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公开(公告)号：WO2017045874A1
公开(公告)日：2017-03-23
申请号：PCT/EP2016/069876
申请日：2016-08-23
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： POLO, Alessandro , MATHIJSSEN, Simon, Gijsbert, Josephus , TINNEMANS, Patricius, Aloysius, Jacobus , COSTON, Scott, Douglas , HAVELIN, Ronan, James
CPC classification number: G03F9/7065 , G02B6/2938
Abstract: A lithographic apparatus includes an alignment sensor configured to determine the position of an alignment target comprising a periodic structure. The alignment sensor includes a demultiplexer (700) to demultiplex a number of intensity channels (one of them shown to be output at fiber 702). The demultiplexer includes a number of stages arranged in series and a number of demultiplexing components (706, 708a,b, 710a-d,712a-h), each demultiplexing component being operable to divide an input radiation beam into two radiation beam portions. The first stage has a first demultiplexing component (706) that is arranged to receive as an input radiation beam an incident radiation beam. Each successive stage is arranged such that it has twice the number of demultiplexing components as a preceding stage, each demultiplexing component of each stage after the first stage receiving as an input one of the radiation beam portions output from a demultiplexing component of the preceding stage.
Abstract translation: 光刻设备包括配置成确定包括周期性结构的对准目标位置的对准传感器。 对准传感器包括解复用器（700），以解复用多个强度通道（其中一个示出为在光纤702处输出）。 解复用器包括串联布置的多个级和多个解复用组件（706,708a，b，710a-d，712a-h），每个解复用组件可操作以将输入辐射束分成两个辐射束部分。 第一级具有布置成作为输入辐射束接收入射辐射束的第一解复用部件（706）。 每个连续级被布置为使得其具有前一级的解复用分量的两倍，在第一级接收之后的每级的每个解复用分量作为从前一级的解复用分量输出的辐射束部分中的输入一个。
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公开(公告)号：WO2020120082A1
公开(公告)日：2020-06-18
申请号：PCT/EP2019/081836
申请日：2019-11-19
Applicant: ASML NETHERLANDS B.V.
Inventor： CRAMER, Hugo, Augustinus, Joseph , BOS, Hilko, Dirk , KOOP, Erik, Johan , KOOLEN, Armand, Eugene, Albert , NIENHUYS, Han-Kwang , POLO, Alessandro , LIAN, Jin , DEN BOEF, Arie, Jeffrey
Abstract: The disclosure relates to measuring a parameter of a lithographic process and a metrology apparatus. In one arrangement, radiation from a radiation source is modified and used to illuminate a target formed on a substrate using the lithographic process. Radiation scattered from a target is detected and analyzing to determine the parameter. The modification of the radiation comprises modifying a wavelength spectrum of the radiation to have a local minimum between a global maximum and a local maximum, wherein the power spectral density of the radiation at the local minimum is less than 20% of the power spectral density of the radiation at the global maximum and the power spectral density of the radiation at the local maximum is at least 50% of the power spectral density of the radiation at the global maximum.
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公开(公告)号：WO2020007558A1
公开(公告)日：2020-01-09
申请号：PCT/EP2019/064661
申请日：2019-06-05
Applicant: ASML NETHERLANDS B.V.
Inventor： GOORDEN, Sebastianus, Adrianus , HUISMAN, Simon, Reinald , AKBULUT, Duygu , POLO, Alessandro , AKKERMANS, Johannes, Antonius, Gerardus , DEN BOEF, Arie, Jeffrey
IPC: G03F9/00
Abstract: The invention provides a position sensor (300) which comprises an optical system (305,306) configured to provide measurement radiation (304) to a substrate (307). The optical system is arranged to receive at least a portion of radiation (309) diffracted by a mark (308) provided on the substrate. A processor (313) is applied to derive at least one position-sensitive signal (312) from the received radiation. The measurement radiation comprises at least a first and a second selected radiation wavelength. The selection of the at least first and second radiation wavelengths is based on a position error swing-curve model.
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公开(公告)号：WO2019243017A1
公开(公告)日：2019-12-26
申请号：PCT/EP2019/064082
申请日：2019-05-29
Applicant: ASML NETHERLANDS B.V.
Inventor： POLO, Alessandro
Abstract: A sensor apparatus comprising an acoustic assembly arranged to transmit an acoustic signal to a substrate and receive at least part of the acoustic signal after the acoustic signal has interacted with the substrate, a transducer arranged to convert the at least part of the acoustic signal to an electronic signal, and, a processor configured to receive the electronic signal and determine both a topography of at least part of the substrate and a position of a target of the substrate based on the electronic signal. The sensor apparatus may for part of a lithographic apparatus or a metrology apparatus.
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Patent Agency Ranking
公开(公告)号：WO2018114152A1
公开(公告)日：2018-06-28
申请号：PCT/EP2017/079345
申请日：2017-11-15
Applicant: ASML NETHERLANDS B.V.
