公开(公告)号：AT355546T

公开(公告)日：2006-03-15

申请号：AT00911386

申请日：2000-03-27

Applicant: ASAHI GLASS CO LTD

Inventor： OGAWA TOHRU ,  HOSONO HIDEO ,  KIKUGAWA SHINYA ,  IKUTA YOSHIAKI ,  MASUI AKIO ,  SHIMODAIRA NORIAKI ,  YOSHIZAWA SHUHEI

IPC: H01L21/027 ,  C03B20/00 ,  C03C3/06 ,  G03F1/60 ,  G03F7/20 ,  G03F1/14 ,  C03B8/04

Abstract: An exposure apparatus, wherein at least one of optical members constituting an exposure light source system, an illuminating optical system, a photomask and a projection optical system, is made of a synthetic quartz glass for an optical member, which has an absorption coefficient of 0.70 cm or less at a wavelength of 157 nm and an infrared absorption peak attributable to SiOH stretching vibration at about 3640 cm .

公开(公告)号：DE60019691D1

公开(公告)日：2005-06-02

申请号：DE60019691

申请日：2000-07-28

Applicant: ASAHI GLASS CO LTD

Inventor： KAMISUKI YOUICHI ,  MIYAKAWA NAOMICHI ,  KIKUGAWA SHINYA ,  SUZUKI KATSUYOSHI ,  ENOMOTO SATOHIRO

IPC: C04B35/565 ,  C01B31/36 ,  C04B35/573 ,  C23C16/01 ,  C23C16/32 ,  C23C16/42 ,  C30B25/02 ,  H01L21/683 ,  C23C16/00 ,  C23C16/56 ,  C30B31/10 ,  H01L21/68

Abstract: Silicon carbide having a resistivity of from 10 to 10 OMEGA .cm and a powder X-ray diffraction peak intensity ratio of at least 0.005 as represented by Id1/Id2 where Id1 is the peak intensity in the vicinity of 2&thetas; being 34 DEG and Id2 is the peak intensity in the vicinity of 2&thetas; being 36 DEG .

公开(公告)号：DE60016185D1

公开(公告)日：2004-12-30

申请号：DE60016185

申请日：2000-09-13

Applicant: ASAHI GLASS CO LTD

Inventor： IKUTA YOSHIAKI ,  KIKUGAWA SHINYA ,  MISHIRO HITOSHI ,  ARISHIMA HIROSHI ,  OKADA KANAME ,  MATSUMOTO KATSUHIRO

IPC: G03F1/62 ,  C03B33/08 ,  G03F1/14 ,  B24B7/24

Abstract: It is characterized by having a pellicle sheet made of a synthetic quartz glass having an OH group concentration of at most 100 ppm and containing substantially no oxygen deficient defect. It is particularly preferred that the OH group concentration is at most 10 ppm, and the internal transmittance is at least 80 %/cm at a wavelength of 157 nm.

公开(公告)号：AT283503T

公开(公告)日：2004-12-15

申请号：AT00961001

申请日：2000-09-13

Applicant: ASAHI GLASS CO LTD

Inventor： IKUTA YOSHIAKI ,  KIKUGAWA SHINYA ,  MISHIRO HITOSHI MITO ,  YORIISHINDEN OAZA TABIKO ,  ARISHIMA HIROSHI ,  OKADA KANAME ,  MATSUMOTO KATSUHIRO ,  SUEHIRO-CHO TSURUMI-KU

IPC: G03F1/62 ,  C03B33/08 ,  G03F1/14 ,  B24B7/24

Abstract: It is characterized by having a pellicle sheet made of a synthetic quartz glass having an OH group concentration of at most 100 ppm and containing substantially no oxygen deficient defect. It is particularly preferred that the OH group concentration is at most 10 ppm, and the internal transmittance is at least 80 %/cm at a wavelength of 157 nm.

