公开(公告)号：WO2015139951A1

公开(公告)日：2015-09-24

申请号：PCT/EP2015/054448

申请日：2015-03-03

Applicant: ASML NETHERLANDS B.V.

Inventor： HSU, Duan-Fu, Stephen ,  JIA, Jianjun ,  LIU, Xiaofeng ,  ZHANG, Youping

IPC: G03F7/20 ,  G03F1/36

CPC classification number: G03F7/7055 ,  G03F1/36 ,  G03F7/70125 ,  G03F7/70433 ,  G03F7/70441 ,  G03F7/705

Abstract: Disclosed herein is a computer-implemented method to improve a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus, the method comprising: computing a multi-variable cost function of a plurality of design variables that are characteristics of the lithographic process, and reconfiguring the characteristics of the lithographic process by adjusting the design variables until a predefined termination condition is satisfied. The multi-variable cost function may be a function of one or more pattern shift errors. Reconfiguration of the characteristics may be under one or more constraints on the one or more pattern shift errors.

Abstract translation: 本文公开了一种计算机实现的方法，用于改进用于使用光刻投影设备将设计布局的一部分成像到基板上的光刻工艺，所述方法包括：计算作为特征的多个设计变量的多变量成本函数 并且通过调整设计变量来重新配置光刻工艺的特性，直到满足预定的终止条件。 多变量成本函数可以是一个或多个模式偏移误差的函数。 特征的重新配置可能在一个或多个模式偏移误差的一个或多个约束下。

公开(公告)号：WO2016096308A1

公开(公告)日：2016-06-23

申请号：PCT/EP2015/076994

申请日：2015-11-18

Applicant: ASML NETHERLANDS B.V.

Inventor： LIU, Xiaofeng ,  LU, Yen-Wen

IPC: G06N99/00 ,  G06F17/50

CPC classification number: G06N99/005 ,  G03F1/36 ,  G03F7/70 ,  G03F7/70125 ,  G03F7/70441 ,  G03F7/705 ,  G06F17/5068 ,  G06F17/5081

Abstract: Disclosed herein is a computer-implemented method to improve a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus, the method comprising: obtaining a target feature; generating a perturbed target feature from the target feature by applying a perturbation thereto; generating a set of training examples comprising the perturbed target feature and an indication as whether the perturbed target feature is deemed same as the target feature; training a learning model with the set of training examples; classifying features in the portion of the design layout into at least two classes: being deemed same as the target feature, and being deemed different from the target feature.

Abstract translation: 本文公开了一种计算机实现的方法，用于改进用于使用光刻投影设备将设计布局的一部分成像到基板上的光刻工艺，该方法包括：获得目标特征; 通过对目标特征施加扰动从而产生扰动的目标特征; 生成包括扰动的目标特征的训练样本集合以及是否将扰动的目标特征视为与目标特征相同的指示; 用一套训练实例训练学习模型; 将设计布局部分中的特征分类为至少两个类：被认为与目标特征相同，并被认为与目标特征不同。

公开(公告)号：WO2015158444A1

公开(公告)日：2015-10-22

申请号：PCT/EP2015/053099

申请日：2015-02-13

Applicant: ASML NETHERLANDS B.V.

Inventor： HSU, Duan-Fu, Stephen ,  HOWELL, Rafael C. ,  LIU, Xiaofeng

IPC: G03F7/20 ,  G03F1/36 ,  G03F1/70

CPC classification number: G03F7/70641 ,  G03F1/36 ,  G03F1/70 ,  G03F7/70125 ,  G03F7/70191 ,  G03F7/70433 ,  G03F7/70441 ,  G03F7/705 ,  G03F7/70558

Abstract: Disclosed herein is a computer-implemented method to improve a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus comprising an illumination source and projection optics, the method comprising: obtaining a source shape and a mask defocus value; optimizing a dose of the lithographic process; optimizing the portion of the design layout for each of a plurality of slit positions of the illumination source.

Abstract translation: 本文公开了一种计算机实现的方法，用于使用包括照明源和投影光学器件的光刻投影设备来改进用于将设计布局的一部分成像到基板上的光刻处理，该方法包括：获得源形状和掩模散焦值 ; 优化光刻工艺的剂量; 优化照明源的多个狭缝位置中的每一个的设计布局的部分。

公开(公告)号：WO2014127986A1

公开(公告)日：2014-08-28

申请号：PCT/EP2014/052110

申请日：2014-02-04

Applicant: ASML NETHERLANDS B.V.

Inventor： LIU, Xiaofeng ,  HOWELL, Rafael C.

IPC: G03F7/20

CPC classification number: G03F7/2008 ,  G03F7/70116 ,  G03F7/70125 ,  G03F7/705 ,  G03F7/70508

Abstract: Disclosed herein is a computer-implemented method for improving a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus, the method comprising: providing a desired pupil profile; calculating a discrete pupil profile based on the desired pupil profile; selecting a discrete change to the discrete pupil profile; and applying the selected discrete change to the discrete pupil profile. The methods according to various embodiments disclosed herein may reduce the computational cost of discrete optimization from O(a n ) to O(n) wherein a is constant and n is the number of knobs that can generate discrete change in the pupil profile.

Abstract translation: 本文公开了一种用于改进光刻处理的计算机实现的方法，用于使用光刻投影设备将设计布局的一部分成像到基板上，该方法包括：提供期望的瞳孔轮廓; 基于所需的瞳孔轮廓来计算离散的瞳孔轮廓; 选择离散瞳孔轮廓的离散变化; 以及将所选择的离散变化应用于离散光瞳轮廓。 根据本文公开的各种实施例的方法可以将离散优化的计算成本从O（a）减小到O（n），其中a是常数，n是可以在瞳孔轮廓中产生离散变化的旋钮的数量。

公开(公告)号：WO2013164187A1

公开(公告)日：2013-11-07

申请号：PCT/EP2013/057938

申请日：2013-04-16

Applicant: ASML NETHERLANDS B.V.