Inventor： GOORDEN, Sebastianus, Adrianus , PANDEY, Nitesh , AKBULUT, Duygu , POLO, Alessandro , HUISMAN, Simon, Reinald
Abstract: Disclosed is a metrology sensor system, such as a position sensor. The system comprises an optical collection system configured to collect diffracted or scattered radiation from a metrology mark on a substrate, said collected radiation comprising at least one parameter-sensitive signal and noise signal which is not parameter-sensitive, a processing system operable to process the collected radiation; and a module housing. An optical guide is provided for guiding the at least one parameter-sensitive signal, separated from the noise signal, from the processing system to a detection system outside of the housing. A detector detects the separated at least one parameter-sensitive signal. An obscuration for blocking zeroth order radiation and/or a demagnifying optical system may be provided between the optical guide and the detector.
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16.发明申请METROLOGY APPARATUS, METHOD OF MEASURING A STRUCTURE AND LITHOGRAPHIC APPARATUS 审中-公开计量器具，测量结构的方法和光刻设备
公开(公告)号：WO2017148665A1
公开(公告)日：2017-09-08
申请号：PCT/EP2017/052690
申请日：2017-02-08
Applicant: ASML NETHERLANDS B.V.
CPC classification number: G03F9/7046 , G01B11/00 , G01B11/02 , G01B11/24 , G01B11/272 , G01B11/303 , G01B2210/56 , G01N21/9501 , G01N21/956 , G02B2207/129 , G03F7/70625 , G03F7/70633 , G03F7/70775 , G03F7/7085 , G03F9/7069 , G03F9/7088
Abstract: Disclosed is a metrology apparatus and method for measuring a structure formed on a substrate by a lithographic process. The metrology apparatus comprises an illumination system operable to provide measurement radiation comprising a plurality of wavelengths; and a hyperspectral imager operable to obtain a hyperspectral representation of a measurement scene comprising the structure, or a part thereof, from scattered measurement radiation subsequent to the measurement radiation being scattered by the structure.
Abstract translation: 公开了一种用于通过光刻工艺测量形成在基板上的结构的测量设备和方法。 该度量衡装置包括：照明系统，其可操作以提供包括多个波长的测量辐射; 以及高光谱成像器，其可操作以在测量辐射被该结构散射之后从散射测量辐射中获得包括该结构或其一部分的测量场景的高光谱表示。
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公开(公告)号：EP3474074A1
公开(公告)日：2019-04-24
申请号：EP17196893.6
申请日：2017-10-17
Applicant: ASML Netherlands B.V.
Inventor： PISARENCO, Maxim , PANDEY, Nitesh , POLO, Alessandro
Abstract: An acoustic scatterometer 502 has an acoustic source 520 operable to project acoustic radiation 526 onto a periodic structure 538 and 540 formed on a substrate 536. An acoustic detector 518 is operable to detect the -1st acoustic diffraction order 528 diffracted by the periodic structure 538 and 540 while discriminating from specular reflection (0th order 532). Another acoustic detector 522 is operable to detect the +1st acoustic diffraction order 530 diffracted by the periodic structure, again while discriminating from the specular reflection (0th order 532). The acoustic source and acoustic detector may be piezo transducers. The angle of incidence of the projected acoustic radiation 526 and location of the detectors 518 and 522 are arranged with respect to the periodic structure 538 and 540 such that the detection of the -1st and +1st acoustic diffraction orders 528 and 530 discriminates from the 0th order specular reflection 532.
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公开(公告)号：EP3715951A1
公开(公告)日：2020-09-30
申请号：EP19165908.5
申请日：2019-03-28
Applicant: ASML Netherlands B.V.
Inventor： BEUKMAN, Arjan Johannes Anton , POLO, Alessandro , PELLEMANS, Henricus Petrus Maria , KUMAR, Nitish
Abstract: Disclosed is a metrology apparatus comprising an optical element configured to receive at or near a pupil plane of the metrology apparatus, at least first radiation comprising a first higher diffracted order and second radiation comprising a zeroth order resulting from illumination of a metrology target with radiation; and to direct said first radiation and second radiation together in a first direction. The metrology apparatus is further configured to form at least a first image of a first interference pattern, the first interference pattern resulting from interference of said first radiation and second radiation at an image plane.
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公开(公告)号：EP3385685A1
公开(公告)日：2018-10-10
申请号：EP17165318.1
申请日：2017-04-06
Applicant: ASML Netherlands B.V.
Inventor： POLO, Alessandro , PANDEY, Nitesh , KOOLEN, Armand, Eugene, Albert
CPC classification number: G03F7/7065 , G01N21/4788 , G01N21/9501 , G01N21/956 , G03F7/70625 , G03F7/70633 , G03F9/7034 , G03F9/7049 , G03F9/7088
Abstract: A radiation receiving system for an inspection apparatus, used to perform measurements on target structures on lithographic substrates as part of a lithographic process, comprises a spectrometer with a number of inputs. The radiation receiving system comprises: a plurality of inputs, each input being arranged to provide radiation from a target structure; a first optical element operable to receive radiation from each of the plurality of inputs; a second optical element operable to receive radiation from the first optical element and to scatter the radiation; and a third optical element operable to direct the scattered radiation onto a detector. The second optical element may for example be a reflective diffraction grating that diffracts incoming radiation into an output radiation spectrum.
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