-
-
公开(公告)号：KR100039012B1
公开(公告)日：1991-01-15
申请号：KR1019870015004
申请日：1987-12-26
Applicant: 한국전자통신연구원
IPC: H01L21/223
-
-
公开(公告)号：KR1019920004960B1
公开(公告)日：1992-06-22
申请号：KR1019880017974
申请日：1988-12-30
IPC: H01L21/00
Abstract: The apparatus precisely detects the position of the cassette by use of a photo interrupter. The cassette is used for loading wafers to a reactor and piching up the wafers from the reactor. The detecting apparatus comprises a sheet metal for shutting off the light from both sides of a cassette table, a photo interruptor having a pair of light emitter and receiver, an array alternately arranging a plurality of the photo interruptors in two rows, an encoder board for converting the photo interruptor signals to 5 bit signals and LED for displaying the cassette position.
Abstract translation: 该装置通过使用光电断路器精确地检测盒的位置。 盒子用于将晶片装载到反应器中并从反应器上取出晶片。 检测装置包括用于切断从盒式磁带台的两侧的光的金属板，具有一对光发射器和接收器的光电断路器，以两行交替布置多个光电断路器的阵列，编码器板，用于 将照片中断信号转换为5位信号，并将LED转换为显示纸盒位置。
-
-
Patent Agency Ranking
公开(公告)号：KR100041668B1
公开(公告)日：1991-05-09
申请号：KR1019870014927
申请日：1987-12-24
Applicant: 한국전자통신연구원
IPC: H01L21/223
-
-
-
公开(公告)号：KR1019900000757B1
公开(公告)日：1990-02-15
申请号：KR1019870014273
申请日：1987-12-14
Applicant: 한국전자통신연구원
IPC: C23C14/24
Abstract: A gas supply system for chemical vapour deposition under low pressure is used for depositing W and WSi2 on Si and GaAs base in process of semiconductor material manufacturing and gives a precise and safe way for the growth of film. The system has advantages of precise gas flow control by locating hydraulic valve for gas supply time control before mass-flow controller; safety; and easy maintenance of mass- flow controller by installing N2 inlet line, by-pass line, exhaust line, valves and heating tape.
Abstract translation: 在低压下进行化学气相沉积的气体供给系统用于在半导体材料制造过程中在Si和GaAs基底上沉积W和WSi2，为薄膜的生长提供了一种精确而安全的方法。 该系统具有精确的气体流量控制，通过在质量流量控制器之前定位液压阀供气时间控制; 安全; 并通过安装N2入口管路，旁路管线，排气管路，阀门和加热带，方便维护质量流量控制器。
-
-
-
-
-
-
-
-
-
Search Results
41
records
(took 0.02 seconds)