Inventor： LIU, Xiaofeng

IPC: G03F7/20 ,  G06F17/50

CPC classification number: G06F17/5045 ,  G03F7/705 ,  G03F7/70525 ,  G03F7/7065 ,  G06F17/5081 ,  G06F2217/12 ,  H05K3/0005 ,  H05K2203/05

Abstract: A computer-implemented method for obtaining values of one or more design variables of one or more design rules for a pattern transfer process comprising a lithographic projection apparatus, the method comprising: simultaneously optimizing one or more design variables of the pattern transfer process and the one or more design variables of the one or more design rules. The optimizing comprises evaluating a cost function that measures a metric characteristic of the pattern transfer process, the cost function being a function of one or more design variables of the pattern transfer process and one or more design variables of the one or more design rules.

Abstract translation: 一种用于获得包括光刻投影设备的图案转移处理的一个或多个设计规则的一个或多个设计规则的值的计算机实现的方法，所述方法包括：同时优化所述图案转移过程的一个或多个设计变量， 或更多设计变量的一个或多个设计规则。 优化包括评估测量图案转移过程的度量特征的成本函数，成本函数是模式转移过程的一个或多个设计变量和一个或多个设计规则的一个或多个设计变量的函数。

公开(公告)号：WO2016096309A1

公开(公告)日：2016-06-23

申请号：PCT/EP2015/077010

申请日：2015-11-18

Applicant: ASML NETHERLANDS B.V.

Inventor： LIU, Xiaofeng

IPC: G06N99/00 ,  G06F17/50

CPC classification number: G06N99/005 ,  G03F7/70125 ,  G03F7/70441 ,  G03F7/70491 ,  G06F17/50

Abstract: Disclosed herein is a computer-implemented method for improving a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic apparatus, the method comprising: obtaining a first source of the lithographic apparatus; classifying the first source into a class among a plurality of possible classes, based on one or more numerical characteristics of the first source, using a machine learning model, by a computer; determining whether the class is among one or more predetermined classes; only when the class is among the one or more predetermined classes, adjusting one or more source design variables to obtain a second source.

Abstract translation: 本文公开了一种用于改进光刻工艺的计算机实现的方法，用于使用光刻设备将设计布局的一部分图像成像到衬底上，该方法包括：获得光刻设备的第一源; 基于计算机使用机器学习模型的第一源的一个或多个数值特征，将第一源分类为多个可能类中的类; 确定该类是否在一个或多个预定类别中; 只有当该类在一个或多个预定类别中时，调整一个或多个源设计变量以获得第二源。

公开(公告)号：WO2015197313A1

公开(公告)日：2015-12-30

申请号：PCT/EP2015/062135

申请日：2015-06-01

Applicant: ASML NETHERLANDS B.V.

Inventor： LIU, Xiaofeng

IPC: G03F7/20

CPC classification number: G03F1/44 ,  G03F1/36 ,  G03F1/42 ,  G03F7/70125 ,  G03F7/70433 ,  G03F7/705 ,  G06F17/50 ,  G06F2217/12

Abstract: Disclosed herein is a computer-implemented method to improve a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus and for transferring the imaged portion of the design layout to the substrate by an etching process, which includes the following steps: determining a value of at least one evaluation point of the lithographic process for each of a plurality of variations of the etching process; computing a multi-variable cost function of a plurality of design variables that are characteristics of the lithographic process, wherein the multi-variable cost function is a function of deviation from the determined values of the at least one evaluation point; and reconfiguring the characteristics of the lithographic process by adjusting the design variables until a termination condition is satisfied. This method may reduce the need of repeated adjustment to the lithographic process when the etching process varies.

Abstract translation: 本文公开了一种计算机实现的方法，用于改进用于使用光刻投影装置将设计布局的一部分成像成像到基板上的光刻工艺，并且通过蚀刻工艺将设计布局的成像部分转移到基板，该蚀刻工艺包括 以下步骤：为蚀刻工艺的多个变化中的每一个确定光刻工艺的至少一个评估点的值; 计算作为光刻工艺特征的多个设计变量的多变量成本函数，其中所述多变量成本函数是与所述至少一个评估点的确定值的偏差的函数; 并通过调整设计变量来重新配置光刻过程的特性，直到满足终止条件。 当蚀刻工艺变化时，该方法可以减少对光刻工艺的重复调整的需要。

公开(公告)号：WO2013178459A1

公开(公告)日：2013-12-05

申请号：PCT/EP2013/059834

申请日：2013-05-13

Applicant: ASML NETHERLANDS B.V.

Inventor： LIU, Xiaofeng ,  HOWELL, Rafael C.

IPC: G03F7/20 ,  G03F1/70

CPC classification number: G06F17/5068 ,  G03F1/70 ,  G03F7/70125 ,  G03F7/70483 ,  G03F7/705

Abstract: Described herein is a method for a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic imaging apparatus, the lithographic process having a plurality of design variables, the method comprising: calculating a gradient of each of a plurality of evaluation points or patterns of the lithographic process, with respect to at least one of the design variables; and selecting a subset of evaluation points from the plurality of evaluation points or patterns based on the gradient.

Abstract translation: 本文描述了一种用于使用光刻成像装置将设计布局的一部分成像到基板上的光刻工艺的方法，所述光刻工艺具有多个设计变量，所述方法包括：计算多个评估中的每一个的梯度 关于至少一个设计变量的光刻工艺的点或图案; 以及基于所述梯度从所述多个评估点或模式中选择评估点的子集。