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    A STAGE SYSTEM, STAGE SYSTEM OPERATING METHOD, INSPECTION TOOL, LITHOGRAPHIC APPARATUS, CALIBRATION METHOD AND DEVICE MANUFACTURING METHOD
    15.
    发明申请
    A STAGE SYSTEM, STAGE SYSTEM OPERATING METHOD, INSPECTION TOOL, LITHOGRAPHIC APPARATUS, CALIBRATION METHOD AND DEVICE MANUFACTURING METHOD 审中-公开

    公开(公告)号：WO2021155990A1

    公开(公告)日：2021-08-12

    申请号：PCT/EP2020/087474

    申请日：2020-12-21

    Applicant: ASML NETHERLANDS B.V.

    Inventor： HUANG, Yang-Shan ,  VISSER, Raimond

    IPC: G03F7/20

    Abstract: A stage (ST) that is moveable relative to a reference (RE) including: a bearing (BE) to support and guide movement of the stage relative to the reference in a 2D plane; and an actuator system (ACT) to apply forces to the stage relative to the reference to move or position the stage relative to the reference in the 2D plane, wherein the actuator system includes at least one actuator device (CL) configured to have an engaged mode, in which the actuator device is engaged with the stage to allow the stage to move along with the actuator device, and a disengaged mode, in which the actuator device is disengaged from the stage allowing the stage and the actuator device to move independently.

    A FLUID HANDLING SYSTEM, METHOD AND LITHOGRAPHIC APPARATUS
    16.
    发明申请
    A FLUID HANDLING SYSTEM, METHOD AND LITHOGRAPHIC APPARATUS 审中-公开

    公开(公告)号：WO2021099027A1

    公开(公告)日：2021-05-27

    申请号：PCT/EP2020/078599

    申请日：2020-10-12

    Applicant: ASML NETHERLANDS B.V.

    Inventor： HUANG, Yang-Shan ,  TEN KATE, Nicolaas

    IPC: G03F7/20

    Abstract: The present invention relates to a fluid handling system. The fluid handling system comprises a liquid confinement structure configured to confine immersion liquid to a space between at least a part of the liquid confinement structure and a surface of a substrate. The fluid handling system also comprises a mechanism configured to vibrate a vibration component in contact with the immersion liquid.

    PARTICLE SUPPRESSION SYSTEMS AND METHODS
    17.
    发明申请
    PARTICLE SUPPRESSION SYSTEMS AND METHODS 审中-公开

    公开(公告)号：WO2019020450A1

    公开(公告)日：2019-01-31

    申请号：PCT/EP2018/069476

    申请日：2018-07-18

    Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

    Inventor： HUANG, Yang-Shan ,  BOONEN, Marcel, Joseph, Louis ,  NIENHUYS, Han-Kwang ,  BRINKERT, Jacob ,  BRULS, Richard, Joseph ,  KOCHERSPERGER, Peter, Conrad

    IPC: G03F7/20

    Abstract: A lithographic apparatus can include an illumination system (IL) that conditions a radiation beam (B), a first stationary plate (412) having a first surface (426), and a reticle stage defining, along with the first stationary plate, a first chamber (404). The reticle stage supports a reticle (402) in the first chamber, and the reticle stage includes a first surface (424) spaced apart from a second surface of the first stationary plate, thereby defining a first gap (414) configured to suppress the amount of contamination passing from a second chamber (406) to the first chamber. The first stationary plate is between the reticle stage and both the illumination system and a projection system (PS) configured to project a pattern imparted to the radiation beam by the patterning device onto a substrate.

    GAS INJECTION SYSTEMS FOR PARTICLE SUPPRESSION
    18.
    发明申请
    GAS INJECTION SYSTEMS FOR PARTICLE SUPPRESSION 审中-公开

    公开(公告)号：WO2019020449A1

    公开(公告)日：2019-01-31

    申请号：PCT/EP2018/069474

    申请日：2018-07-18

    Applicant: ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

    Inventor： CHIEDA, Michael, Andrew ,  BRINKERT, Jacob ,  HUANG, Yang-Shan ,  BAL, Kursat

    IPC: G03F7/20

    Abstract: Designs are provided to reduce the possibility of contaminant particles with a large range of sizes, materials, travel speeds and angles of incidence reaching a particle-sensitive environment. According to an aspect of the disclosure, there is provided an object stage (400) comprising first and second chambers (403; 405). The object stage further comprises a first structure (402) having a first surface (415) and a second structure (404). The second structure is configured to support an object (412) in the second chamber (405), movable relative to the first structure, and comprises a second surface (417) opposing the first surface (415) of the first structure (402) thereby defining a gap (414) between the first structure and the second structure that extends between the first chamber (403) and the second chamber (405). The object stage further comprises a gas outlet for injecting a gas provided (a) in the gap or (b) in the first chamber adjacent an entrance of the gap at the first chamber.

