루테늄 전구체, 이의 제조방법 및 이를 이용하여 박막을 형성하는 방법
    11.
    发明公开
    루테늄 전구체, 이의 제조방법 및 이를 이용하여 박막을 형성하는 방법 审中-实审
    钌前驱体,其制备方法和使用该薄膜形成薄膜的方法

    公开(公告)号:KR1020140131219A

    公开(公告)日:2014-11-12

    申请号:KR1020130050310

    申请日:2013-05-03

    CPC classification number: C23C16/45553 C07F15/0046 C23C16/18 C23C16/40

    Abstract: The present invention relates to a ruthenium precursor represented by Chemical formula 1. The ruthenium precursor: has excellent thermal stability and increased volatility; does not use oxygen during a thin film deposition process; and thus can form a ruthenium thin film with high quality. In Chemical formula 1, R1 to R16 are independently hydrogen; otherwise, R1 to R16 are independently linear alkyl groups or branched alkyl groups.

    Abstract translation: 本发明涉及由化学式1表示的钌前体。钌前体具有优异的热稳定性和增加的挥发性; 在薄膜沉积过程中不使用氧气; 因此能够形成高品质的钌薄膜。 在化学式1中,R 1至R 16独立地为氢; 否则,R 1至R 16独立地为直链烷基或支链烷基。

Patent Agency Ranking