-
公开(公告)号:KR1020140131219A
公开(公告)日:2014-11-12
申请号:KR1020130050310
申请日:2013-05-03
Applicant: 한국화학연구원
IPC: C23C16/06 , C23C16/448
CPC classification number: C23C16/45553 , C07F15/0046 , C23C16/18 , C23C16/40
Abstract: The present invention relates to a ruthenium precursor represented by Chemical formula 1. The ruthenium precursor: has excellent thermal stability and increased volatility; does not use oxygen during a thin film deposition process; and thus can form a ruthenium thin film with high quality. In Chemical formula 1, R1 to R16 are independently hydrogen; otherwise, R1 to R16 are independently linear alkyl groups or branched alkyl groups.
Abstract translation: 本发明涉及由化学式1表示的钌前体。钌前体具有优异的热稳定性和增加的挥发性; 在薄膜沉积过程中不使用氧气; 因此能够形成高品质的钌薄膜。 在化学式1中,R 1至R 16独立地为氢; 否则,R 1至R 16独立地为直链烷基或支链烷基。
-
-
公开(公告)号:KR101470905B1
公开(公告)日:2014-12-09
申请号:KR1020120136558
申请日:2012-11-28
Applicant: 한국화학연구원
Abstract: 본발명은하기화학식 1로표시되는루테늄전구체에관한것으로, 상기루테늄전구체는열적안정성과휘발성이향상되고, 박막증착시 산소를사용하지않아도되는장점이있어양질의루테늄박막을형성할수 있다. [화학식 1](상기식에서, R1-R12는각각독립적으로 H이거나, C1-C4의선형또는분지형알킬기다.)
-
公开(公告)号:KR101636491B1
公开(公告)日:2016-07-05
申请号:KR1020140086145
申请日:2014-07-09
Applicant: 한국화학연구원
Abstract: 본발명은하기화학식 1의루테늄화합물및 이의제조방법, 박막을형성하는방법에관한것으로, 하기화학식 1의루테늄화합물은열적안정성과휘발성이우수하여양질의루테늄박막을형성할수 있다. [화학식 1]상기 R내지 R은각각독립적으로수소또는탄소수 1 내지 4의선형또는분지형의알킬기이다.
-
-
-