    POSITIONING SYSTEM AND LITHOGRAPHIC APPARATUS
    19.
    发明申请
    POSITIONING SYSTEM AND LITHOGRAPHIC APPARATUS 审中-公开
    定位系统和光刻设备

    公开(公告)号：WO2018050443A1

    公开(公告)日：2018-03-22

    申请号：PCT/EP2017/071870

    申请日：2017-08-31

    Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

    Inventor： BUSTRAAN, Krijn, Frederik ,  HUANG, Yang-Shan ,  DE GROOT, Antonius, Franciscus, Johannes ,  KIM, Minkyu ,  SIMONS, Jasper, Anne, Frido, Marikus ,  RUIJL, Theo, Anjes, Maria ,  LAMERS, Ronald, Josephus, Maria

    IPC: G03F7/20

    Abstract: A positioning system for positioning an object. The positioning system includes a stage, a balance mass and an actuator system. The stage is for holding the object. The actuator system is arranged to drive the stage in a first direction while driving the balance mass in a second direction opposite to the first direction. The stage is moveable in the first direction in a movement range. When the stage is moving in the first direction and is at an end of the movement range, the positioning system is arranged to collide the stage frontally into the balance mass.

    Abstract translation:

    定位对象的定位系统。 定位系统包括一个平台，一个平衡质量和一个执行器系统。 舞台是用来放置物体的。 致动器系统布置成沿第一方向驱动平台，同时沿与第一方向相反的第二方向驱动平衡质量。 舞台可以在移动范围内沿第一方向移动。 当舞台沿第一方向移动并且处于移动范围的末端时，定位系统被布置成使舞台正面碰撞到平衡物体中。

    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    20.
    发明申请
    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：WO2016012174A1

    公开(公告)日：2016-01-28

    申请号：PCT/EP2015/064106

    申请日：2015-06-23

    Applicant: ASML NETHERLANDS B.V.

    Inventor： HUANG, Yang-Shan ,  VAN BERKEL, Koos ,  VAN DIJSSELDONK, Antonius, Johannes, Josephus ,  VAN EIJK, Jan ,  VAN SCHOOT, Jan, Bernard, Plechelmus ,  VERMEULEN, Johannes, Petrus, Martinus, Bernardus

    IPC: G03F7/20 ,  G03F1/00

    CPC classification number: G03F7/70733 ,  G03F1/60 ,  G03F7/70716

    Abstract: A lithographic apparatus is described, the apparatus comprising: n illumination system configured to condition a radiation beam; otary drive adapted to move a flexible patterning device along a closed loop trajectory, the closed loop trajectory having a straight portion and a curved portion, a curvature of the flexible patterning device substantially corresponding to a curvature of the closed loop trajectory; a substrate table constructed to hold a substrate; wherein the rotary drive comprises a pulley assembly configured to: engage, during use, the flexible patterning device, and maintain, during use, a portion of the flexible patterning device that is situated along the straight portion of the trajectory substantially flat, the substantially flat portion of the patterning device being configured to impart the radiation beam with a pattern in its cross-section to form a patterned radiation beam, and; a projection system configured to project the patterned radiation beam onto a target portion of the substrate.

    Abstract translation: 描述了一种光刻设备，该设备包括：n个照明系统，被配置为调节辐射束; 适于沿着闭环轨迹移动柔性图案形成装置的闭合驱动装置，闭环轨迹具有直线部分和弯曲部分，柔性图案形成装置的曲率基本上对应于闭环轨迹的曲率; 构造成保持基板的基板台; 其中所述旋转驱动器包括滑轮组件，所述滑轮组件构造成：在使用期间，所述柔性图案形成装置接合并且在使用期间保持所述柔性图案形成装置的沿所述轨迹的直线部分基本上平坦的部分， 所述图案形成装置的一部分被配置为使辐射束在其横截面上具有图案以形成图案化的辐射束， 投影系统，被配置为将图案化的辐射束投影到基板的目标部分上。

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