公开(公告)号：DE69909983T2

公开(公告)日：2004-04-15

申请号：DE69909983

申请日：1999-01-29

Applicant: ASAHI GLASS CO LTD

Inventor： IKUTA YOSHIAKI ,  KIKUGAWA SHINYA ,  MASUI AKIO ,  SHIMODAIRA NORIAKI ,  YOSHIZAWA SHUHEI

IPC: C03B19/14 ,  C03B32/00 ,  C03C3/06 ,  C03C23/00 ,  C03B20/00 ,  A63F9/00 ,  C03B37/018

公开(公告)号：AT246154T

公开(公告)日：2003-08-15

申请号：AT99901911

申请日：1999-01-29

Applicant: ASAHI GLASS CO LTD

Inventor： IKUTA YOSHIAKI ,  KIKUGAWA SHINYA ,  MASUI AKIO ,  SHIMODAIRA NORIAKI ,  YOSHIZAWA SHUHEI

IPC: C03B19/14 ,  C03B32/00 ,  C03C3/06 ,  C03C23/00 ,  C03B20/00

公开(公告)号：DE10253928A1

公开(公告)日：2003-06-18

申请号：DE10253928

申请日：2002-11-19

Applicant: ASAHI GLASS CO LTD

Inventor： MISHIRO HITOSHI ,  KIKUGAWA SHINYA ,  OKADA KANAME ,  KAWAHARA TAKAYUKI ,  TERAKADO MORIO

IPC: H01L21/027 ,  G03F1/64 ,  G03F7/20 ,  G03F1/14

Abstract: A structure for attaching a pellicle to a photomask, the pellicle comprising a pellicle frame and a pellicle sheet attached to an opening portion formed in the pellicle frame, wherein at least a portion of the pellicle frame surface in contact with the photo-mask has a direct contact with the photo-mask without interposing an adhesive.

公开(公告)号：EP1061052A4

公开(公告)日：2001-04-11

申请号：EP99901911

申请日：1999-01-29

Applicant: ASAHI GLASS CO LTD

Inventor： IKUTA YOSHIAKI ,  KIKUGAWA SHINYA ,  MASUI AKIO ,  SHIMODAIRA NORIAKI ,  YOSHIZAWA SHUHEI

IPC: C03B19/14 ,  C03B32/00 ,  C03C3/06 ,  C03C23/00 ,  C03B20/00

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B32/00 ,  C03B2201/21 ,  C03B2201/23 ,  C03C23/00 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/54 ,  Y02P40/57

Abstract: A process for the production of synthetic silica glass optical members which contain 1 x 10 or more hydrogen molecules per cm , have OH group concentrations of 200 ppm or below and are substantially free from reduction type defects, by treating a synthetic silica glass containing fewer than 1 x 10 hydrogen molecules per cm at a temperature of 300 to 600 DEG C in a hydrogen-containing atmosphere at a pressure of 2 to 30 atms.

公开(公告)号：EP2532508A4

公开(公告)日：2014-01-08

申请号：EP11739716

申请日：2011-01-31

Applicant: ASAHI GLASS CO LTD

Inventor： KOIKE AKIO ,  KIKUGAWA SHINYA ,  NISHIHARA YOSHIYUKI

IPC: B29C59/02 ,  B29C33/38 ,  H01L21/027

CPC classification number: B29C33/38 ,  B29C33/424 ,  B29C2791/005 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

公开(公告)号：EP1067097A4

公开(公告)日：2004-03-31

申请号：EP99962506

申请日：1999-12-24

Applicant: ASAHI GLASS CO LTD

Inventor： IKUTA YOSHIAKI ,  KIKUGAWA SHINYA ,  MASUI AKIO ,  SHIMODAIRA NORIAKI ,  YOSHIZAWA SHUHEI

IPC: C03B8/04 ,  C03B19/14 ,  C03C3/06 ,  C03C23/00 ,  C03B37/014

CPC classification number: C03B19/1453 ,  C03B2201/03 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2201/23 ,  C03C3/06 ,  C03C23/002 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/44 ,  C03C2203/54 ,  Y02P40/57

Abstract: A synthetic quartz glass to be used for vacuum ultraviolet lights having a wavelength of 175 nm or less which is characterized in that it has an OH group content of 100 ppm or less and is substantially free of reducing type defects.

Abstract translation: 用于波长最高为175nm的真空紫外线区域中的光的合成石英玻璃，其特征在于，合成石英玻璃中的OH基含量小于10ppm，并且其基本上不含还原型 缺陷。