中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

17 records (took 0.027 seconds)

    METHOD FOR DETERMINING PATTERNING DEVICE PATTERN BASED ON MANUFACTURABILITY
    12.
    发明申请
    METHOD FOR DETERMINING PATTERNING DEVICE PATTERN BASED ON MANUFACTURABILITY 审中-公开

    公开(公告)号：WO2020108902A1

    公开(公告)日：2020-06-04

    申请号：PCT/EP2019/079562

    申请日：2019-10-29

    Applicant: ASML NETHERLANDS B.V.

    Inventor： BISWAS, Roshni ,  HOWELL, Rafael C. ,  ZHANG, Cuiping ,  JIA, Ningning ,  LIU, Jingjing ,  ZHANG, Quan

    IPC: G03F1/36 ,  G03F7/20

    Abstract: Described herein is a method for determining a patterning device pattern. The method includes obtaining (i) an initial patterning device pattern having at least one feature, and (ii) a desired feature size of the at least one feature, obtaining, based on a patterning process model, the initial patterning device pattern and a target pattern for a substrate, a difference value between a predicted pattern of the substrate image by the initial patterning device and the target pattern for the substrate, determining a penalty value related the manufacturability of the at least one feature, wherein the penalty value varies as a function of the size of the at least one feature, and determining the patterning device pattern based on the initial patterning device pattern and the desired feature size such that a sum of the difference value and the penalty value is reduced.

    GRADIENT-BASED PATTERN AND EVALUATION POINT SELECTION
    14.
    发明申请
    GRADIENT-BASED PATTERN AND EVALUATION POINT SELECTION 审中-公开
    基于梯度的图案和评估点选择

    公开(公告)号：WO2013178459A1

    公开(公告)日：2013-12-05

    申请号：PCT/EP2013/059834

    申请日：2013-05-13

    Applicant: ASML NETHERLANDS B.V.

    Inventor： LIU, Xiaofeng ,  HOWELL, Rafael C.

    IPC: G03F7/20 ,  G03F1/70

    CPC classification number: G06F17/5068 ,  G03F1/70 ,  G03F7/70125 ,  G03F7/70483 ,  G03F7/705

    Abstract: Described herein is a method for a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic imaging apparatus, the lithographic process having a plurality of design variables, the method comprising: calculating a gradient of each of a plurality of evaluation points or patterns of the lithographic process, with respect to at least one of the design variables; and selecting a subset of evaluation points from the plurality of evaluation points or patterns based on the gradient.

    Abstract translation: 本文描述了一种用于使用光刻成像装置将设计布局的一部分成像到基板上的光刻工艺的方法，所述光刻工艺具有多个设计变量，所述方法包括：计算多个评估中的每一个的梯度 关于至少一个设计变量的光刻工艺的点或图案; 以及基于所述梯度从所述多个评估点或模式中选择评估点的子集。

Patent Agency Ranking