 ,  신현익

    IPC: B01J2/06

    CPC classification number: C08J3/205 ,  B01J2/06 ,  B29B9/00 ,  B29B9/08 ,  B29B9/12

    Abstract: PURPOSE: A method for preparing powder granules by liquid condensation process is provided to economically prepare uniform granules without defects, and a method for compacting powder granules by liquid condensation process is provided to freely change compaction density of granules and improve compactibility of powder granules. CONSTITUTION: The method comprises the processes of preparing slurry by mixing powder and binder with solvent(13) soluble for the binder; dropping the slurry into solvent insoluble for the binder, thereby fixing the binder so that the binder is prevented from coming out of the surface of droplets, and causing replacement between the soluble solvent and insoluble solvent inside the droplets on the surface of dropped slurry droplets, thereby condensing the droplets; and completely removing residual solvent by drying the separated droplets after separating condensed droplets from the insoluble solvent. The method for compacting powder granules by liquid condensation process comprises the processes of preparing slurry by mixing powder to be compacted and binder with solvent soluble for the binder; dropping the slurry into solvent insoluble for the binder, thereby fixing the binder so that the binder is prevented from coming out of the surface of droplets, and causing replacement between the soluble solvent and insoluble solvent inside the droplets on the surface of dropped slurry droplets, thereby condensing the droplets; completely removing residual solvent by drying the separated droplets after separating condensed droplets from the insoluble solvent; preparing green compact by pressing the dried granules in mold; and degreasing the binder by heating the green compact.

    Abstract translation: 目的：提供一种通过液体缩合方法制备粉末颗粒的方法，以经济地制备无缺陷的均匀颗粒，并提供通过液体冷凝方法压实粉末颗粒的方法，以自由改变颗粒的压实密度并提高粉末颗粒的紧密度。 构成：该方法包括通过将粉末和粘合剂与可溶于粘合剂的溶剂（13）混合来制备浆料的方法; 将浆料滴入不溶于粘合剂的溶剂中，由此固定粘合剂，从而防止粘合剂从液滴的表面流出，并引起可滴落的液滴表面上的液滴内的可溶性溶剂和不溶性溶剂之间的置换， 从而冷凝液滴; 并在从不溶性溶剂中分离出浓缩的液滴后，通过干燥分离的液滴来完全除去残余溶剂。 通过液体冷凝法压粉粉末颗粒的方法包括通过将要压实的粉末和粘合剂与可溶于粘合剂的溶剂混合来制备浆料的方法; 将浆料滴入不溶于粘合剂的溶剂中，由此固定粘合剂，从而防止粘合剂从液滴的表面流出，并引起可滴落的液滴表面上的液滴内的可溶性溶剂和不溶性溶剂之间的置换， 从而冷凝液滴; 在从不溶性溶剂中分离浓缩的液滴后，通过干燥分离出的液滴来完全除去残留溶剂; 通过在模具中挤压干燥的颗粒制备生坯; 并通过加热生坯来去除粘合剂。

    텅스텐 씨엠피용 슬러리
    17.
    发明公开
    텅스텐 씨엠피용 슬러리 无效
    用于TUNGSTEN CMP的浆料

    公开(公告)号：KR1020030063763A

    公开(公告)日：2003-07-31

    申请号：KR1020020004042

    申请日：2002-01-24

    Applicant: 한국과학기술연구원

    Inventor： 이해원 ,  김상우 ,  이종호 ,  김주선 ,  임건자 ,  유장용 ,  김태은

    IPC: C09K3/14 ,  B82B3/00 ,  B82Y40/00

    CPC classification number: C09G1/02 ,  C01P2004/64 ,  C09K3/1409 ,  C09K3/1463 ,  H01L21/3212 ,  Y10S977/888

    Abstract: PURPOSE: A slurry for a tungsten CMP (chemical mechanical polishing) is provided, which shows an excellent dispersion stability of nano-sized ceramic particles in an aqueous solution and a high polishing efficiency. CONSTITUTION: The slurry comprises 5-25 wt% of a polishing agent; 1-5 wt% of an oxidizing agent; 0.4-4 wt% of an oxidation accelerator; and 1-10 wt% of an oxidation acceleration stabilizer, and is stable at pH 3-5. Preferably the polishing agent is 5-10 wt% of nano-sized alumina or 5-25 wt% of nano-sized silica, and has an average particle size of 200 nm or less; the oxidizing agent is hydrogen peroxide; the oxidation accelerator is 0.05-0.5 M Fe(NO3)3; and the oxidation acceleration stabilizer is 1-10 wt% of citric acid, 0.5-5 wt% of malonic acid or 0.6-6 wt% of oxalic acid.

    Abstract translation: 目的：提供用于钨CMP（化学机械抛光）的浆料，其显示了纳米级陶瓷颗粒在水溶液中的优异分散稳定性和高抛光效率。 构成：浆料包含5-25重量％的抛光剂; 1-5重量％的氧化剂; 0.4-4重量％的氧化促进剂; 和1-10重量％的氧化加速稳定剂，在pH 3-5时稳定。 抛光剂优选为5-10重量％的纳米尺寸氧化铝或5-25重量％的纳米尺寸二氧化硅，平均粒度为200nm以下; 氧化剂是过氧化氢; 氧化促进剂为0.05〜0.5M Fe（NO 3）3; 氧化加速稳定剂为柠檬酸1-10重量％，丙二酸0.5-5重量％，草酸0.6-6重量％。

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